Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface
Identifieur interne : 000095 ( PascalFrancis/Curation ); précédent : 000094; suivant : 000096Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface
Auteurs : A. Azizi [Algérie] ; A. Sahari [Algérie] ; M. L. Felloussia [Algérie] ; G. Schmerber [France] ; C. Meny [France] ; A. Dinia [France]Source :
- Applied surface science [ 0169-4332 ] ; 2004.
Descripteurs français
- Pascal (Inist)
- Solution aqueuse, Source ion, pH, Diffusion(transport), Nucléation, Microscopie force atomique, Structure granulaire, Diffraction RX, Résonance magnétique nucléaire, Grosseur grain, Réseau hexagonal compact, Réseau cubique face centrée, Effet champ magnétique, Aimantation, Cobalt, Silicium, Croissance film, Dépôt électrolytique, Co, Si, Métal transition.
- Wicri :
- topic : Cobalt.
English descriptors
- KwdEn :
Abstract
In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO4, 10 mM CoCl2 as the source of metal ions and I M Na2SO4 as a supporting electrolyte with 0.5 M H3BO3 at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.
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<term>Diffusion</term>
<term>Electrodeposition</term>
<term>FCC lattices</term>
<term>Film growth</term>
<term>Grain size</term>
<term>Granular structure</term>
<term>HCP lattices</term>
<term>Ion sources</term>
<term>Magnetic field effects</term>
<term>Magnetization</term>
<term>Nuclear magnetic resonance</term>
<term>Nucleation</term>
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<term>Réseau hexagonal compact</term>
<term>Réseau cubique face centrée</term>
<term>Effet champ magnétique</term>
<term>Aimantation</term>
<term>Cobalt</term>
<term>Silicium</term>
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<front><div type="abstract" xml:lang="en">In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO<sub>4</sub>
, 10 mM CoCl<sub>2</sub>
as the source of metal ions and I M Na<sub>2</sub>
SO<sub>4</sub>
as a supporting electrolyte with 0.5 M H<sub>3</sub>
BO<sub>3</sub>
at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.</div>
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<fC01 i1="01" l="ENG"><s0>In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO<sub>4</sub>
, 10 mM CoCl<sub>2</sub>
as the source of metal ions and I M Na<sub>2</sub>
SO<sub>4</sub>
as a supporting electrolyte with 0.5 M H<sub>3</sub>
BO<sub>3</sub>
at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.</s0>
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<s5>04</s5>
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<s5>04</s5>
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<s5>06</s5>
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<s5>06</s5>
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<s5>07</s5>
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<s5>10</s5>
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<s5>10</s5>
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<fC03 i1="11" i2="3" l="FRE"><s0>Réseau hexagonal compact</s0>
<s5>11</s5>
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<fC03 i1="11" i2="3" l="ENG"><s0>HCP lattices</s0>
<s5>11</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE"><s0>Réseau cubique face centrée</s0>
<s5>12</s5>
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<s5>12</s5>
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<s5>13</s5>
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<s5>13</s5>
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<s5>14</s5>
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<s5>14</s5>
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<s5>15</s5>
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<s2>NC</s2>
<s5>15</s5>
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<s2>NC</s2>
<s5>16</s5>
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<s2>NC</s2>
<s5>16</s5>
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<s5>22</s5>
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<fC03 i1="17" i2="3" l="ENG"><s0>Film growth</s0>
<s5>22</s5>
</fC03>
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<s5>23</s5>
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<s5>23</s5>
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<s4>INC</s4>
<s5>32</s5>
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<s5>33</s5>
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<s5>62</s5>
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<s5>62</s5>
</fC03>
<fN21><s1>017</s1>
</fN21>
<fN44 i1="01"><s1>OTO</s1>
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