NickelMaghrebV1, PascalFrancis, Curation, bibRecord, 000415

Kinetics of growth and consumption of Ni rich phases

Identifieur interne : 000415 ( PascalFrancis/Curation ); précédent : 000414; suivant : 000416

Kinetics of growth and consumption of Ni rich phases

Auteurs : G. Tellouche-Derafa [Algérie, France] ; K. Hoummada [France] ; A. Derafa [Algérie] ; I. Blum [France] ; A. Portavoce [France] ; D. Mangelinck [France]

Source :

Microelectronic engineering [ 0167-9317 ] ; 2014.

RBID : Pascal:14-0138911

Descripteurs français

Pascal (Inist)
- Cinétique, In situ, Diffraction RX, Recuit isotherme, Durée vie, Epaisseur, Phénomène transitoire, Modèle thermodynamique, Nickel, 6580.
Wicri :
- topic : Nickel.

English descriptors

KwdEn :
- In situ, Isothermal annealing, Kinetics, Lifetime, Nickel, Thermodynamic model, Thickness, Transients, XRD.

Abstract

In situ X-ray diffraction measurements performed during isothermal annealing show that the life time of θ-Ni₂Si depends on the initial Ni thickness. A slow kinetic of consumption of θ-Ni₂Si is observed during the reaction of 50 nm Ni with Si substrate, while a fast rate of consumption of θ-Ni₂Si is observed when θ-Ni₂Si is a transient phase. The kinetics of growth and consumption of Ni-rich phases is discussed.

A01	`01`	`1`		`@0 0167-9317`
A02	`01`			`@0 MIENEF`
A03		`1`		`@0 Microelectron. eng.`
A05				`@2 120`
A08	`01`	`1`	`ENG`	`@1 Kinetics of growth and consumption of Ni rich phases`
A09	`01`	`1`	`ENG`	`@1 MAM 2013, March 10-13, Leuven, Belgium`
A11	`01`	`1`		`@1 TELLOUCHE-DERAFA (G.)`
A11	`02`	`1`		`@1 HOUMMADA (K.)`
A11	`03`	`1`		`@1 DERAFA (A.)`
A11	`04`	`1`		`@1 BLUM (I.)`
A11	`05`	`1`		`@1 PORTAVOCE (A.)`
A11	`06`	`1`		`@1 MANGELINCK (D.)`
A12	`01`	`1`		`@1 WILSON (Christopher J.) @9 ed.`
A12	`02`	`1`		`@1 DETAVERNIER (Christophe) @9 ed.`
A14	`01`			`@1 Département de physique, Faculté des sciences, Université de M'sila @2 M'sila 28000 @3 DZA @Z 1 aut.`
A14	`02`			`@1 IM2NP, Aix Marseille, CNRS, case 142 @2 13397 Marseille @3 FRA @Z 1 aut. @Z 2 aut. @Z 4 aut. @Z 5 aut. @Z 6 aut.`
A14	`03`			`@1 Laboratoire LP3M, Département d'Optique et Mécanique de Précision, Université de Sétif @2 Sétif 19000 @3 DZA @Z 3 aut.`
A15	`01`			`@1 Imec @3 BEL @Z 1 aut.`
A15	`02`			`@1 University of Ghent @3 BEL @Z 2 aut.`
A18	`01`	`1`		`@1 Imec @2 Leuven @3 BEL @9 org-cong.`
A18	`02`	`1`		`@1 University of Ghent @2 Ghent @3 BEL @9 org-cong.`
A20				`@1 146-149`
A21				`@1 2014`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 20003 @5 354000503267770230`
A44				`@0 0000 @1 © 2014 INIST-CNRS. All rights reserved.`
A45				`@0 23 ref.`
A47	`01`	`1`		`@0 14-0138911`
A60				`@1 P @2 C`
A61				`@0 A`
A64	`01`	`1`		`@0 Microelectronic engineering`
A66	`01`			`@0 NLD`
C01	`01`		`ENG`	`@0 In situ X-ray diffraction measurements performed during isothermal annealing show that the life time of θ-Ni₂Si depends on the initial Ni thickness. A slow kinetic of consumption of θ-Ni₂Si is observed during the reaction of 50 nm Ni with Si substrate, while a fast rate of consumption of θ-Ni₂Si is observed when θ-Ni₂Si is a transient phase. The kinetics of growth and consumption of Ni-rich phases is discussed.`
C02	`01`	`3`		`@0 001B60E80`
C03	`01`	`3`	`FRE`	`@0 Cinétique @5 01`
C03	`01`	`3`	`ENG`	`@0 Kinetics @5 01`
C03	`02`	`X`	`FRE`	`@0 In situ @5 02`
C03	`02`	`X`	`ENG`	`@0 In situ @5 02`
C03	`02`	`X`	`SPA`	`@0 In situ @5 02`
C03	`03`	`3`	`FRE`	`@0 Diffraction RX @5 03`
C03	`03`	`3`	`ENG`	`@0 XRD @5 03`
C03	`04`	`X`	`FRE`	`@0 Recuit isotherme @5 04`
C03	`04`	`X`	`ENG`	`@0 Isothermal annealing @5 04`
C03	`04`	`X`	`SPA`	`@0 Recocido isotérmico @5 04`
C03	`05`	`3`	`FRE`	`@0 Durée vie @5 05`
C03	`05`	`3`	`ENG`	`@0 Lifetime @5 05`
C03	`06`	`3`	`FRE`	`@0 Epaisseur @5 06`
C03	`06`	`3`	`ENG`	`@0 Thickness @5 06`
C03	`07`	`3`	`FRE`	`@0 Phénomène transitoire @5 07`
C03	`07`	`3`	`ENG`	`@0 Transients @5 07`
C03	`08`	`3`	`FRE`	`@0 Modèle thermodynamique @5 08`
C03	`08`	`3`	`ENG`	`@0 Thermodynamic model @5 08`
C03	`09`	`3`	`FRE`	`@0 Nickel @2 NC @5 22`
C03	`09`	`3`	`ENG`	`@0 Nickel @2 NC @5 22`
C03	`10`	`3`	`FRE`	`@0 6580 @4 INC @5 56`
N21				`@1 181`
N44	`01`			`@1 OTO`
N82				`@1 OTO`

A30	`01`	`1`	`ENG`	`@1 MAM2013 Materials for Advanced Metallization Workshop @2 22 @3 Leuven BEL @4 2013-03-10`

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Pascal:14-0138911

Le document en format XML

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<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Kinetics of growth and consumption of Ni rich phases</title>
<author><name sortKey="Tellouche Derafa, G" sort="Tellouche Derafa, G" uniqKey="Tellouche Derafa G" first="G." last="Tellouche-Derafa">G. Tellouche-Derafa</name>
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<author><name sortKey="Derafa, A" sort="Derafa, A" uniqKey="Derafa A" first="A." last="Derafa">A. Derafa</name>
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<s2>Sétif 19000</s2>
<s3>DZA</s3>
<sZ>3 aut.</sZ>
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<country>Algérie</country>
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<author><name sortKey="Blum, I" sort="Blum, I" uniqKey="Blum I" first="I." last="Blum">I. Blum</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>IM2NP, Aix Marseille, CNRS, case 142</s1>
<s2>13397 Marseille</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
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</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Portavoce, A" sort="Portavoce, A" uniqKey="Portavoce A" first="A." last="Portavoce">A. Portavoce</name>
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</analytic>
<series><title level="j" type="main">Microelectronic engineering</title>
<title level="j" type="abbreviated">Microelectron. eng.</title>
<idno type="ISSN">0167-9317</idno>
<imprint><date when="2014">2014</date>
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>In situ</term>
<term>Isothermal annealing</term>
<term>Kinetics</term>
<term>Lifetime</term>
<term>Nickel</term>
<term>Thermodynamic model</term>
<term>Thickness</term>
<term>Transients</term>
<term>XRD</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Cinétique</term>
<term>In situ</term>
<term>Diffraction RX</term>
<term>Recuit isotherme</term>
<term>Durée vie</term>
<term>Epaisseur</term>
<term>Phénomène transitoire</term>
<term>Modèle thermodynamique</term>
<term>Nickel</term>
<term>6580</term>
</keywords>
<keywords scheme="Wicri" type="topic" xml:lang="fr"><term>Nickel</term>
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<front><div type="abstract" xml:lang="en">In situ X-ray diffraction measurements performed during isothermal annealing show that the life time of θ-Ni<sub>2</sub>
Si depends on the initial Ni thickness. A slow kinetic of consumption of θ-Ni<sub>2</sub>
Si is observed during the reaction of 50 nm Ni with Si substrate, while a fast rate of consumption of θ-Ni<sub>2</sub>
Si is observed when θ-Ni<sub>2</sub>
Si is a transient phase. The kinetics of growth and consumption of Ni-rich phases is discussed.</div>
</front>
</TEI>
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<fA03 i2="1"><s0>Microelectron. eng.</s0>
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<fA05><s2>120</s2>
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<fA08 i1="01" i2="1" l="ENG"><s1>Kinetics of growth and consumption of Ni rich phases</s1>
</fA08>
<fA09 i1="01" i2="1" l="ENG"><s1>MAM 2013, March 10-13, Leuven, Belgium</s1>
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<fA11 i1="01" i2="1"><s1>TELLOUCHE-DERAFA (G.)</s1>
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<fA11 i1="02" i2="1"><s1>HOUMMADA (K.)</s1>
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<fA11 i1="03" i2="1"><s1>DERAFA (A.)</s1>
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<fA11 i1="04" i2="1"><s1>BLUM (I.)</s1>
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<fA11 i1="06" i2="1"><s1>MANGELINCK (D.)</s1>
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<fA12 i1="01" i2="1"><s1>WILSON (Christopher J.)</s1>
<s9>ed.</s9>
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<fA12 i1="02" i2="1"><s1>DETAVERNIER (Christophe)</s1>
<s9>ed.</s9>
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<fA14 i1="01"><s1>Département de physique, Faculté des sciences, Université de M'sila</s1>
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<fA14 i1="02"><s1>IM2NP, Aix Marseille, CNRS, case 142</s1>
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<s3>FRA</s3>
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<fA14 i1="03"><s1>Laboratoire LP3M, Département d'Optique et Mécanique de Précision, Université de Sétif</s1>
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<sZ>3 aut.</sZ>
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<fA15 i1="01"><s1>Imec</s1>
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<fA15 i1="02"><s1>University of Ghent</s1>
<s3>BEL</s3>
<sZ>2 aut.</sZ>
</fA15>
<fA18 i1="01" i2="1"><s1>Imec</s1>
<s2>Leuven</s2>
<s3>BEL</s3>
<s9>org-cong.</s9>
</fA18>
<fA18 i1="02" i2="1"><s1>University of Ghent</s1>
<s2>Ghent</s2>
<s3>BEL</s3>
<s9>org-cong.</s9>
</fA18>
<fA20><s1>146-149</s1>
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<fA21><s1>2014</s1>
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</fA23>
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<fC01 i1="01" l="ENG"><s0>In situ X-ray diffraction measurements performed during isothermal annealing show that the life time of θ-Ni<sub>2</sub>
Si depends on the initial Ni thickness. A slow kinetic of consumption of θ-Ni<sub>2</sub>
Si is observed during the reaction of 50 nm Ni with Si substrate, while a fast rate of consumption of θ-Ni<sub>2</sub>
Si is observed when θ-Ni<sub>2</sub>
Si is a transient phase. The kinetics of growth and consumption of Ni-rich phases is discussed.</s0>
</fC01>
<fC02 i1="01" i2="3"><s0>001B60E80</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE"><s0>Cinétique</s0>
<s5>01</s5>
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<fC03 i1="01" i2="3" l="ENG"><s0>Kinetics</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="X" l="FRE"><s0>In situ</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="X" l="ENG"><s0>In situ</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="X" l="SPA"><s0>In situ</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE"><s0>Diffraction RX</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG"><s0>XRD</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="X" l="FRE"><s0>Recuit isotherme</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="ENG"><s0>Isothermal annealing</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="SPA"><s0>Recocido isotérmico</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Durée vie</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Lifetime</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE"><s0>Epaisseur</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Thickness</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE"><s0>Phénomène transitoire</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="3" l="ENG"><s0>Transients</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE"><s0>Modèle thermodynamique</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="3" l="ENG"><s0>Thermodynamic model</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>Nickel</s0>
<s2>NC</s2>
<s5>22</s5>
</fC03>
<fC03 i1="09" i2="3" l="ENG"><s0>Nickel</s0>
<s2>NC</s2>
<s5>22</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE"><s0>6580</s0>
<s4>INC</s4>
<s5>56</s5>
</fC03>
<fN21><s1>181</s1>
</fN21>
<fN44 i1="01"><s1>OTO</s1>
</fN44>
<fN82><s1>OTO</s1>
</fN82>
</pA>
<pR><fA30 i1="01" i2="1" l="ENG"><s1>MAM2013 Materials for Advanced Metallization Workshop</s1>
<s2>22</s2>
<s3>Leuven BEL</s3>
<s4>2013-03-10</s4>
</fA30>
</pR>
</standard>
</inist>
</record>

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	Serveur d'exploration sur le nickel au Maghreb
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Serveur d'exploration sur le nickel au Maghreb

Kinetics of growth and consumption of Ni rich phases

Kinetics of growth and consumption of Ni rich phases

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