Serveur d'exploration sur le cobalt au Maghreb

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Structural studies of evaporated CoxCr1-x/Si (1 0 0) and CoxCr1-x/glass thin films

Identifieur interne : 000172 ( PascalFrancis/Curation ); précédent : 000171; suivant : 000173

Structural studies of evaporated CoxCr1-x/Si (1 0 0) and CoxCr1-x/glass thin films

Auteurs : A. Kharmouche [Algérie] ; I. Djouada [Algérie]

Source :

RBID : Pascal:08-0446682

Descripteurs français

English descriptors

Abstract

Series of CoxCr1-x thin films have been evaporated under vacuum onto Si (1 0 0) and glass substrates. Chemical composition and interface properties have been studied by modelling Rutherford backscattering spectra (RBS) using SIMNRA programme. Thickness ranges from 17 to 220 nm, and x from 0.80 to 0.88. Simulation of the energy spectra shows an interdiffusion profile in the thickest films, but no diffusion is seen in thinner ones. Microscopic characterizations of the films are done with X-ray diffraction (XRD) measurements. All the samples are polycrystalline, with an hcp structure and show a <0001>preferred orientation. Atomic force microscopies (AFM) reveal very smooth film surfaces.
pA  
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A03   1    @0 Appl. surf. sci.
A05       @2 254
A06       @2 18
A08 01  1  ENG  @1 Structural studies of evaporated CoxCr1-x/Si (1 0 0) and CoxCr1-x/glass thin films
A11 01  1    @1 KHARMOUCHE (A.)
A11 02  1    @1 DJOUADA (I.)
A14 01      @1 Faculté des Sciences de l'Ingénieur, Université Ferhat Abbas @2 Sétif 19000 @3 DZA @Z 1 aut. @Z 2 aut.
A20       @1 5732-5735
A21       @1 2008
A23 01      @0 ENG
A43 01      @1 INIST @2 16002 @5 354000197872590160
A44       @0 0000 @1 © 2008 INIST-CNRS. All rights reserved.
A45       @0 16 ref.
A47 01  1    @0 08-0446682
A60       @1 P
A61       @0 A
A64 01  1    @0 Applied surface science
A66 01      @0 NLD
C01 01    ENG  @0 Series of CoxCr1-x thin films have been evaporated under vacuum onto Si (1 0 0) and glass substrates. Chemical composition and interface properties have been studied by modelling Rutherford backscattering spectra (RBS) using SIMNRA programme. Thickness ranges from 17 to 220 nm, and x from 0.80 to 0.88. Simulation of the energy spectra shows an interdiffusion profile in the thickest films, but no diffusion is seen in thinner ones. Microscopic characterizations of the films are done with X-ray diffraction (XRD) measurements. All the samples are polycrystalline, with an hcp structure and show a <0001>preferred orientation. Atomic force microscopies (AFM) reveal very smooth film surfaces.
C02 01  3    @0 001B60H55J
C02 02  X    @0 001C04G
C02 03  3    @0 001B60H55N
C02 04  3    @0 001B60A10N
C03 01  3  FRE  @0 Composition surface @5 01
C03 01  3  ENG  @0 Surface composition @5 01
C03 02  3  FRE  @0 Verre @5 02
C03 02  3  ENG  @0 Glass @5 02
C03 03  3  FRE  @0 Couche mince @5 03
C03 03  3  ENG  @0 Thin films @5 03
C03 04  3  FRE  @0 Evaporation sous vide @5 04
C03 04  3  ENG  @0 Vacuum evaporation @5 04
C03 05  3  FRE  @0 Modélisation @5 07
C03 05  3  ENG  @0 Modelling @5 07
C03 06  3  FRE  @0 RBS @5 08
C03 06  3  ENG  @0 RBS @5 08
C03 07  3  FRE  @0 Epaisseur @5 09
C03 07  3  ENG  @0 Thickness @5 09
C03 08  3  FRE  @0 Simulation @5 10
C03 08  3  ENG  @0 Simulation @5 10
C03 09  X  FRE  @0 Diffusion mutuelle @5 11
C03 09  X  ENG  @0 Interdiffusion @5 11
C03 09  X  SPA  @0 Difusión mútua @5 11
C03 10  3  FRE  @0 Diffusion(transport) @5 12
C03 10  3  ENG  @0 Diffusion @5 12
C03 11  3  FRE  @0 Diffraction RX @5 13
C03 11  3  ENG  @0 XRD @5 13
C03 12  3  FRE  @0 Réseau hexagonal compact @5 14
C03 12  3  ENG  @0 HCP lattices @5 14
C03 13  X  FRE  @0 Orientation préférentielle @5 15
C03 13  X  ENG  @0 Preferred orientation @5 15
C03 13  X  SPA  @0 Orientación preferencial @5 15
C03 14  3  FRE  @0 Microscopie force atomique @5 16
C03 14  3  ENG  @0 Atomic force microscopy @5 16
C03 15  3  FRE  @0 Cobalt alliage @5 17
C03 15  3  ENG  @0 Cobalt alloys @5 17
C03 16  3  FRE  @0 Chrome alliage @5 18
C03 16  3  ENG  @0 Chromium alloys @5 18
C03 17  3  FRE  @0 Alliage binaire @5 19
C03 17  3  ENG  @0 Binary alloys @5 19
C03 18  3  FRE  @0 Alliage CoCr @4 INC @5 32
C03 19  3  FRE  @0 Silicium @2 NC @5 41
C03 19  3  ENG  @0 Silicon @2 NC @5 41
C03 20  3  FRE  @0 6855J @2 PAC @4 INC @5 45
C03 21  3  FRE  @0 8280Y @2 PAC @4 INC @5 46
C03 22  3  FRE  @0 6855N @2 PAC @4 INC @5 47
C03 23  3  FRE  @0 6110N @2 PAC @4 INC @5 48
C07 01  3  FRE  @0 Métal transition alliage @5 20
C07 01  3  ENG  @0 Transition element alloys @5 20
N21       @1 287

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Pascal:08-0446682

Le document en format XML

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Cr
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/Si (1 0 0) and Co
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Cr
<sub>1-x</sub>
/glass thin films</title>
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Cr
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Cr
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<term>Chromium alloys</term>
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<term>Diffusion</term>
<term>Glass</term>
<term>HCP lattices</term>
<term>Interdiffusion</term>
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<term>RBS</term>
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<div type="abstract" xml:lang="en">Series of Co
<sub>x</sub>
Cr
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<s1>Structural studies of evaporated Co
<sub>x</sub>
Cr
<sub>1-x</sub>
/Si (1 0 0) and Co
<sub>x</sub>
Cr
<sub>1-x</sub>
/glass thin films</s1>
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<s0>Series of Co
<sub>x</sub>
Cr
<sub>1-x</sub>
thin films have been evaporated under vacuum onto Si (1 0 0) and glass substrates. Chemical composition and interface properties have been studied by modelling Rutherford backscattering spectra (RBS) using SIMNRA programme. Thickness ranges from 17 to 220 nm, and x from 0.80 to 0.88. Simulation of the energy spectra shows an interdiffusion profile in the thickest films, but no diffusion is seen in thinner ones. Microscopic characterizations of the films are done with X-ray diffraction (XRD) measurements. All the samples are polycrystalline, with an hcp structure and show a <0001>preferred orientation. Atomic force microscopies (AFM) reveal very smooth film surfaces.</s0>
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<s5>04</s5>
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<s5>04</s5>
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<s5>08</s5>
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<s0>Epaisseur</s0>
<s5>09</s5>
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<s5>09</s5>
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<s0>Interdiffusion</s0>
<s5>11</s5>
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<s5>11</s5>
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<s0>Diffusion(transport)</s0>
<s5>12</s5>
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<s0>Diffusion</s0>
<s5>12</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE">
<s0>Diffraction RX</s0>
<s5>13</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG">
<s0>XRD</s0>
<s5>13</s5>
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<fC03 i1="12" i2="3" l="FRE">
<s0>Réseau hexagonal compact</s0>
<s5>14</s5>
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<fC03 i1="12" i2="3" l="ENG">
<s0>HCP lattices</s0>
<s5>14</s5>
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<s0>Orientation préférentielle</s0>
<s5>15</s5>
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<s0>Preferred orientation</s0>
<s5>15</s5>
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<s0>Orientación preferencial</s0>
<s5>15</s5>
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<fC03 i1="14" i2="3" l="FRE">
<s0>Microscopie force atomique</s0>
<s5>16</s5>
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<fC03 i1="14" i2="3" l="ENG">
<s0>Atomic force microscopy</s0>
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<s5>18</s5>
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<s5>18</s5>
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<s5>19</s5>
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<s5>19</s5>
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<s2>NC</s2>
<s5>41</s5>
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<s0>Silicon</s0>
<s2>NC</s2>
<s5>41</s5>
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<s0>6855J</s0>
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<s4>INC</s4>
<s5>45</s5>
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<s0>8280Y</s0>
<s2>PAC</s2>
<s4>INC</s4>
<s5>46</s5>
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<fC03 i1="22" i2="3" l="FRE">
<s0>6855N</s0>
<s2>PAC</s2>
<s4>INC</s4>
<s5>47</s5>
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<fC03 i1="23" i2="3" l="FRE">
<s0>6110N</s0>
<s2>PAC</s2>
<s4>INC</s4>
<s5>48</s5>
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<s0>Métal transition alliage</s0>
<s5>20</s5>
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<s0>Transition element alloys</s0>
<s5>20</s5>
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