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Surface topography effects in C60 bombardment of Si

Identifieur interne : 000460 ( Istex/Corpus ); précédent : 000459; suivant : 000461

Surface topography effects in C60 bombardment of Si

Auteurs : Edward L. Cook ; Kristin D. Krantzman ; Barbara J. Garrison

Source :

RBID : ISTEX:792687FBE6634E085E65DCEE9B4783EAD96B545A

Abstract

Molecular dynamics simulations of multi‐impact bombardment of Si with 20‐keV C60 projectiles at normal incidence are performed for a total of 400 impacts, which corresponds to a fluence of of 7 × 1013 C60/cm2. The surface is roughened by successive bombardment and achieves a steady‐state root mean square roughness of 2.0 nm after about 100 impacts. There is a direct correlation between the local topography of the region around the impact point and the sputtered yield. The greatest yields of sputtered atoms are produced when the projectile impacts a mound, which is characterized by the height of the surface relative to the average surface height. When the projectile hits a local region corresponding to a crater with a height much less than the average surface height, the sputtered yield is very small. However, it is these trajectories that deposit carbon atoms at depths beneath the region from which atoms are sputtered, and are responsible for the buildup of carbon at the bottom of craters. Copyright © 2012 John Wiley & Sons, Ltd.

Url:
DOI: 10.1002/sia.4965

Links to Exploration step

ISTEX:792687FBE6634E085E65DCEE9B4783EAD96B545A

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<sub>60</sub>
projectiles at normal incidence are performed for a total of 400 impacts, which corresponds to a fluence of of 7 × 10
<sup>13</sup>
 C
<sub>60</sub>
/cm
<sup>2</sup>
. The surface is roughened by successive bombardment and achieves a steady‐state root mean square roughness of 2.0 nm after about 100 impacts. There is a direct correlation between the local topography of the region around the impact point and the sputtered yield. The greatest yields of sputtered atoms are produced when the projectile impacts a mound, which is characterized by the height of the surface relative to the average surface height. When the projectile hits a local region corresponding to a crater with a height much less than the average surface height, the sputtered yield is very small. However, it is these trajectories that deposit carbon atoms at depths beneath the region from which atoms are sputtered, and are responsible for the buildup of carbon at the bottom of craters. Copyright © 2012 John Wiley & Sons, Ltd.</p>
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<title>Surface topography effects in C60 bombardment of Si</title>
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<title>Surface topography effects in C60 bombardment of Si</title>
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<title>Surface topography effects in C60 bombardment of Si</title>
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<name type="personal">
<namePart type="given">Edward L.</namePart>
<namePart type="family">Cook</namePart>
<affiliation>Department of Chemistry and Biochemistry, 66 George Street, College of Charleston, SC 29412, Charleston, USA</affiliation>
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<name type="personal">
<namePart type="given">Kristin D.</namePart>
<namePart type="family">Krantzman</namePart>
<affiliation>Department of Chemistry and Biochemistry, 66 George Street, College of Charleston, SC 29412, Charleston, USA</affiliation>
<affiliation>Department of Chemistry and Biochemistry, 66 George Street, College of Charleston, Charleston, SC 29412, USA.E‐mail:</affiliation>
<affiliation>E-mail: krantzmank@cofc.edu</affiliation>
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<name type="personal">
<namePart type="given">Barbara J.</namePart>
<namePart type="family">Garrison</namePart>
<affiliation>Department of Chemistry, 104 Chemistry Building, Penn State University, University Park, PA 16802, USA</affiliation>
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<abstract>Molecular dynamics simulations of multi‐impact bombardment of Si with 20‐keV C60 projectiles at normal incidence are performed for a total of 400 impacts, which corresponds to a fluence of of 7 × 1013 C60/cm2. The surface is roughened by successive bombardment and achieves a steady‐state root mean square roughness of 2.0 nm after about 100 impacts. There is a direct correlation between the local topography of the region around the impact point and the sputtered yield. The greatest yields of sputtered atoms are produced when the projectile impacts a mound, which is characterized by the height of the surface relative to the average surface height. When the projectile hits a local region corresponding to a crater with a height much less than the average surface height, the sputtered yield is very small. However, it is these trajectories that deposit carbon atoms at depths beneath the region from which atoms are sputtered, and are responsible for the buildup of carbon at the bottom of craters. Copyright © 2012 John Wiley & Sons, Ltd.</abstract>
<subject>
<genre>keywords</genre>
<topic>dynamics SIMS</topic>
<topic>molecular dynamics simulations</topic>
<topic>C60+</topic>
<topic>silicon</topic>
<topic>carbon</topic>
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<titleInfo>
<title>Surface and Interface Analysis</title>
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<titleInfo type="abbreviated">
<title>Surf. Interface Anal.</title>
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<name type="personal">
<namePart type="given">Enrico</namePart>
<namePart type="family">Napolitani</namePart>
<role>
<roleTerm type="text">editor</roleTerm>
</role>
</name>
<name type="personal">
<namePart type="given">Damiano</namePart>
<namePart type="family">Giubertoni</namePart>
<role>
<roleTerm type="text">editor</roleTerm>
</role>
</name>
<name type="personal">
<namePart type="given">Massimo</namePart>
<namePart type="family">Bersani</namePart>
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<namePart type="given">Mariano</namePart>
<namePart type="family">Anderle</namePart>
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<name type="personal">
<namePart type="given">Antonino</namePart>
<namePart type="family">Licciardello</namePart>
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<topic>SIMS proceedings paper</topic>
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<identifier type="ISSN">0142-2421</identifier>
<identifier type="eISSN">1096-9918</identifier>
<identifier type="DOI">10.1002/(ISSN)1096-9918</identifier>
<identifier type="PublisherID">SIA</identifier>
<part>
<date>2013</date>
<detail type="title">
<title>Proceedings of the Eighteenth International Conference on Secondary Ion Mass Spectrometry, SIMS XVIII, Riva Del Garda, Trento, Italy, September 18 ‐ 23, 2011</title>
</detail>
<detail type="volume">
<caption>vol.</caption>
<number>45</number>
</detail>
<detail type="issue">
<caption>no.</caption>
<number>1</number>
</detail>
<extent unit="pages">
<start>93</start>
<end>96</end>
<total>4</total>
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<accessCondition type="use and reproduction" contentType="copyright">Copyright © 2013 John Wiley & Sons, Ltd.Copyright © 2012 John Wiley & Sons, Ltd.</accessCondition>
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