Sputtering of a coarse‐grained benzene and Ag(111) crystals by large Ar clusters – effect of impact angle and cohesive energy
Identifieur interne : 000459 ( Istex/Corpus ); précédent : 000458; suivant : 000460Sputtering of a coarse‐grained benzene and Ag(111) crystals by large Ar clusters – effect of impact angle and cohesive energy
Auteurs : Lukasz Rzeznik ; Robert Paruch ; Barbara J. Garrison ; Zbigniew PostawaSource :
- Surface and Interface Analysis [ 0142-2421 ] ; 2013-01.
Abstract
Molecular dynamics computer simulations are employed to investigate the role of the substrate cohesive energy on the impact angle dependence of the sputtering yield for Ar60 and Ar2953 projectiles bombarding a benzene molecular solid and a Ag(111) atomistic sample. A different dependence of the total sputtering yield on the impact angle is observed for small and large projectiles for benzene, while a similar dependence is observed for Ag(111). It is demonstrated that the increase of the cohesive energy leads to a significant decrease of the total ejection signal for both Ar60 and Ar2953 projectiles. The shape of the impact angle dependence, however, is much less sensitive to this parameter. The ‘washing out’ mechanism and the structural differences of the irradiated samples are proposed to be responsible for the different shapes of the impact angle dependence. Copyright © 2012 John Wiley & Sons, Ltd.
Url:
DOI: 10.1002/sia.4934
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<front><div type="abstract">Molecular dynamics computer simulations are employed to investigate the role of the substrate cohesive energy on the impact angle dependence of the sputtering yield for Ar60 and Ar2953 projectiles bombarding a benzene molecular solid and a Ag(111) atomistic sample. A different dependence of the total sputtering yield on the impact angle is observed for small and large projectiles for benzene, while a similar dependence is observed for Ag(111). It is demonstrated that the increase of the cohesive energy leads to a significant decrease of the total ejection signal for both Ar60 and Ar2953 projectiles. The shape of the impact angle dependence, however, is much less sensitive to this parameter. The ‘washing out’ mechanism and the structural differences of the irradiated samples are proposed to be responsible for the different shapes of the impact angle dependence. Copyright © 2012 John Wiley & Sons, Ltd.</div>
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<abstractGroup><abstract type="main"><p>Molecular dynamics computer simulations are employed to investigate the role of the substrate cohesive energy on the impact angle dependence of the sputtering yield for Ar<sub>60</sub>
and Ar<sub>2953</sub>
projectiles bombarding a benzene molecular solid and a Ag(111) atomistic sample. A different dependence of the total sputtering yield on the impact angle is observed for small and large projectiles for benzene, while a similar dependence is observed for Ag(111). It is demonstrated that the increase of the cohesive energy leads to a significant decrease of the total ejection signal for both Ar<sub>60</sub>
and Ar<sub>2953</sub>
projectiles. The shape of the impact angle dependence, however, is much less sensitive to this parameter. The ‘washing out’ mechanism and the structural differences of the irradiated samples are proposed to be responsible for the different shapes of the impact angle dependence. Copyright © 2012 John Wiley & Sons, Ltd.</p>
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<mods version="3.6"><titleInfo lang="en"><title>Sputtering of a coarse‐grained benzene and Ag(111) crystals by large Ar clusters – effect of impact angle and cohesive energy</title>
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<titleInfo type="abbreviated" lang="en"><title>Sputtering of a coarse‐grained benzene and Ag</title>
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<titleInfo type="alternative" contentType="CDATA" lang="en"><title>Sputtering of a coarse‐grained benzene and Ag(111) crystals by large Ar clusters – effect of impact angle and cohesive energy</title>
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<name type="personal"><namePart type="given">Lukasz</namePart>
<namePart type="family">Rzeznik</namePart>
<affiliation>University of Information Technology and Management, Sucharskiego 2, Rzeszow, Poland</affiliation>
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<name type="personal"><namePart type="given">Robert</namePart>
<namePart type="family">Paruch</namePart>
<affiliation>Institute of Physics, Jagiellonian University, Reymonta 4, Kraków, Poland</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Barbara J.</namePart>
<namePart type="family">Garrison</namePart>
<affiliation>Department of Chemistry, The Pennsylvania State University, University Park, PA, 16802, USA</affiliation>
<role><roleTerm type="text">author</roleTerm>
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<name type="personal"><namePart type="given">Zbigniew</namePart>
<namePart type="family">Postawa</namePart>
<affiliation>Institute of Physics, Jagiellonian University, Reymonta 4, Kraków, Poland</affiliation>
<affiliation>Zbigniew Postawa, Institute of Physics, Jagiellonian University, Reymonta 4, Kraków, Poland.E‐mail:</affiliation>
<affiliation>E-mail: zbigniew.postawa@uj.edu.pl</affiliation>
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<dateCaptured encoding="w3cdtf">2011-10-07</dateCaptured>
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<abstract>Molecular dynamics computer simulations are employed to investigate the role of the substrate cohesive energy on the impact angle dependence of the sputtering yield for Ar60 and Ar2953 projectiles bombarding a benzene molecular solid and a Ag(111) atomistic sample. A different dependence of the total sputtering yield on the impact angle is observed for small and large projectiles for benzene, while a similar dependence is observed for Ag(111). It is demonstrated that the increase of the cohesive energy leads to a significant decrease of the total ejection signal for both Ar60 and Ar2953 projectiles. The shape of the impact angle dependence, however, is much less sensitive to this parameter. The ‘washing out’ mechanism and the structural differences of the irradiated samples are proposed to be responsible for the different shapes of the impact angle dependence. Copyright © 2012 John Wiley & Sons, Ltd.</abstract>
<note type="funding">Chemistry Division of the National Science Foundation - No. CHE‐0910564; </note>
<subject><genre>keywords</genre>
<topic>computer simulations</topic>
<topic>SIMS</topic>
<topic>sputtering</topic>
<topic>organic solids</topic>
</subject>
<relatedItem type="host"><titleInfo><title>Surface and Interface Analysis</title>
</titleInfo>
<titleInfo type="abbreviated"><title>Surf. Interface Anal.</title>
</titleInfo>
<name type="personal"><namePart type="given">Enrico</namePart>
<namePart type="family">Napolitani</namePart>
<role><roleTerm type="text">editor</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Damiano</namePart>
<namePart type="family">Giubertoni</namePart>
<role><roleTerm type="text">editor</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Massimo</namePart>
<namePart type="family">Bersani</namePart>
<role><roleTerm type="text">editor</roleTerm>
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</name>
<name type="personal"><namePart type="given">Mariano</namePart>
<namePart type="family">Anderle</namePart>
<role><roleTerm type="text">editor</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Antonino</namePart>
<namePart type="family">Licciardello</namePart>
<role><roleTerm type="text">editor</roleTerm>
</role>
</name>
<genre type="journal">journal</genre>
<subject><genre>article-category</genre>
<topic>SIMS proceedings paper</topic>
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<identifier type="ISSN">0142-2421</identifier>
<identifier type="eISSN">1096-9918</identifier>
<identifier type="DOI">10.1002/(ISSN)1096-9918</identifier>
<identifier type="PublisherID">SIA</identifier>
<part><date>2013</date>
<detail type="title"><title>Proceedings of the Eighteenth International Conference on Secondary Ion Mass Spectrometry, SIMS XVIII, Riva Del Garda, Trento, Italy, September 18 ‐ 23, 2011</title>
</detail>
<detail type="volume"><caption>vol.</caption>
<number>45</number>
</detail>
<detail type="issue"><caption>no.</caption>
<number>1</number>
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<extent unit="pages"><start>27</start>
<end>30</end>
<total>4</total>
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<identifier type="DOI">10.1002/sia.4934</identifier>
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<accessCondition type="use and reproduction" contentType="copyright">Copyright © 2013 John Wiley & Sons, Ltd.Copyright © 2012 John Wiley & Sons, Ltd.</accessCondition>
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