CobaltMaghrebV1, PascalFrancis, Corpus, bibRecord, 000079

Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer

Identifieur interne : 000079 ( PascalFrancis/Corpus ); précédent : 000078; suivant : 000080

Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer

Auteurs : T. El Asri ; M. Raissi ; S. Vizzini ; A. El Maachi ; E. L. Ameziane ; F. Arnaud D'Avitaya ; J.-L. Lazzari ; C. Coudreau ; H. Oughaddou ; B. Aufray ; A. Kaddouri

Source :

Applied surface science [ 0169-4332 ] ; 2010.

RBID : Pascal:10-0480881

Descripteurs français

Pascal (Inist)
- Diffusion mutuelle, Cobalt, Métal transition, Silicium, Couche mince, Aluminium, Diffusion(transport), Structure MIS, Spectrométrie Auger, Microscopie électronique transmission, Co, Si, Al.

English descriptors

KwdEn :
- AES, Aluminium, Cobalt, Diffusion, Interdiffusion, MIS structures, Silicon, Thin films, Transition elements, Transmission electron microscopy.

Abstract

Optical emission spectroscopy of sputtered species during ion bombardment, Auger electron spectroscopy and high-resolution transmission electron microscopy were used to study the cobalt and silicon diffusion through the interfaces of Co/AlO/Si(0 0 1) hetero-structure. The results are discussed as a function of the annealing temperature of sample and show that the diffusion process at the interfaces starts for annealing temperatures above 200 °C without detectable modification of the oxide layer.

Notice en format standard (ISO 2709)

Pour connaître la documentation sur le format Inist Standard.

A01	`01`	`1`		`@0 0169-4332`
A03		`1`		`@0 Appl. surf. sci.`
A05				`@2 256`
A06				`@2 9`
A08	`01`	`1`	`ENG`	`@1 Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer`
A11	`01`	`1`		`@1 EL ASRI (T.)`
A11	`02`	`1`		`@1 RAISSI (M.)`
A11	`03`	`1`		`@1 VIZZINI (S.)`
A11	`04`	`1`		`@1 EL MAACHI (A.)`
A11	`05`	`1`		`@1 AMEZIANE (E. L.)`
A11	`06`	`1`		`@1 ARNAUD D'AVITAYA (F.)`
A11	`07`	`1`		`@1 LAZZARI (J.-L.)`
A11	`08`	`1`		`@1 COUDREAU (C.)`
A11	`09`	`1`		`@1 OUGHADDOU (H.)`
A11	`10`	`1`		`@1 AUFRAY (B.)`
A11	`11`	`1`		`@1 KADDOURI (A.)`
A14	`01`			`@1 Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM @2 Marrakech @3 MAR @Z 1 aut. @Z 4 aut. @Z 11 aut.`
A14	`02`			`@1 CINAM-CNRS, Case 913 @2 13288 Marseille @3 FRA @Z 2 aut. @Z 6 aut. @Z 7 aut. @Z 8 aut. @Z 10 aut.`
A14	`03`			`@1 CEA, IRAMIS, SPCSI @2 91191 Gif sur-Yvette @3 FRA @Z 3 aut. @Z 9 aut.`
A14	`04`			`@1 Université Cadi Ayyad, Faculté des Sciences Semlalia, UFR-MEC @2 Marrakech @3 MAR @Z 5 aut.`
A14	`05`			`@1 Université de Cergy-Pontoise, LAMAP @2 95031 Cergy-Pontoise @3 FRA @Z 9 aut.`
A20				`@1 2731-2734`
A21				`@1 2010`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 16002 @5 354000189743200120`
A44				`@0 0000 @1 © 2010 INIST-CNRS. All rights reserved.`
A45				`@0 17 ref.`
A47	`01`	`1`		`@0 10-0480881`
A60				`@1 P`
A61				`@0 A`
A64	`01`	`1`		`@0 Applied surface science`
A66	`01`			`@0 NLD`
C01	`01`		`ENG`	@0 Optical emission spectroscopy of sputtered species during ion bombardment, Auger electron spectroscopy and high-resolution transmission electron microscopy were used to study the cobalt and silicon diffusion through the interfaces of Co/AlO/Si(0 0 1) hetero-structure. The results are discussed as a function of the annealing temperature of sample and show that the diffusion process at the interfaces starts for annealing temperatures above 200 °C without detectable modification of the oxide layer.
C02	`01`	`3`		`@0 001B60`
C02	`02`	`3`		`@0 001B70`
C02	`03`	`3`		`@0 001B80`
C03	`01`	`X`	`FRE`	`@0 Diffusion mutuelle @5 01`
C03	`01`	`X`	`ENG`	`@0 Interdiffusion @5 01`
C03	`01`	`X`	`SPA`	`@0 Difusión mútua @5 01`
C03	`02`	`3`	`FRE`	`@0 Cobalt @2 NC @5 02`
C03	`02`	`3`	`ENG`	`@0 Cobalt @2 NC @5 02`
C03	`03`	`3`	`FRE`	`@0 Métal transition @5 03`
C03	`03`	`3`	`ENG`	`@0 Transition elements @5 03`
C03	`04`	`3`	`FRE`	`@0 Silicium @2 NC @5 04`
C03	`04`	`3`	`ENG`	`@0 Silicon @2 NC @5 04`
C03	`05`	`3`	`FRE`	`@0 Couche mince @5 05`
C03	`05`	`3`	`ENG`	`@0 Thin films @5 05`
C03	`06`	`3`	`FRE`	`@0 Aluminium @2 NC @5 06`
C03	`06`	`3`	`ENG`	`@0 Aluminium @2 NC @5 06`
C03	`07`	`3`	`FRE`	`@0 Diffusion(transport) @5 07`
C03	`07`	`3`	`ENG`	`@0 Diffusion @5 07`
C03	`08`	`3`	`FRE`	`@0 Structure MIS @5 08`
C03	`08`	`3`	`ENG`	`@0 MIS structures @5 08`
C03	`09`	`3`	`FRE`	`@0 Spectrométrie Auger @5 09`
C03	`09`	`3`	`ENG`	`@0 AES @5 09`
C03	`10`	`3`	`FRE`	`@0 Microscopie électronique transmission @5 10`
C03	`10`	`3`	`ENG`	`@0 Transmission electron microscopy @5 10`
C03	`11`	`3`	`FRE`	`@0 Co @4 INC @5 32`
C03	`12`	`3`	`FRE`	`@0 Si @4 INC @5 33`
C03	`13`	`3`	`FRE`	`@0 Al @4 INC @5 34`
N21				`@1 312`
N44	`01`			`@1 OTO`
N82				`@1 OTO`

Format Inist (serveur)

NO :	PASCAL 10-0480881 INIST
ET :	Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer
AU :	EL ASRI (T.); RAISSI (M.); VIZZINI (S.); EL MAACHI (A.); AMEZIANE (E. L.); ARNAUD D'AVITAYA (F.); LAZZARI (J.-L.); COUDREAU (C.); OUGHADDOU (H.); AUFRAY (B.); KADDOURI (A.)
AF :	Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM/Marrakech/Maroc (1 aut., 4 aut., 11 aut.); CINAM-CNRS, Case 913/13288 Marseille/France (2 aut., 6 aut., 7 aut., 8 aut., 10 aut.); CEA, IRAMIS, SPCSI/91191 Gif sur-Yvette/France (3 aut., 9 aut.); Université Cadi Ayyad, Faculté des Sciences Semlalia, UFR-MEC/Marrakech/Maroc (5 aut.); Université de Cergy-Pontoise, LAMAP/95031 Cergy-Pontoise/France (9 aut.)
DT :	Publication en série; Niveau analytique
SO :	Applied surface science; ISSN 0169-4332; Pays-Bas; Da. 2010; Vol. 256; No. 9; Pp. 2731-2734; Bibl. 17 ref.
LA :	Anglais
EA :	Optical emission spectroscopy of sputtered species during ion bombardment, Auger electron spectroscopy and high-resolution transmission electron microscopy were used to study the cobalt and silicon diffusion through the interfaces of Co/AlO/Si(0 0 1) hetero-structure. The results are discussed as a function of the annealing temperature of sample and show that the diffusion process at the interfaces starts for annealing temperatures above 200 °C without detectable modification of the oxide layer.
CC :	001B60; 001B70; 001B80
FD :	Diffusion mutuelle; Cobalt; Métal transition; Silicium; Couche mince; Aluminium; Diffusion(transport); Structure MIS; Spectrométrie Auger; Microscopie électronique transmission; Co; Si; Al
ED :	Interdiffusion; Cobalt; Transition elements; Silicon; Thin films; Aluminium; Diffusion; MIS structures; AES; Transmission electron microscopy
SD :	Difusión mútua
LO :	INIST-16002.354000189743200120
ID :	10-0480881

Links to Exploration step

Pascal:10-0480881

Le document en format XML

<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer</title>
<author><name sortKey="El Asri, T" sort="El Asri, T" uniqKey="El Asri T" first="T." last="El Asri">T. El Asri</name>
<affiliation><inist:fA14 i1="01"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>1 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>11 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Raissi, M" sort="Raissi, M" uniqKey="Raissi M" first="M." last="Raissi">M. Raissi</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Vizzini, S" sort="Vizzini, S" uniqKey="Vizzini S" first="S." last="Vizzini">S. Vizzini</name>
<affiliation><inist:fA14 i1="03"><s1>CEA, IRAMIS, SPCSI</s1>
<s2>91191 Gif sur-Yvette</s2>
<s3>FRA</s3>
<sZ>3 aut.</sZ>
<sZ>9 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="El Maachi, A" sort="El Maachi, A" uniqKey="El Maachi A" first="A." last="El Maachi">A. El Maachi</name>
<affiliation><inist:fA14 i1="01"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>1 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>11 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Ameziane, E L" sort="Ameziane, E L" uniqKey="Ameziane E" first="E. L." last="Ameziane">E. L. Ameziane</name>
<affiliation><inist:fA14 i1="04"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, UFR-MEC</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>5 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Arnaud D Avitaya, F" sort="Arnaud D Avitaya, F" uniqKey="Arnaud D Avitaya F" first="F." last="Arnaud D'Avitaya">F. Arnaud D'Avitaya</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Lazzari, J L" sort="Lazzari, J L" uniqKey="Lazzari J" first="J.-L." last="Lazzari">J.-L. Lazzari</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Coudreau, C" sort="Coudreau, C" uniqKey="Coudreau C" first="C." last="Coudreau">C. Coudreau</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Oughaddou, H" sort="Oughaddou, H" uniqKey="Oughaddou H" first="H." last="Oughaddou">H. Oughaddou</name>
<affiliation><inist:fA14 i1="03"><s1>CEA, IRAMIS, SPCSI</s1>
<s2>91191 Gif sur-Yvette</s2>
<s3>FRA</s3>
<sZ>3 aut.</sZ>
<sZ>9 aut.</sZ>
</inist:fA14>
</affiliation>
<affiliation><inist:fA14 i1="05"><s1>Université de Cergy-Pontoise, LAMAP</s1>
<s2>95031 Cergy-Pontoise</s2>
<s3>FRA</s3>
<sZ>9 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Aufray, B" sort="Aufray, B" uniqKey="Aufray B" first="B." last="Aufray">B. Aufray</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Kaddouri, A" sort="Kaddouri, A" uniqKey="Kaddouri A" first="A." last="Kaddouri">A. Kaddouri</name>
<affiliation><inist:fA14 i1="01"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>1 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>11 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">INIST</idno>
<idno type="inist">10-0480881</idno>
<date when="2010">2010</date>
<idno type="stanalyst">PASCAL 10-0480881 INIST</idno>
<idno type="RBID">Pascal:10-0480881</idno>
<idno type="wicri:Area/PascalFrancis/Corpus">000079</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer</title>
<author><name sortKey="El Asri, T" sort="El Asri, T" uniqKey="El Asri T" first="T." last="El Asri">T. El Asri</name>
<affiliation><inist:fA14 i1="01"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>1 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>11 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Raissi, M" sort="Raissi, M" uniqKey="Raissi M" first="M." last="Raissi">M. Raissi</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Vizzini, S" sort="Vizzini, S" uniqKey="Vizzini S" first="S." last="Vizzini">S. Vizzini</name>
<affiliation><inist:fA14 i1="03"><s1>CEA, IRAMIS, SPCSI</s1>
<s2>91191 Gif sur-Yvette</s2>
<s3>FRA</s3>
<sZ>3 aut.</sZ>
<sZ>9 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="El Maachi, A" sort="El Maachi, A" uniqKey="El Maachi A" first="A." last="El Maachi">A. El Maachi</name>
<affiliation><inist:fA14 i1="01"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>1 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>11 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Ameziane, E L" sort="Ameziane, E L" uniqKey="Ameziane E" first="E. L." last="Ameziane">E. L. Ameziane</name>
<affiliation><inist:fA14 i1="04"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, UFR-MEC</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>5 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Arnaud D Avitaya, F" sort="Arnaud D Avitaya, F" uniqKey="Arnaud D Avitaya F" first="F." last="Arnaud D'Avitaya">F. Arnaud D'Avitaya</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Lazzari, J L" sort="Lazzari, J L" uniqKey="Lazzari J" first="J.-L." last="Lazzari">J.-L. Lazzari</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Coudreau, C" sort="Coudreau, C" uniqKey="Coudreau C" first="C." last="Coudreau">C. Coudreau</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Oughaddou, H" sort="Oughaddou, H" uniqKey="Oughaddou H" first="H." last="Oughaddou">H. Oughaddou</name>
<affiliation><inist:fA14 i1="03"><s1>CEA, IRAMIS, SPCSI</s1>
<s2>91191 Gif sur-Yvette</s2>
<s3>FRA</s3>
<sZ>3 aut.</sZ>
<sZ>9 aut.</sZ>
</inist:fA14>
</affiliation>
<affiliation><inist:fA14 i1="05"><s1>Université de Cergy-Pontoise, LAMAP</s1>
<s2>95031 Cergy-Pontoise</s2>
<s3>FRA</s3>
<sZ>9 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Aufray, B" sort="Aufray, B" uniqKey="Aufray B" first="B." last="Aufray">B. Aufray</name>
<affiliation><inist:fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Kaddouri, A" sort="Kaddouri, A" uniqKey="Kaddouri A" first="A." last="Kaddouri">A. Kaddouri</name>
<affiliation><inist:fA14 i1="01"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>1 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>11 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
</analytic>
<series><title level="j" type="main">Applied surface science</title>
<title level="j" type="abbreviated">Appl. surf. sci.</title>
<idno type="ISSN">0169-4332</idno>
<imprint><date when="2010">2010</date>
</imprint>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><title level="j" type="main">Applied surface science</title>
<title level="j" type="abbreviated">Appl. surf. sci.</title>
<idno type="ISSN">0169-4332</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>AES</term>
<term>Aluminium</term>
<term>Cobalt</term>
<term>Diffusion</term>
<term>Interdiffusion</term>
<term>MIS structures</term>
<term>Silicon</term>
<term>Thin films</term>
<term>Transition elements</term>
<term>Transmission electron microscopy</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Diffusion mutuelle</term>
<term>Cobalt</term>
<term>Métal transition</term>
<term>Silicium</term>
<term>Couche mince</term>
<term>Aluminium</term>
<term>Diffusion(transport)</term>
<term>Structure MIS</term>
<term>Spectrométrie Auger</term>
<term>Microscopie électronique transmission</term>
<term>Co</term>
<term>Si</term>
<term>Al</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front><div type="abstract" xml:lang="en">Optical emission spectroscopy of sputtered species during ion bombardment, Auger electron spectroscopy and high-resolution transmission electron microscopy were used to study the cobalt and silicon diffusion through the interfaces of Co/AlO/Si(0 0 1) hetero-structure. The results are discussed as a function of the annealing temperature of sample and show that the diffusion process at the interfaces starts for annealing temperatures above 200 °C without detectable modification of the oxide layer.</div>
</front>
</TEI>
<inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0169-4332</s0>
</fA01>
<fA03 i2="1"><s0>Appl. surf. sci.</s0>
</fA03>
<fA05><s2>256</s2>
</fA05>
<fA06><s2>9</s2>
</fA06>
<fA08 i1="01" i2="1" l="ENG"><s1>Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer</s1>
</fA08>
<fA11 i1="01" i2="1"><s1>EL ASRI (T.)</s1>
</fA11>
<fA11 i1="02" i2="1"><s1>RAISSI (M.)</s1>
</fA11>
<fA11 i1="03" i2="1"><s1>VIZZINI (S.)</s1>
</fA11>
<fA11 i1="04" i2="1"><s1>EL MAACHI (A.)</s1>
</fA11>
<fA11 i1="05" i2="1"><s1>AMEZIANE (E. L.)</s1>
</fA11>
<fA11 i1="06" i2="1"><s1>ARNAUD D'AVITAYA (F.)</s1>
</fA11>
<fA11 i1="07" i2="1"><s1>LAZZARI (J.-L.)</s1>
</fA11>
<fA11 i1="08" i2="1"><s1>COUDREAU (C.)</s1>
</fA11>
<fA11 i1="09" i2="1"><s1>OUGHADDOU (H.)</s1>
</fA11>
<fA11 i1="10" i2="1"><s1>AUFRAY (B.)</s1>
</fA11>
<fA11 i1="11" i2="1"><s1>KADDOURI (A.)</s1>
</fA11>
<fA14 i1="01"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>1 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>11 aut.</sZ>
</fA14>
<fA14 i1="02"><s1>CINAM-CNRS, Case 913</s1>
<s2>13288 Marseille</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>10 aut.</sZ>
</fA14>
<fA14 i1="03"><s1>CEA, IRAMIS, SPCSI</s1>
<s2>91191 Gif sur-Yvette</s2>
<s3>FRA</s3>
<sZ>3 aut.</sZ>
<sZ>9 aut.</sZ>
</fA14>
<fA14 i1="04"><s1>Université Cadi Ayyad, Faculté des Sciences Semlalia, UFR-MEC</s1>
<s2>Marrakech</s2>
<s3>MAR</s3>
<sZ>5 aut.</sZ>
</fA14>
<fA14 i1="05"><s1>Université de Cergy-Pontoise, LAMAP</s1>
<s2>95031 Cergy-Pontoise</s2>
<s3>FRA</s3>
<sZ>9 aut.</sZ>
</fA14>
<fA20><s1>2731-2734</s1>
</fA20>
<fA21><s1>2010</s1>
</fA21>
<fA23 i1="01"><s0>ENG</s0>
</fA23>
<fA43 i1="01"><s1>INIST</s1>
<s2>16002</s2>
<s5>354000189743200120</s5>
</fA43>
<fA44><s0>0000</s0>
<s1>© 2010 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45><s0>17 ref.</s0>
</fA45>
<fA47 i1="01" i2="1"><s0>10-0480881</s0>
</fA47>
<fA60><s1>P</s1>
</fA60>
<fA61><s0>A</s0>
</fA61>
<fA64 i1="01" i2="1"><s0>Applied surface science</s0>
</fA64>
<fA66 i1="01"><s0>NLD</s0>
</fA66>
<fC01 i1="01" l="ENG"><s0>Optical emission spectroscopy of sputtered species during ion bombardment, Auger electron spectroscopy and high-resolution transmission electron microscopy were used to study the cobalt and silicon diffusion through the interfaces of Co/AlO/Si(0 0 1) hetero-structure. The results are discussed as a function of the annealing temperature of sample and show that the diffusion process at the interfaces starts for annealing temperatures above 200 °C without detectable modification of the oxide layer.</s0>
</fC01>
<fC02 i1="01" i2="3"><s0>001B60</s0>
</fC02>
<fC02 i1="02" i2="3"><s0>001B70</s0>
</fC02>
<fC02 i1="03" i2="3"><s0>001B80</s0>
</fC02>
<fC03 i1="01" i2="X" l="FRE"><s0>Diffusion mutuelle</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="X" l="ENG"><s0>Interdiffusion</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="X" l="SPA"><s0>Difusión mútua</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE"><s0>Cobalt</s0>
<s2>NC</s2>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG"><s0>Cobalt</s0>
<s2>NC</s2>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE"><s0>Métal transition</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG"><s0>Transition elements</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE"><s0>Silicium</s0>
<s2>NC</s2>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG"><s0>Silicon</s0>
<s2>NC</s2>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Couche mince</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Thin films</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE"><s0>Aluminium</s0>
<s2>NC</s2>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Aluminium</s0>
<s2>NC</s2>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE"><s0>Diffusion(transport)</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="3" l="ENG"><s0>Diffusion</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE"><s0>Structure MIS</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="3" l="ENG"><s0>MIS structures</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>Spectrométrie Auger</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="3" l="ENG"><s0>AES</s0>
<s5>09</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE"><s0>Microscopie électronique transmission</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG"><s0>Transmission electron microscopy</s0>
<s5>10</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE"><s0>Co</s0>
<s4>INC</s4>
<s5>32</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE"><s0>Si</s0>
<s4>INC</s4>
<s5>33</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE"><s0>Al</s0>
<s4>INC</s4>
<s5>34</s5>
</fC03>
<fN21><s1>312</s1>
</fN21>
<fN44 i1="01"><s1>OTO</s1>
</fN44>
<fN82><s1>OTO</s1>
</fN82>
</pA>
</standard>
<server><NO>PASCAL 10-0480881 INIST</NO>
<ET>Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer</ET>
<AU>EL ASRI (T.); RAISSI (M.); VIZZINI (S.); EL MAACHI (A.); AMEZIANE (E. L.); ARNAUD D'AVITAYA (F.); LAZZARI (J.-L.); COUDREAU (C.); OUGHADDOU (H.); AUFRAY (B.); KADDOURI (A.)</AU>
<AF>Université Cadi Ayyad, Faculté des Sciences Semlalia, SIAM/Marrakech/Maroc (1 aut., 4 aut., 11 aut.); CINAM-CNRS, Case 913/13288 Marseille/France (2 aut., 6 aut., 7 aut., 8 aut., 10 aut.); CEA, IRAMIS, SPCSI/91191 Gif sur-Yvette/France (3 aut., 9 aut.); Université Cadi Ayyad, Faculté des Sciences Semlalia, UFR-MEC/Marrakech/Maroc (5 aut.); Université de Cergy-Pontoise, LAMAP/95031 Cergy-Pontoise/France (9 aut.)</AF>
<DT>Publication en série; Niveau analytique</DT>
<SO>Applied surface science; ISSN 0169-4332; Pays-Bas; Da. 2010; Vol. 256; No. 9; Pp. 2731-2734; Bibl. 17 ref.</SO>
<LA>Anglais</LA>
<EA>Optical emission spectroscopy of sputtered species during ion bombardment, Auger electron spectroscopy and high-resolution transmission electron microscopy were used to study the cobalt and silicon diffusion through the interfaces of Co/AlO/Si(0 0 1) hetero-structure. The results are discussed as a function of the annealing temperature of sample and show that the diffusion process at the interfaces starts for annealing temperatures above 200 °C without detectable modification of the oxide layer.</EA>
<CC>001B60; 001B70; 001B80</CC>
<FD>Diffusion mutuelle; Cobalt; Métal transition; Silicium; Couche mince; Aluminium; Diffusion(transport); Structure MIS; Spectrométrie Auger; Microscopie électronique transmission; Co; Si; Al</FD>
<ED>Interdiffusion; Cobalt; Transition elements; Silicon; Thin films; Aluminium; Diffusion; MIS structures; AES; Transmission electron microscopy</ED>
<SD>Difusión mútua</SD>
<LO>INIST-16002.354000189743200120</LO>
<ID>10-0480881</ID>
</server>
</inist>
</record>

Pour manipuler ce document sous Unix (Dilib)

EXPLOR_STEP=$WICRI_ROOT/Wicri/Terre/explor/CobaltMaghrebV1/Data/PascalFrancis/Corpus

HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 000079 | SxmlIndent | more

HfdSelect -h $EXPLOR_AREA/Data/PascalFrancis/Corpus/biblio.hfd -nk 000079 | SxmlIndent | more

Pour mettre un lien sur cette page dans le réseau Wicri

{{Explor lien
   |wiki=    Wicri/Terre
   |area=    CobaltMaghrebV1
   |flux=    PascalFrancis
   |étape=   Corpus
   |type=    RBID
   |clé=     Pascal:10-0480881
   |texte=   Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer
}}

This area was generated with Dilib version V0.6.32.
Data generation: Tue Nov 14 12:56:51 2017. Site generation: Mon Feb 12 07:59:49 2024

	Serveur d'exploration sur le cobalt au Maghreb
	Attention, ce site est en cours de développement ! Attention, site généré par des moyens informatiques à partir de corpus bruts. Les informations ne sont donc pas validées.

Serveur d'exploration sur le cobalt au Maghreb

Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer

Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer

Source :

Descripteurs français

English descriptors

Abstract

Notice en format standard (ISO 2709)

Format Inist (serveur)

Links to Exploration step

Le document en format XML

Pour manipuler ce document sous Unix (Dilib)

Pour mettre un lien sur cette page dans le réseau Wicri