Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)
Identifieur interne : 000053 ( PascalFrancis/Corpus ); précédent : 000052; suivant : 000054Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)
Auteurs : MOHAMED REDHA KHELLADI ; Loubna Mentar ; Amor Azizi ; Figen Kadirgan ; Guy Schmerber ; Aziz DiniaSource :
- Applied surface science [ 0169-4332 ] ; 2012.
Descripteurs français
- Pascal (Inist)
English descriptors
- KwdEn :
Abstract
In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106 cm-2 and 10-5 cm2 s-1, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .
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Format Inist (serveur)
NO : | PASCAL 12-0316125 INIST |
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ET : | Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111) |
AU : | MOHAMED REDHA KHELLADI; MENTAR (Loubna); AZIZI (Amor); KADIRGAN (Figen); SCHMERBER (Guy); DINIA (Aziz) |
AF : | Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université F/Abbas-Sétif, 19000/Algérie (1 aut., 2 aut., 3 aut.); Departments of Chemistry, Istanbul Technical University/Maslak 34469, Istanbul/Turquie (4 aut.); Institut de Physique et Chimie des Matériaux de Strasbourg (IPCMS), UMR 7504 CNRS - Université de Strasbourg, 23 rue du Loess, BP 43/67034 Strasbourg/France (5 aut., 6 aut.) |
DT : | Publication en série; Niveau analytique |
SO : | Applied surface science; ISSN 0169-4332; Pays-Bas; Da. 2012; Vol. 258; No. 8; Pp. 3907-3912; Bibl. 36 ref. |
LA : | Anglais |
EA : | In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106 cm-2 and 10-5 cm2 s-1, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. . |
CC : | 001B60; 001B70; 001B80 |
FD : | Nucléation; Nanostructure; Silicium; Croissance film; Dépôt électrolytique; Cobalt; Métal transition; Si; Co |
ED : | Nucleation; Nanostructures; Silicon; Film growth; Electrodeposition; Cobalt; Transition elements |
LO : | INIST-16002.354000506983730900 |
ID : | 12-0316125 |
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Pascal:12-0316125Le document en format XML
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<front><div type="abstract" xml:lang="en">In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106<sup> </sup>
cm<sup>-2</sup>
and 10<sup>-5</sup>
cm<sup>2</sup>
s<sup>-1</sup>
, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .</div>
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cm<sup>-2</sup>
and 10<sup>-5</sup>
cm<sup>2</sup>
s<sup>-1</sup>
, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .</s0>
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<s5>02</s5>
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<server><NO>PASCAL 12-0316125 INIST</NO>
<ET>Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)</ET>
<AU>MOHAMED REDHA KHELLADI; MENTAR (Loubna); AZIZI (Amor); KADIRGAN (Figen); SCHMERBER (Guy); DINIA (Aziz)</AU>
<AF>Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université F/Abbas-Sétif, 19000/Algérie (1 aut., 2 aut., 3 aut.); Departments of Chemistry, Istanbul Technical University/Maslak 34469, Istanbul/Turquie (4 aut.); Institut de Physique et Chimie des Matériaux de Strasbourg (IPCMS), UMR 7504 CNRS - Université de Strasbourg, 23 rue du Loess, BP 43/67034 Strasbourg/France (5 aut., 6 aut.)</AF>
<DT>Publication en série; Niveau analytique</DT>
<SO>Applied surface science; ISSN 0169-4332; Pays-Bas; Da. 2012; Vol. 258; No. 8; Pp. 3907-3912; Bibl. 36 ref.</SO>
<LA>Anglais</LA>
<EA>In the present work, cobalt thin films deposited directly on n-Si(111) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer-Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 106<sup> </sup>
cm<sup>-2</sup>
and 10<sup>-5</sup>
cm<sup>2</sup>
s<sup>-1</sup>
, respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane. .</EA>
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<FD>Nucléation; Nanostructure; Silicium; Croissance film; Dépôt électrolytique; Cobalt; Métal transition; Si; Co</FD>
<ED>Nucleation; Nanostructures; Silicon; Film growth; Electrodeposition; Cobalt; Transition elements</ED>
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