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GMR versus interfacial roughness induced from different buffers in (Co/Cu) ML

Identifieur interne : 000399 ( PascalFrancis/Curation ); précédent : 000398; suivant : 000400

GMR versus interfacial roughness induced from different buffers in (Co/Cu) ML

Auteurs : M. El Harfaoui [France] ; H. Le Gall [France] ; J. Ben Youssef [France] ; S. Pogossian [France] ; A. Thiaville [France] ; P. Gogol [France] ; A. Qachaou [Maroc] ; J. M. Desvignes [France]

Source :

RBID : Pascal:99-0317962

Descripteurs français

English descriptors

Abstract

The correlation between the giant magnetoresistance AR/R, at the first maximum of the oscillating thickness dependence of the magnetoresistance (MR), and the structural and magnetic parameters has been investigated in (Co/Cu) multilayers (ML) deposited by the unusual RF sputtering method. Different textures and interface roughnesses have been induced from magnetic (Fe, Co) and non-magnetic (Cu, Al, Ta, Cr) buffers. The MR is independent of the ML texture and grain size but presents a strong correlation with the interface as deduced from small and large angle XRD and AFM. In high roughness ML the evolution, under increasing applied field, of AR/R versus (M/Ms)2 presents a strong deviation from a standard linear dependence. Such a deviation is attributed to the presence of Co granules in the Cu or/ and the buffer matrices when strong interface disorder is induced in the samples.
pA  
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A02 01      @0 JMMMDC
A03   1    @0 J. magn. magn. mater.
A05       @2 198-99
A08 01  1  ENG  @1 GMR versus interfacial roughness induced from different buffers in (Co/Cu) ML
A09 01  1  ENG  @1 Proceedings of the Third International Symposium on Metallic Multilayers (MML'98)
A11 01  1    @1 EL HARFAOUI (M.)
A11 02  1    @1 LE GALL (H.)
A11 03  1    @1 BEN YOUSSEF (J.)
A11 04  1    @1 POGOSSIAN (S.)
A11 05  1    @1 THIAVILLE (A.)
A11 06  1    @1 GOGOL (P.)
A11 07  1    @1 QACHAOU (A.)
A11 08  1    @1 DESVIGNES (J. M.)
A12 01  1    @1 HEINRICH (B.) @9 ed.
A12 02  1    @1 COCHRAN (J. F.) @9 ed.
A12 03  1    @1 VENUS (D.) @9 ed.
A14 01      @1 CNRS-LPSB @2 92195 Meudon-Bellevue @3 FRA @Z 1 aut. @Z 2 aut. @Z 3 aut. @Z 4 aut. @Z 8 aut.
A14 02      @1 CNRS-LPS, Université d'Orsay @2 91405 @3 FRA @Z 5 aut. @Z 6 aut.
A14 03      @1 LPMC, Fac. Sci. Ibn Tofail BP 133 @2 Kénitra @3 MAR @Z 7 aut.
A20       @1 107-109
A21       @1 1999
A23 01      @0 ENG
A43 01      @1 INIST @2 17230 @5 354000085341670350
A44       @0 0000 @1 © 1999 INIST-CNRS. All rights reserved.
A45       @0 9 ref.
A47 01  1    @0 99-0317962
A60       @1 P @2 C
A61       @0 A
A64 01  1    @0 Journal of magnetism and magnetic materials
A66 01      @0 NLD
C01 01    ENG  @0 The correlation between the giant magnetoresistance AR/R, at the first maximum of the oscillating thickness dependence of the magnetoresistance (MR), and the structural and magnetic parameters has been investigated in (Co/Cu) multilayers (ML) deposited by the unusual RF sputtering method. Different textures and interface roughnesses have been induced from magnetic (Fe, Co) and non-magnetic (Cu, Al, Ta, Cr) buffers. The MR is independent of the ML texture and grain size but presents a strong correlation with the interface as deduced from small and large angle XRD and AFM. In high roughness ML the evolution, under increasing applied field, of AR/R versus (M/Ms)2 presents a strong deviation from a standard linear dependence. Such a deviation is attributed to the presence of Co granules in the Cu or/ and the buffer matrices when strong interface disorder is induced in the samples.
C02 01  3    @0 001B70E70P
C02 02  X    @0 240
C03 01  3  FRE  @0 Etude expérimentale @5 01
C03 01  3  ENG  @0 Experimental study @5 01
C03 02  3  FRE  @0 Magnétorésistance géante @5 02
C03 02  3  ENG  @0 Giant magnetoresistance @5 02
C03 03  3  FRE  @0 Multicouche @5 03
C03 03  3  ENG  @0 Multilayers @5 03
C03 04  X  FRE  @0 Couche tampon @5 04
C03 04  X  ENG  @0 Buffer layer @5 04
C03 04  X  SPA  @0 Capa tampón @5 04
C03 05  X  FRE  @0 Relation structure propriété @5 05
C03 05  X  ENG  @0 Property structure relationship @5 05
C03 05  X  SPA  @0 Relación estructura propiedad @5 05
C03 06  3  FRE  @0 Structure interface @5 06
C03 06  3  ENG  @0 Interface structure @5 06
C03 07  3  FRE  @0 Rugosité @5 07
C03 07  3  ENG  @0 Roughness @5 07
C03 08  3  FRE  @0 Aimantation @5 08
C03 08  3  ENG  @0 Magnetization @5 08
C03 09  3  FRE  @0 Effet dimensionnel @5 10
C03 09  3  ENG  @0 Size effect @5 10
C03 10  3  FRE  @0 Cobalt @2 NC @5 15
C03 10  3  ENG  @0 Cobalt @2 NC @5 15
C03 11  3  FRE  @0 Cuivre @2 NC @5 16
C03 11  3  ENG  @0 Copper @2 NC @5 16
C03 12  3  FRE  @0 Aluminium @2 NC @5 17
C03 12  3  ENG  @0 Aluminium @2 NC @5 17
C03 13  3  FRE  @0 Tantale @2 NC @5 18
C03 13  3  ENG  @0 Tantalum @2 NC @5 18
C03 14  3  FRE  @0 Chrome @2 NC @5 19
C03 14  3  ENG  @0 Chromium @2 NC @5 19
C03 15  3  FRE  @0 Co @4 INC @5 52
C03 16  3  FRE  @0 Cu @4 INC @5 53
C03 17  3  FRE  @0 Al @4 INC @5 54
C03 18  3  FRE  @0 Ta @4 INC @5 55
C03 19  3  FRE  @0 7570P @2 PAC @4 INC @5 56
C03 20  3  FRE  @0 Cr @4 INC @5 92
C07 01  3  FRE  @0 Métal transition @5 48
C07 01  3  ENG  @0 Transition elements @5 48
N21       @1 200
pR  
A30 01  1  ENG  @1 MML98 International Symposium on Metallic Multilayers @2 3 @3 Vancouver CAN @4 1998-06-14

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<div type="abstract" xml:lang="en">The correlation between the giant magnetoresistance AR/R, at the first maximum of the oscillating thickness dependence of the magnetoresistance (MR), and the structural and magnetic parameters has been investigated in (Co/Cu) multilayers (ML) deposited by the unusual RF sputtering method. Different textures and interface roughnesses have been induced from magnetic (Fe, Co) and non-magnetic (Cu, Al, Ta, Cr) buffers. The MR is independent of the ML texture and grain size but presents a strong correlation with the interface as deduced from small and large angle XRD and AFM. In high roughness ML the evolution, under increasing applied field, of AR/R versus (M/M
<sub>s</sub>
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<s0>A</s0>
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<fA64 i1="01" i2="1">
<s0>Journal of magnetism and magnetic materials</s0>
</fA64>
<fA66 i1="01">
<s0>NLD</s0>
</fA66>
<fC01 i1="01" l="ENG">
<s0>The correlation between the giant magnetoresistance AR/R, at the first maximum of the oscillating thickness dependence of the magnetoresistance (MR), and the structural and magnetic parameters has been investigated in (Co/Cu) multilayers (ML) deposited by the unusual RF sputtering method. Different textures and interface roughnesses have been induced from magnetic (Fe, Co) and non-magnetic (Cu, Al, Ta, Cr) buffers. The MR is independent of the ML texture and grain size but presents a strong correlation with the interface as deduced from small and large angle XRD and AFM. In high roughness ML the evolution, under increasing applied field, of AR/R versus (M/M
<sub>s</sub>
)
<sup>2</sup>
presents a strong deviation from a standard linear dependence. Such a deviation is attributed to the presence of Co granules in the Cu or/ and the buffer matrices when strong interface disorder is induced in the samples.</s0>
</fC01>
<fC02 i1="01" i2="3">
<s0>001B70E70P</s0>
</fC02>
<fC02 i1="02" i2="X">
<s0>240</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE">
<s0>Etude expérimentale</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG">
<s0>Experimental study</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE">
<s0>Magnétorésistance géante</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG">
<s0>Giant magnetoresistance</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE">
<s0>Multicouche</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG">
<s0>Multilayers</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="X" l="FRE">
<s0>Couche tampon</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="ENG">
<s0>Buffer layer</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="SPA">
<s0>Capa tampón</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="X" l="FRE">
<s0>Relation structure propriété</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="X" l="ENG">
<s0>Property structure relationship</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="X" l="SPA">
<s0>Relación estructura propiedad</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE">
<s0>Structure interface</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG">
<s0>Interface structure</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE">
<s0>Rugosité</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="3" l="ENG">
<s0>Roughness</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE">
<s0>Aimantation</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="3" l="ENG">
<s0>Magnetization</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE">
<s0>Effet dimensionnel</s0>
<s5>10</s5>
</fC03>
<fC03 i1="09" i2="3" l="ENG">
<s0>Size effect</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE">
<s0>Cobalt</s0>
<s2>NC</s2>
<s5>15</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG">
<s0>Cobalt</s0>
<s2>NC</s2>
<s5>15</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE">
<s0>Cuivre</s0>
<s2>NC</s2>
<s5>16</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG">
<s0>Copper</s0>
<s2>NC</s2>
<s5>16</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE">
<s0>Aluminium</s0>
<s2>NC</s2>
<s5>17</s5>
</fC03>
<fC03 i1="12" i2="3" l="ENG">
<s0>Aluminium</s0>
<s2>NC</s2>
<s5>17</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE">
<s0>Tantale</s0>
<s2>NC</s2>
<s5>18</s5>
</fC03>
<fC03 i1="13" i2="3" l="ENG">
<s0>Tantalum</s0>
<s2>NC</s2>
<s5>18</s5>
</fC03>
<fC03 i1="14" i2="3" l="FRE">
<s0>Chrome</s0>
<s2>NC</s2>
<s5>19</s5>
</fC03>
<fC03 i1="14" i2="3" l="ENG">
<s0>Chromium</s0>
<s2>NC</s2>
<s5>19</s5>
</fC03>
<fC03 i1="15" i2="3" l="FRE">
<s0>Co</s0>
<s4>INC</s4>
<s5>52</s5>
</fC03>
<fC03 i1="16" i2="3" l="FRE">
<s0>Cu</s0>
<s4>INC</s4>
<s5>53</s5>
</fC03>
<fC03 i1="17" i2="3" l="FRE">
<s0>Al</s0>
<s4>INC</s4>
<s5>54</s5>
</fC03>
<fC03 i1="18" i2="3" l="FRE">
<s0>Ta</s0>
<s4>INC</s4>
<s5>55</s5>
</fC03>
<fC03 i1="19" i2="3" l="FRE">
<s0>7570P</s0>
<s2>PAC</s2>
<s4>INC</s4>
<s5>56</s5>
</fC03>
<fC03 i1="20" i2="3" l="FRE">
<s0>Cr</s0>
<s4>INC</s4>
<s5>92</s5>
</fC03>
<fC07 i1="01" i2="3" l="FRE">
<s0>Métal transition</s0>
<s5>48</s5>
</fC07>
<fC07 i1="01" i2="3" l="ENG">
<s0>Transition elements</s0>
<s5>48</s5>
</fC07>
<fN21>
<s1>200</s1>
</fN21>
</pA>
<pR>
<fA30 i1="01" i2="1" l="ENG">
<s1>MML98 International Symposium on Metallic Multilayers</s1>
<s2>3</s2>
<s3>Vancouver CAN</s3>
<s4>1998-06-14</s4>
</fA30>
</pR>
</standard>
</inist>
</record>

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