CV characteristic < CVD < CVD coatings

Facettes :

List of bibliographic references

Number of relevant bibliographic references: 30.
[0-20] [0 - 20][0 - 30][20-29][20-40]

Ident.	Authors (with country if any)	Title
000048 (2013)		Influence of precursor nature on the thermal growth of Tin-Indium oxide layers by MOCVD
000115 (2012)		Investigation of indium nitride for micro-nanotechnology
000460 (2009)		Electrical and Photoresponse Properties of an Intramolecular p-n Homojunction in Single Phosphorus-Doped ZnO Nanowires
000485 (2008)		Thermal optimization of 1.55 μm OP-VECSEL with hybrid metal-metamorphic mirror for single-mode high power operation
000506 (2008)		Single crystal CVD diamond growth strategy by the use of a 3D geometrical model : Growth on (113) oriented substrates
000794 (2006)		Nitrogen-doped diamond : Thermoluminescence and dosimetric applications
000866 (2005)		V-defects and dislocations in InGaN/GaN heterostructures
000939 (2005)		Long wavelength room temperature laser operation of a strained InGaAs/GaAs quantum well structure monolithically grown by metalorganic chemical vapour deposition on a low energy-plasma enhanced chemical vapour deposition graded misoriented Ge/Si virtual substrate
000A74 (2004)		Structural studies of nano/micrometric semiconducting GaInP wires grown by MOCVD
000B46 (2004)		Growth studies and characterisation of In2S3 thin films deposited by atomic layer deposition (ALD)
000C93 (2003)		Structural and optical properties of indium oxide thin films prepared by an ultrasonic spray CVD process
001013 (2002)		Formation of 3D InAs quantum dots on InP substrate
001699 (1999)		Modeling and dynamic simulation of ultraviolet induced growing interfaces
001779 (1999)		A comprehensive characterization of copper indium disulfide thin film
001846 (1998-07-01)		Temperature distribution and transport mode in a close-spaced vapor transport reactor for CuInSe2 depositions
001A42 (1998)		A Monte carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition
001C20 (1997)		Preparation of boron nitride thin films by microwave plasma enhanced CVD, for semiconductor applications
001F33 (1996)		Growth of CuInSe2, Cu(In,Ga)Se2 and CuIn(Se,S)2 films on SnO2 thin film substrates
001F88 (1995-12)		Silicium déposé par L.P.C.V.D. et dopé in-situ: dépôt, caractérisation et application
001F99 (1995-11-01)		Critical layer thickness in metal organic chemical vapor deposition grown InGaAs/GaAs strained quantum wells
002007 (1995-10-15)		Misorientation effect on the monolayer terrace topography of (100) InP substrates annealed under a PH3/H2 ambient and homoepitaxial layers grown by metalorganic chemical vapor deposition

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