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High resolution X-ray diffraction study of InAs layers grown with and without bismuth flow on GaAs substrates by metalorganic vapor phase epitaxy

Identifieur interne : 001A99 ( Main/Repository ); précédent : 001A98; suivant : 001B00

High resolution X-ray diffraction study of InAs layers grown with and without bismuth flow on GaAs substrates by metalorganic vapor phase epitaxy

Auteurs : RBID : Pascal:12-0201159

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English descriptors

Abstract

InAs layers were grown with and without bismuth flow by atmospheric pressure metalorganic vapor phase epitaxy on exactly oriented, 2° and 10° misoriented (100) GaAs substrates. Structural analysis was carried out using high resolution X-ray diffraction. Without bismuth flow, only InAs layers grown on 10° misoriented substrates exhibit a mosaic structure. Layers grown on exactly oriented and 2° misoriented substrates show large full widths at half maxima of their diffraction rocking curves. Growing InAs under bismuth flow leads to the reduction of this full width indicating a clear improvement of their structural quality. Particularly for samples grown on 10° misoriented substrates, a complete disappearance of the mosaic structure was obtained. The crystalline quality improvement is attributed to the contribution of Bi nanodots in relieving strain.

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Pascal:12-0201159

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<term>Dislocation density</term>
<term>Indium arsenides</term>
<term>MOVPE method</term>
<term>Mosaic structure</term>
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<term>Nanostructures</term>
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<term>Rocking curve</term>
<term>Scanning electron microscopy</term>
<term>Thickness</term>
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<div type="abstract" xml:lang="en">InAs layers were grown with and without bismuth flow by atmospheric pressure metalorganic vapor phase epitaxy on exactly oriented, 2
<sub>°</sub>
and 10°
<sub> </sub>
misoriented (100) GaAs substrates. Structural analysis was carried out using high resolution X-ray diffraction. Without bismuth flow, only InAs layers grown on 10
<sub>°</sub>
misoriented substrates exhibit a mosaic structure. Layers grown on exactly oriented and 2° misoriented substrates show large full widths at half maxima of their diffraction rocking curves. Growing InAs under bismuth flow leads to the reduction of this full width indicating a clear improvement of their structural quality. Particularly for samples grown on 10
<sub>°</sub>
misoriented substrates, a complete disappearance of the mosaic structure was obtained. The crystalline quality improvement is attributed to the contribution of Bi nanodots in relieving strain.</div>
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<sub>°</sub>
and 10°
<sub> </sub>
misoriented (100) GaAs substrates. Structural analysis was carried out using high resolution X-ray diffraction. Without bismuth flow, only InAs layers grown on 10
<sub>°</sub>
misoriented substrates exhibit a mosaic structure. Layers grown on exactly oriented and 2° misoriented substrates show large full widths at half maxima of their diffraction rocking curves. Growing InAs under bismuth flow leads to the reduction of this full width indicating a clear improvement of their structural quality. Particularly for samples grown on 10
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