CobaltMaghrebV1, PascalFrancis, Corpus, bibRecord, 000200

Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface

Identifieur interne : 000200 ( PascalFrancis/Corpus ); précédent : 000199; suivant : 000201

Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface

Auteurs : A. Azizi ; A. Sahari ; M. L. Felloussia ; G. Schmerber ; C. Meny ; A. Dinia

Source :

Applied surface science [ 0169-4332 ] ; 2004.

RBID : Pascal:05-0035950

Descripteurs français

Pascal (Inist)
- Solution aqueuse, Source ion, pH, Diffusion(transport), Nucléation, Microscopie force atomique, Structure granulaire, Diffraction RX, Résonance magnétique nucléaire, Grosseur grain, Réseau hexagonal compact, Réseau cubique face centrée, Effet champ magnétique, Aimantation, Cobalt, Silicium, Croissance film, Dépôt électrolytique, Co, Si, Métal transition.

English descriptors

KwdEn :
- Aqueous solutions, Atomic force microscopy, Cobalt, Diffusion, Electrodeposition, FCC lattices, Film growth, Grain size, Granular structure, HCP lattices, Ion sources, Magnetic field effects, Magnetization, Nuclear magnetic resonance, Nucleation, Silicon, Transition elements, XRD, pH value.

Abstract

In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO₄, 10 mM CoCl₂ as the source of metal ions and I M Na₂SO₄ as a supporting electrolyte with 0.5 M H₃BO₃ at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.

Notice en format standard (ISO 2709)

Pour connaître la documentation sur le format Inist Standard.

A01	`01`	`1`		`@0 0169-4332`
A03		`1`		`@0 Appl. surf. sci.`
A05				`@2 228`
A06				`@2 1-4`
A08	`01`	`1`	`ENG`	`@1 Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface`
A11	`01`	`1`		`@1 AZIZI (A.)`
A11	`02`	`1`		`@1 SAHARI (A.)`
A11	`03`	`1`		`@1 FELLOUSSIA (M. L.)`
A11	`04`	`1`		`@1 SCHMERBER (G.)`
A11	`05`	`1`		`@1 MENY (C.)`
A11	`06`	`1`		`@1 DINIA (A.)`
A14	`01`			`@1 Laboratoire d'Energétique et d'Electrochimie des Solides, Université de Sétif @2 Sétif 19000 @3 DZA @Z 1 aut. @Z 2 aut. @Z 3 aut.`
A14	`02`			`@1 Institut de Physique et de Chimie des Matériaux de Strasbourg, UMR 7045, 23 rue du Loess, BP 43 @2 67034 Strasbourg @3 FRA @Z 4 aut. @Z 5 aut. @Z 6 aut.`
A20				`@1 320-325`
A21				`@1 2004`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 16002 @5 354000117198050450`
A44				`@0 0000 @1 © 2005 INIST-CNRS. All rights reserved.`
A45				`@0 25 ref.`
A47	`01`	`1`		`@0 05-0035950`
A60				`@1 P`
A61				`@0 A`
A64	`01`	`1`		`@0 Applied surface science`
A66	`01`			`@0 NLD`
C01	`01`		`ENG`	@0 In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO₄, 10 mM CoCl₂ as the source of metal ions and I M Na₂SO₄ as a supporting electrolyte with 0.5 M H₃BO₃ at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.
C02	`01`	`3`		`@0 001B60`
C02	`02`	`3`		`@0 001B70`
C02	`03`	`3`		`@0 001B80`
C03	`01`	`3`	`FRE`	`@0 Solution aqueuse @5 01`
C03	`01`	`3`	`ENG`	`@0 Aqueous solutions @5 01`
C03	`02`	`3`	`FRE`	`@0 Source ion @5 02`
C03	`02`	`3`	`ENG`	`@0 Ion sources @5 02`
C03	`03`	`3`	`FRE`	`@0 pH @5 03`
C03	`03`	`3`	`ENG`	`@0 pH value @5 03`
C03	`04`	`3`	`FRE`	`@0 Diffusion(transport) @5 04`
C03	`04`	`3`	`ENG`	`@0 Diffusion @5 04`
C03	`05`	`3`	`FRE`	`@0 Nucléation @5 05`
C03	`05`	`3`	`ENG`	`@0 Nucleation @5 05`
C03	`06`	`3`	`FRE`	`@0 Microscopie force atomique @5 06`
C03	`06`	`3`	`ENG`	`@0 Atomic force microscopy @5 06`
C03	`07`	`3`	`FRE`	`@0 Structure granulaire @5 07`
C03	`07`	`3`	`ENG`	`@0 Granular structure @5 07`
C03	`08`	`3`	`FRE`	`@0 Diffraction RX @5 08`
C03	`08`	`3`	`ENG`	`@0 XRD @5 08`
C03	`09`	`3`	`FRE`	`@0 Résonance magnétique nucléaire @5 09`
C03	`09`	`3`	`ENG`	`@0 Nuclear magnetic resonance @5 09`
C03	`10`	`3`	`FRE`	`@0 Grosseur grain @5 10`
C03	`10`	`3`	`ENG`	`@0 Grain size @5 10`
C03	`11`	`3`	`FRE`	`@0 Réseau hexagonal compact @5 11`
C03	`11`	`3`	`ENG`	`@0 HCP lattices @5 11`
C03	`12`	`3`	`FRE`	`@0 Réseau cubique face centrée @5 12`
C03	`12`	`3`	`ENG`	`@0 FCC lattices @5 12`
C03	`13`	`3`	`FRE`	`@0 Effet champ magnétique @5 13`
C03	`13`	`3`	`ENG`	`@0 Magnetic field effects @5 13`
C03	`14`	`3`	`FRE`	`@0 Aimantation @5 14`
C03	`14`	`3`	`ENG`	`@0 Magnetization @5 14`
C03	`15`	`3`	`FRE`	`@0 Cobalt @2 NC @5 15`
C03	`15`	`3`	`ENG`	`@0 Cobalt @2 NC @5 15`
C03	`16`	`3`	`FRE`	`@0 Silicium @2 NC @5 16`
C03	`16`	`3`	`ENG`	`@0 Silicon @2 NC @5 16`
C03	`17`	`3`	`FRE`	`@0 Croissance film @5 22`
C03	`17`	`3`	`ENG`	`@0 Film growth @5 22`
C03	`18`	`3`	`FRE`	`@0 Dépôt électrolytique @5 23`
C03	`18`	`3`	`ENG`	`@0 Electrodeposition @5 23`
C03	`19`	`3`	`FRE`	`@0 Co @4 INC @5 32`
C03	`20`	`3`	`FRE`	`@0 Si @4 INC @5 33`
C03	`21`	`3`	`FRE`	`@0 Métal transition @5 62`
C03	`21`	`3`	`ENG`	`@0 Transition elements @5 62`
N21				`@1 017`
N44	`01`			`@1 OTO`
N82				`@1 OTO`

Format Inist (serveur)

NO :	PASCAL 05-0035950 INIST
ET :	Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface
AU :	AZIZI (A.); SAHARI (A.); FELLOUSSIA (M. L.); SCHMERBER (G.); MENY (C.); DINIA (A.)
AF :	Laboratoire d'Energétique et d'Electrochimie des Solides, Université de Sétif/Sétif 19000/Algérie (1 aut., 2 aut., 3 aut.); Institut de Physique et de Chimie des Matériaux de Strasbourg, UMR 7045, 23 rue du Loess, BP 43/67034 Strasbourg/France (4 aut., 5 aut., 6 aut.)
DT :	Publication en série; Niveau analytique
SO :	Applied surface science; ISSN 0169-4332; Pays-Bas; Da. 2004; Vol. 228; No. 1-4; Pp. 320-325; Bibl. 25 ref.
LA :	Anglais
EA :	In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO₄, 10 mM CoCl₂ as the source of metal ions and I M Na₂SO₄ as a supporting electrolyte with 0.5 M H₃BO₃ at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.
CC :	001B60; 001B70; 001B80
FD :	Solution aqueuse; Source ion; pH; Diffusion(transport); Nucléation; Microscopie force atomique; Structure granulaire; Diffraction RX; Résonance magnétique nucléaire; Grosseur grain; Réseau hexagonal compact; Réseau cubique face centrée; Effet champ magnétique; Aimantation; Cobalt; Silicium; Croissance film; Dépôt électrolytique; Co; Si; Métal transition
ED :	Aqueous solutions; Ion sources; pH value; Diffusion; Nucleation; Atomic force microscopy; Granular structure; XRD; Nuclear magnetic resonance; Grain size; HCP lattices; FCC lattices; Magnetic field effects; Magnetization; Cobalt; Silicon; Film growth; Electrodeposition; Transition elements
LO :	INIST-16002.354000117198050450
ID :	05-0035950

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Pascal:05-0035950

Le document en format XML

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<term>FCC lattices</term>
<term>Film growth</term>
<term>Grain size</term>
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<term>HCP lattices</term>
<term>Ion sources</term>
<term>Magnetic field effects</term>
<term>Magnetization</term>
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<term>Diffraction RX</term>
<term>Résonance magnétique nucléaire</term>
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<term>Réseau hexagonal compact</term>
<term>Réseau cubique face centrée</term>
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<term>Cobalt</term>
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<front><div type="abstract" xml:lang="en">In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO<sub>4</sub>
, 10 mM CoCl<sub>2</sub>
 as the source of metal ions and I M Na<sub>2</sub>
SO<sub>4</sub>
 as a supporting electrolyte with 0.5 M H<sub>3</sub>
BO<sub>3</sub>
 at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.</div>
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<fA11 i1="01" i2="1"><s1>AZIZI (A.)</s1>
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<fA11 i1="02" i2="1"><s1>SAHARI (A.)</s1>
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<fC01 i1="01" l="ENG"><s0>In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO<sub>4</sub>
, 10 mM CoCl<sub>2</sub>
 as the source of metal ions and I M Na<sub>2</sub>
SO<sub>4</sub>
 as a supporting electrolyte with 0.5 M H<sub>3</sub>
BO<sub>3</sub>
 at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.</s0>
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<fC02 i1="02" i2="3"><s0>001B70</s0>
</fC02>
<fC02 i1="03" i2="3"><s0>001B80</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE"><s0>Solution aqueuse</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG"><s0>Aqueous solutions</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE"><s0>Source ion</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG"><s0>Ion sources</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE"><s0>pH</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG"><s0>pH value</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE"><s0>Diffusion(transport)</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG"><s0>Diffusion</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Nucléation</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Nucleation</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE"><s0>Microscopie force atomique</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Atomic force microscopy</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE"><s0>Structure granulaire</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="3" l="ENG"><s0>Granular structure</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE"><s0>Diffraction RX</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="3" l="ENG"><s0>XRD</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>Résonance magnétique nucléaire</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="3" l="ENG"><s0>Nuclear magnetic resonance</s0>
<s5>09</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE"><s0>Grosseur grain</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG"><s0>Grain size</s0>
<s5>10</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE"><s0>Réseau hexagonal compact</s0>
<s5>11</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG"><s0>HCP lattices</s0>
<s5>11</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE"><s0>Réseau cubique face centrée</s0>
<s5>12</s5>
</fC03>
<fC03 i1="12" i2="3" l="ENG"><s0>FCC lattices</s0>
<s5>12</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE"><s0>Effet champ magnétique</s0>
<s5>13</s5>
</fC03>
<fC03 i1="13" i2="3" l="ENG"><s0>Magnetic field effects</s0>
<s5>13</s5>
</fC03>
<fC03 i1="14" i2="3" l="FRE"><s0>Aimantation</s0>
<s5>14</s5>
</fC03>
<fC03 i1="14" i2="3" l="ENG"><s0>Magnetization</s0>
<s5>14</s5>
</fC03>
<fC03 i1="15" i2="3" l="FRE"><s0>Cobalt</s0>
<s2>NC</s2>
<s5>15</s5>
</fC03>
<fC03 i1="15" i2="3" l="ENG"><s0>Cobalt</s0>
<s2>NC</s2>
<s5>15</s5>
</fC03>
<fC03 i1="16" i2="3" l="FRE"><s0>Silicium</s0>
<s2>NC</s2>
<s5>16</s5>
</fC03>
<fC03 i1="16" i2="3" l="ENG"><s0>Silicon</s0>
<s2>NC</s2>
<s5>16</s5>
</fC03>
<fC03 i1="17" i2="3" l="FRE"><s0>Croissance film</s0>
<s5>22</s5>
</fC03>
<fC03 i1="17" i2="3" l="ENG"><s0>Film growth</s0>
<s5>22</s5>
</fC03>
<fC03 i1="18" i2="3" l="FRE"><s0>Dépôt électrolytique</s0>
<s5>23</s5>
</fC03>
<fC03 i1="18" i2="3" l="ENG"><s0>Electrodeposition</s0>
<s5>23</s5>
</fC03>
<fC03 i1="19" i2="3" l="FRE"><s0>Co</s0>
<s4>INC</s4>
<s5>32</s5>
</fC03>
<fC03 i1="20" i2="3" l="FRE"><s0>Si</s0>
<s4>INC</s4>
<s5>33</s5>
</fC03>
<fC03 i1="21" i2="3" l="FRE"><s0>Métal transition</s0>
<s5>62</s5>
</fC03>
<fC03 i1="21" i2="3" l="ENG"><s0>Transition elements</s0>
<s5>62</s5>
</fC03>
<fN21><s1>017</s1>
</fN21>
<fN44 i1="01"><s1>OTO</s1>
</fN44>
<fN82><s1>OTO</s1>
</fN82>
</pA>
</standard>
<server><NO>PASCAL 05-0035950 INIST</NO>
<ET>Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface</ET>
<AU>AZIZI (A.); SAHARI (A.); FELLOUSSIA (M. L.); SCHMERBER (G.); MENY (C.); DINIA (A.)</AU>
<AF>Laboratoire d'Energétique et d'Electrochimie des Solides, Université de Sétif/Sétif 19000/Algérie (1 aut., 2 aut., 3 aut.); Institut de Physique et de Chimie des Matériaux de Strasbourg, UMR 7045, 23 rue du Loess, BP 43/67034 Strasbourg/France (4 aut., 5 aut., 6 aut.)</AF>
<DT>Publication en série; Niveau analytique</DT>
<SO>Applied surface science; ISSN 0169-4332; Pays-Bas; Da. 2004; Vol. 228; No. 1-4; Pp. 320-325; Bibl. 25 ref.</SO>
<LA>Anglais</LA>
<EA>In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO<sub>4</sub>
, 10 mM CoCl<sub>2</sub>
 as the source of metal ions and I M Na<sub>2</sub>
SO<sub>4</sub>
 as a supporting electrolyte with 0.5 M H<sub>3</sub>
BO<sub>3</sub>
 at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.</EA>
<CC>001B60; 001B70; 001B80</CC>
<FD>Solution aqueuse; Source ion; pH; Diffusion(transport); Nucléation; Microscopie force atomique; Structure granulaire; Diffraction RX; Résonance magnétique nucléaire; Grosseur grain; Réseau hexagonal compact; Réseau cubique face centrée; Effet champ magnétique; Aimantation; Cobalt; Silicium; Croissance film; Dépôt électrolytique; Co; Si; Métal transition</FD>
<ED>Aqueous solutions; Ion sources; pH value; Diffusion; Nucleation; Atomic force microscopy; Granular structure; XRD; Nuclear magnetic resonance; Grain size; HCP lattices; FCC lattices; Magnetic field effects; Magnetization; Cobalt; Silicon; Film growth; Electrodeposition; Transition elements</ED>
<LO>INIST-16002.354000117198050450</LO>
<ID>05-0035950</ID>
</server>
</inist>
</record>

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Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface

Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface

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