Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation
Identifieur interne : 000188 ( Istex/Curation ); précédent : 000187; suivant : 000189Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation
Auteurs : B. E. Jacobson ; R. F. Bunshah [États-Unis] ; R. Nimmagadda [États-Unis]Source :
- Thin Solid Films [ 0040-6090 ] ; 1978.
Abstract
The activated reactive evaporation technique is used for processing carbide alloy coatings on tools. Improved properties of these films can be developed if the relationships between processing parameters, microstructural features and mechanical properties are well understood. The main aim of the present investigation was to characterize the microstructures of TiC and (V,Ti)C films prepared by the activated reactive evaporation process at varying deposition temperatures (550–1000°C) and to relate these features to the hardness. The transmission electron microscopy technique was used for this purpose. Two characteristic and completely different grain morphologies are produced in these films, one at low temperatures (extremely fine grained with grain diameters of about 10 nm) and one at high temperatures (of more normal grain structure with micronsized grains). These are all equilibrium single-phase structures of TiC and (V,Ti)C respectively except for the low temperature deposit of (V-23 at.% Ti)C prepared at 550°C; (V-23 at.% Ti)C is a mixture of TiC, VC and free graphite phases. The hardness is superior in the large-grained structures.
Url:
DOI: 10.1016/0040-6090(78)90281-X
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<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title>Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation</title><author><name sortKey="Jacobson, B E" sort="Jacobson, B E" uniqKey="Jacobson B" first="B. E." last="Jacobson">B. E. Jacobson</name></author><author><name sortKey="Bunshah, R F" sort="Bunshah, R F" uniqKey="Bunshah R" first="R. F." last="Bunshah">R. F. Bunshah</name><affiliation wicri:level="1"><mods:affiliation>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</mods:affiliation><country xml:lang="fr">États-Unis</country><wicri:regionArea>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025</wicri:regionArea></affiliation></author><author><name sortKey="Nimmagadda, R" sort="Nimmagadda, R" uniqKey="Nimmagadda R" first="R." last="Nimmagadda">R. Nimmagadda</name><affiliation wicri:level="1"><mods:affiliation>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</mods:affiliation><country xml:lang="fr">États-Unis</country><wicri:regionArea>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025</wicri:regionArea></affiliation></author></titleStmt><publicationStmt><idno type="wicri:source">ISTEX</idno><idno type="RBID">ISTEX:20E608BA6F91433DD3122DC3F3F1FD2B217176A6</idno><date when="1978" year="1978">1978</date><idno type="doi">10.1016/0040-6090(78)90281-X</idno><idno type="url">https://api.istex.fr/document/20E608BA6F91433DD3122DC3F3F1FD2B217176A6/fulltext/pdf</idno><idno type="wicri:Area/Istex/Corpus">000191</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">000191</idno><idno type="wicri:Area/Istex/Curation">000188</idno></publicationStmt><sourceDesc><biblStruct><analytic><title level="a">Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation</title><author><name sortKey="Jacobson, B E" sort="Jacobson, B E" uniqKey="Jacobson B" first="B. E." last="Jacobson">B. E. Jacobson</name></author><author><name sortKey="Bunshah, R F" sort="Bunshah, R F" uniqKey="Bunshah R" first="R. F." last="Bunshah">R. F. Bunshah</name><affiliation wicri:level="1"><mods:affiliation>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</mods:affiliation><country xml:lang="fr">États-Unis</country><wicri:regionArea>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025</wicri:regionArea></affiliation></author><author><name sortKey="Nimmagadda, R" sort="Nimmagadda, R" uniqKey="Nimmagadda R" first="R." last="Nimmagadda">R. Nimmagadda</name><affiliation wicri:level="1"><mods:affiliation>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</mods:affiliation><country xml:lang="fr">États-Unis</country><wicri:regionArea>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025</wicri:regionArea></affiliation></author></analytic><monogr></monogr><series><title level="j">Thin Solid Films</title><title level="j" type="abbrev">TSF</title><idno type="ISSN">0040-6090</idno><imprint><publisher>ELSEVIER</publisher><date type="published" when="1978">1978</date><biblScope unit="volume">54</biblScope><biblScope unit="issue">1</biblScope><biblScope unit="page" from="107">107</biblScope><biblScope unit="page" to="118">118</biblScope></imprint><idno type="ISSN">0040-6090</idno></series><idno type="istex">20E608BA6F91433DD3122DC3F3F1FD2B217176A6</idno><idno type="DOI">10.1016/0040-6090(78)90281-X</idno><idno type="PII">0040-6090(78)90281-X</idno></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">0040-6090</idno></seriesStmt></fileDesc><profileDesc><textClass></textClass><langUsage><language ident="en">en</language></langUsage></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">The activated reactive evaporation technique is used for processing carbide alloy coatings on tools. Improved properties of these films can be developed if the relationships between processing parameters, microstructural features and mechanical properties are well understood. The main aim of the present investigation was to characterize the microstructures of TiC and (V,Ti)C films prepared by the activated reactive evaporation process at varying deposition temperatures (550–1000°C) and to relate these features to the hardness. The transmission electron microscopy technique was used for this purpose. Two characteristic and completely different grain morphologies are produced in these films, one at low temperatures (extremely fine grained with grain diameters of about 10 nm) and one at high temperatures (of more normal grain structure with micronsized grains). These are all equilibrium single-phase structures of TiC and (V,Ti)C respectively except for the low temperature deposit of (V-23 at.% Ti)C prepared at 550°C; (V-23 at.% Ti)C is a mixture of TiC, VC and free graphite phases. The hardness is superior in the large-grained structures.</div></front></TEI></record>Pour manipuler ce document sous Unix (Dilib)
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