Reactive ion beam etching (RIBE) < Reactive ion etching < Reactive ion etching systems

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List of bibliographic references

Number of relevant bibliographic references: 313.
[0-20] [0 - 20][0 - 50][20-40]

Ident.	Authors (with country if any)	Title
000302 (2013)		Towards an Integrated Mode-Locked Microlaser Based on Two-Dimensional Photonic Crystals and Graphene
000570 (2013)		Selective InAs/GaSb strained layer superlattice etch stop layers for GaSb substrate removal
000653 (2013)		Processing of photonic crystals in InP membranes by focused ion beam milling and plasma etching : Nanoscale Imaging, Fabrication and Materials Modifications using Ion Beams
000B05 (2013)		InAs Nanowires Grown by Metal-Organic Vapor-Phase Epitaxy (MOVPE) Employing PS/PMMA Diblock Copolymer Nanopatterning
002039 (2012)		An efficient light-harvesting scheme using SiO2 nanorods for InGaN multiple quantum well solar cells
002090 (2012)		A modified offset roll printing for thin film transistor applications
002663 (2011)		Quantum confined carrier transition in a GaN/InGaN/GaN single quantum well bounded by AlGaN barriers
002A56 (2011)		Low resistance Mo/AI/Mo/Au ohmic contact scheme to InAIN/AIN/GaN heterostructure
002D04 (2011)		ICP-RIE etching of self-aligned InP based HBTs with Cl2/N2 chemistry
003B47 (2010)		Pattern transfer optimization for the fabrication of arrays of silicon nanowires
003B93 (2010)		Optical bistability in InP/InAlGaAs multi-quantum-well semiconductor ring lasers
004359 (2010)		Effects of Nanometer-Scale Photonic Crystal Structures on the Light Extraction From GaN Light-Emitting Diodes
004432 (2010)		Dry etching of TiO2/SiO2 DBR mirrors for tunable optical sensor arrays
005485 (2009)		Etch characteristics of indium zinc oxide thin films using inductively coupled plasma of a Cl2/Ar gas
005486 (2009)		Etch characteristics of indium zinc oxide thin films in a C2F6/Ar plasma
005E73 (2008)		Secrets of GaN substrate properties for high luminousity of InGaN quantum wells
005F02 (2008)		Reduction of RIE Induced Damage of GaInAsP/InP DQW Lasers Fabricated by 2-step Growth
006363 (2008)		Length Dependences of In-Plane Polarizations Anisotropy in GaInAsP/InP Quantum-Wire Structures Fabricated by Dry Etching and Regrowth process
006407 (2008)		Introduction of defects during the dry etching of InP photonic structures : a cathodo-luminescence study
006729 (2008)		Fabrication of self-aligned ridge waveguide lasers with spot-size converter for quantum well intermixed superluminescent diodes
006D73 (2007)		Very low pressure magnetron reactive ion etching of GaN and AlxGa1- xN using dichlorofluoromethane (Halocarbon 12)

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