Self-Equilibration of the Diameter of Ga-Catalyzed GaAs Nanowires.
Identifieur interne : 002845 ( Main/Exploration ); précédent : 002844; suivant : 002846Self-Equilibration of the Diameter of Ga-Catalyzed GaAs Nanowires.
Auteurs : V G Dubrovskii [Russie] ; T. Xu [France] ; A Díaz Álvarez [France] ; S R Plissard [France] ; P. Caroff [France] ; F. Glas [France] ; B. Grandidier [France]Source :
- Nano letters [ 1530-6992 ] ; 2015.
Abstract
Designing strategies to reach monodispersity in fabrication of semiconductor nanowire ensembles is essential for numerous applications. When Ga-catalyzed GaAs nanowire arrays are grown by molecular beam epitaxy with help of droplet-engineering, we observe a significant narrowing of the diameter distribution of the final nanowire array with respect to the size distribution of the initial Ga droplets. Considering that the droplet serves as a nonequilibrium reservoir of a group III metal, we develop a model that demonstrates a self-equilibration effect on the droplet size in self-catalyzed III-V nanowires. This effect leads to arrays of nanowires with a high degree of uniformity regardless of the initial conditions, while the stationary diameter can be further finely tuned by varying the spacing of the array pitch on patterned Si substrates.
DOI: 10.1021/acs.nanolett.5b02226
PubMed: 26189571
Affiliations:
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<front><div type="abstract" xml:lang="en">Designing strategies to reach monodispersity in fabrication of semiconductor nanowire ensembles is essential for numerous applications. When Ga-catalyzed GaAs nanowire arrays are grown by molecular beam epitaxy with help of droplet-engineering, we observe a significant narrowing of the diameter distribution of the final nanowire array with respect to the size distribution of the initial Ga droplets. Considering that the droplet serves as a nonequilibrium reservoir of a group III metal, we develop a model that demonstrates a self-equilibration effect on the droplet size in self-catalyzed III-V nanowires. This effect leads to arrays of nanowires with a high degree of uniformity regardless of the initial conditions, while the stationary diameter can be further finely tuned by varying the spacing of the array pitch on patterned Si substrates.</div>
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