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Float zone growth and spectroscopic characterization of Tm:GdVO4 single crystals

Identifieur interne : 001B49 ( Main/Exploration ); précédent : 001B48; suivant : 001B50

Float zone growth and spectroscopic characterization of Tm:GdVO4 single crystals

Auteurs : M. Higuchi [Japon] ; K. Kodaira [Japon] ; Y. Urata [Japon] ; S. Wada [Japon] ; H. Machida [Japon]

Source :

RBID : Pascal:04-0437434

Descripteurs français

English descriptors

Abstract

Heavily Tm-doped (5-20 at%) GdVO4 single crystals were successfully grown by the floating zone method. All the grown crystals had no cracks and no inclusions for any dopant concentration. Low-angle grain boundary-free crystals were easily grown along the [110] direction whereas the crystals grown along the [001] direction comprised a few low-angle grain boundaries. The formation of bubble inclusions was effectively suppressed by optimizing growth rates and rotation rates. The absorption coefficient around 800 nm was large enough for pumping with a laser diode of 808 nm, which is conventionally used for Nd lasers. Intensive emission was observed even above 1950 nm where the self-absorption could be neglected. The fluorescence decay time decreased from 2.1 to 0.5 ms with increasing Tm concentration but is long enough for laser oscillation.


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Le document en format XML

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<title xml:lang="en" level="a">Float zone growth and spectroscopic characterization of Tm:GdVO
<sub>4</sub>
single crystals</title>
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<title xml:lang="en" level="a">Float zone growth and spectroscopic characterization of Tm:GdVO
<sub>4</sub>
single crystals</title>
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<name sortKey="Kodaira, K" sort="Kodaira, K" uniqKey="Kodaira K" first="K." last="Kodaira">K. Kodaira</name>
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<name sortKey="Machida, H" sort="Machida, H" uniqKey="Machida H" first="H." last="Machida">H. Machida</name>
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<keywords scheme="KwdEn" xml:lang="en">
<term>Absorption coefficients</term>
<term>Crystal growth from melts</term>
<term>Doping</term>
<term>Experimental study</term>
<term>Floating zone</term>
<term>Gadolinium oxides</term>
<term>Grain boundaries</term>
<term>Growth rate</term>
<term>Inclusions</term>
<term>Monocrystals</term>
<term>Photoluminescence</term>
<term>Quantity ratio</term>
<term>Self-absorption</term>
<term>Ternary compounds</term>
<term>Thulium additions</term>
<term>Vanadium oxides</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr">
<term>Etude expérimentale</term>
<term>Croissance cristalline en phase fondue</term>
<term>Zone flottante</term>
<term>Dopage</term>
<term>Addition thulium</term>
<term>Effet concentration</term>
<term>Joint grain</term>
<term>Inclusion</term>
<term>Taux croissance</term>
<term>Coefficient absorption</term>
<term>Autoabsorption</term>
<term>Photoluminescence</term>
<term>Monocristal</term>
<term>Gadolinium oxyde</term>
<term>Vanadium oxyde</term>
<term>Composé ternaire</term>
<term>GdVO4</term>
<term>Gd O V</term>
<term>8110F</term>
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<term>Dopage</term>
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<div type="abstract" xml:lang="en">Heavily Tm-doped (5-20 at%) GdVO
<sub>4</sub>
single crystals were successfully grown by the floating zone method. All the grown crystals had no cracks and no inclusions for any dopant concentration. Low-angle grain boundary-free crystals were easily grown along the [110] direction whereas the crystals grown along the [001] direction comprised a few low-angle grain boundaries. The formation of bubble inclusions was effectively suppressed by optimizing growth rates and rotation rates. The absorption coefficient around 800 nm was large enough for pumping with a laser diode of 808 nm, which is conventionally used for Nd lasers. Intensive emission was observed even above 1950 nm where the self-absorption could be neglected. The fluorescence decay time decreased from 2.1 to 0.5 ms with increasing Tm concentration but is long enough for laser oscillation.</div>
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