CobaltMaghrebV1, PascalFrancis, Curation, bibRecord, 000242

Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

Identifieur interne : 000242 ( PascalFrancis/Curation ); précédent : 000241; suivant : 000243

Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

Auteurs : MOHAMED REDHA KHELLADI [Algérie] ; Loubna Mentar [Algérie] ; Amor Azizi [Algérie] ; Figen Kadirgan [Turquie] ; Guy Schmerber [France] ; Aziz Dinia [France]

Source :

Applied surface science [ 0169-4332 ] ; 2012.

RBID : Pascal:12-0316125

Descripteurs français

Pascal (Inist)
- Nucléation, Nanostructure, Silicium, Croissance film, Dépôt électrolytique, Cobalt, Métal transition, Si, Co.
Wicri :
- topic : Cobalt.

English descriptors

KwdEn :
- Cobalt, Electrodeposition, Film growth, Nanostructures, Nucleation, Silicon, Transition elements.

Abstract

In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106cm^-2 and 10^-5 cm² s^-1, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .

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A03		`1`		`@0 Appl. surf. sci.`
A05				`@2 258`
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A08	`01`	`1`	`ENG`	`@1 Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)`
A11	`01`	`1`		`@1 MOHAMED REDHA KHELLADI`
A11	`02`	`1`		`@1 MENTAR (Loubna)`
A11	`03`	`1`		`@1 AZIZI (Amor)`
A11	`04`	`1`		`@1 KADIRGAN (Figen)`
A11	`05`	`1`		`@1 SCHMERBER (Guy)`
A11	`06`	`1`		`@1 DINIA (Aziz)`
A14	`01`			`@1 Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université F @2 Abbas-Sétif, 19000 @3 DZA @Z 1 aut. @Z 2 aut. @Z 3 aut.`
A14	`02`			`@1 Departments of Chemistry, Istanbul Technical University @2 Maslak 34469, Istanbul @3 TUR @Z 4 aut.`
A14	`03`			`@1 Institut de Physique et Chimie des Matériaux de Strasbourg (IPCMS), UMR 7504 CNRS - Université de Strasbourg, 23 rue du Loess, BP 43 @2 67034 Strasbourg @3 FRA @Z 5 aut. @Z 6 aut.`
A20				`@1 3907-3912`
A21				`@1 2012`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 16002 @5 354000506983730900`
A44				`@0 0000 @1 © 2012 INIST-CNRS. All rights reserved.`
A45				`@0 36 ref.`
A47	`01`	`1`		`@0 12-0316125`
A60				`@1 P`
A61				`@0 A`
A64	`01`	`1`		`@0 Applied surface science`
A66	`01`			`@0 NLD`
C01	`01`		`ENG`	@0 In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106cm^-2 and 10^-5 cm² s^-1, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .
C02	`01`	`3`		`@0 001B60`
C02	`02`	`3`		`@0 001B70`
C02	`03`	`3`		`@0 001B80`
C03	`01`	`3`	`FRE`	`@0 Nucléation @5 01`
C03	`01`	`3`	`ENG`	`@0 Nucleation @5 01`
C03	`02`	`3`	`FRE`	`@0 Nanostructure @5 02`
C03	`02`	`3`	`ENG`	`@0 Nanostructures @5 02`
C03	`03`	`3`	`FRE`	`@0 Silicium @2 NC @5 03`
C03	`03`	`3`	`ENG`	`@0 Silicon @2 NC @5 03`
C03	`04`	`3`	`FRE`	`@0 Croissance film @5 04`
C03	`04`	`3`	`ENG`	`@0 Film growth @5 04`
C03	`05`	`3`	`FRE`	`@0 Dépôt électrolytique @5 05`
C03	`05`	`3`	`ENG`	`@0 Electrodeposition @5 05`
C03	`06`	`3`	`FRE`	`@0 Cobalt @2 NC @5 06`
C03	`06`	`3`	`ENG`	`@0 Cobalt @2 NC @5 06`
C03	`07`	`3`	`FRE`	`@0 Métal transition @5 07`
C03	`07`	`3`	`ENG`	`@0 Transition elements @5 07`
C03	`08`	`3`	`FRE`	`@0 Si @4 INC @5 32`
C03	`09`	`3`	`FRE`	`@0 Co @4 INC @5 33`
N21				`@1 240`
N44	`01`			`@1 OTO`
N82				`@1 OTO`

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<front><div type="abstract" xml:lang="en">In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106<sup> </sup>
cm<sup>-2</sup>
 and 10<sup>-5</sup>
 cm<sup>2</sup>
 s<sup>-1</sup>
, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .</div>
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<fC01 i1="01" l="ENG"><s0>In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106<sup> </sup>
cm<sup>-2</sup>
 and 10<sup>-5</sup>
 cm<sup>2</sup>
 s<sup>-1</sup>
, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .</s0>
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	Serveur d'exploration sur le cobalt au Maghreb
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Serveur d'exploration sur le cobalt au Maghreb

Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

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