Coupled effects of chloride ions and branch chained polypropylene ether LP-1™ on the electrochemical deposition of copper from sulfate solutions

Coupled effects of chloride ions and branch chained polypropylene ether LP-1™ on the electrochemical deposition of copper from sulfate solutions

Source :

• Electrochimica Acta [ 0013-4686 ] ; 1998.

Descripteurs français

• Pascal (Inist)
  • Constante vitesse, Cuivre, Cuivre Sulfate, Dépôt électrolytique, Effet concentration, Effet milieu, Electrode disque tournant, Etude expérimentale, Impédance électrique, Mécanisme réaction, Paramètre cinétique, Platine, Polymère ramifié, Propène oxyde polymère, Réaction électrochimique, Sodium Chlorure, Sulfurique acide.
• Wicri :
  • topic : Cuivre, Platine.

English descriptors

• KwdEn :
  • Absolute overpotential, Acta, Active surface, Additive, Adsorption, Adsorption phenomena, Ambient temperature, Anodic charge transfer, Average value, Bath composition, Branched polymer, Broad range, Bulk concentrations, Bulk solution, Capacitance, Cathode surface, Charge transfer, Charge transfer resistance, Chemical composition, Chloride, Chloride ions, Complexation phenomena, Concentration effect, Constant phase element, Copper, Copper Sulfates, Copper deposition, Copper electrodeposition, Copper sulfate, Copper surface, Coverage fraction, Cupric, Cupric ions, Cuprous, Cuprous ions, Current densities, Current density, Current peak, Cuso4, Deposition, Disk electrode, Double layer capacitance, Electrical impedance, Electrochemical investigations, Electrochemical reaction, Electrochimica, Electrochimica acta, Electrode, Electrode impedance, Electrode surface, Electrodeposition, Electrolyte solutions, Electrolytic, Electrolytic bath, Electron transfer, Electrostatic phenomena, Elsevier science, Experimental data, Experimental study, Frequency domain, Frequency loop, Goldbach, Good agreement, High overpotentials, Impedance, Impedance measurements, Impedance parameter, Impedance spectra, Industrial relevancy, Inert molecules, Kinetic parameter, Kinetic parameters, Linear voltammetry, Lower extent, Medium effect, Metal interface, Nacl, Overpotential, Overpotential range, Overpotentials, Physical parameters, Plating surf, Platinum, Polypropylene ether, Potential range, Previous investigations, Production lines, Propylene oxide polymer, Rate constant, Reaction mechanism, Reference solution, Rotating disk electrode, Rotation rate, Rsol, Scan rate, Second loop, Simultaneous presence, Sodium Chlorides, Sodium chloride, Sodium chloride concentrations, Standard potentials, Sudden inhibition, Sulfate, Sulfate bath, Sulfuric, Sulfuric acid, Sulfuric solutions, Voltammetric, Voltammetric curves, Voltammetry.
• Teeft :
  • Absolute overpotential, Acta, Active surface, Additive, Adsorption, Adsorption phenomena, Ambient temperature, Anodic charge transfer, Average value, Bath composition, Broad range, Bulk concentrations, Bulk solution, Capacitance, Cathode surface, Charge transfer, Charge transfer resistance, Chemical composition, Chloride, Chloride ions, Complexation phenomena, Constant phase element, Copper deposition, Copper electrodeposition, Copper sulfate, Copper surface, Coverage fraction, Cupric, Cupric ions, Cuprous, Cuprous ions, Current densities, Current density, Current peak, Cuso4, Deposition, Disk electrode, Double layer capacitance, Electrochemical investigations, Electrochimica, Electrochimica acta, Electrode, Electrode impedance, Electrode surface, Electrolyte solutions, Electrolytic, Electrolytic bath, Electron transfer, Electrostatic phenomena, Elsevier science, Experimental data, Frequency domain, Frequency loop, Goldbach, Good agreement, High overpotentials, Impedance, Impedance measurements, Impedance parameter, Impedance spectra, Industrial relevancy, Inert molecules, Kinetic parameters, Linear voltammetry, Lower extent, Metal interface, Nacl, Overpotential, Overpotential range, Overpotentials, Physical parameters, Plating surf, Polypropylene ether, Potential range, Previous investigations, Production lines, Reference solution, Rotation rate, Rsol, Scan rate, Second loop, Simultaneous presence, Sodium chloride, Sodium chloride concentrations, Standard potentials, Sudden inhibition, Sulfate, Sulfate bath, Sulfuric, Sulfuric acid, Sulfuric solutions, Voltammetric, Voltammetric curves, Voltammetry.

Abstract

• https://api.istex.fr/document/F838FABE8735F74E97C1B679F0D1C16A6491076B/fulltext/pdf

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