Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation
Identifieur interne : 000191 ( Istex/Corpus ); précédent : 000190; suivant : 000192Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation
Auteurs : B. E. Jacobson ; R. F. Bunshah ; R. NimmagaddaSource :
- Thin Solid Films [ 0040-6090 ] ; 1978.
Abstract
The activated reactive evaporation technique is used for processing carbide alloy coatings on tools. Improved properties of these films can be developed if the relationships between processing parameters, microstructural features and mechanical properties are well understood. The main aim of the present investigation was to characterize the microstructures of TiC and (V,Ti)C films prepared by the activated reactive evaporation process at varying deposition temperatures (550–1000°C) and to relate these features to the hardness. The transmission electron microscopy technique was used for this purpose. Two characteristic and completely different grain morphologies are produced in these films, one at low temperatures (extremely fine grained with grain diameters of about 10 nm) and one at high temperatures (of more normal grain structure with micronsized grains). These are all equilibrium single-phase structures of TiC and (V,Ti)C respectively except for the low temperature deposit of (V-23 at.% Ti)C prepared at 550°C; (V-23 at.% Ti)C is a mixture of TiC, VC and free graphite phases. The hardness is superior in the large-grained structures.
Url:
DOI: 10.1016/0040-6090(78)90281-X
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<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title>Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation</title><author><name sortKey="Jacobson, B E" sort="Jacobson, B E" uniqKey="Jacobson B" first="B. E." last="Jacobson">B. E. Jacobson</name></author><author><name sortKey="Bunshah, R F" sort="Bunshah, R F" uniqKey="Bunshah R" first="R. F." last="Bunshah">R. F. Bunshah</name><affiliation><mods:affiliation>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</mods:affiliation></affiliation></author><author><name sortKey="Nimmagadda, R" sort="Nimmagadda, R" uniqKey="Nimmagadda R" first="R." last="Nimmagadda">R. Nimmagadda</name><affiliation><mods:affiliation>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</mods:affiliation></affiliation></author></titleStmt><publicationStmt><idno type="wicri:source">ISTEX</idno><idno type="RBID">ISTEX:20E608BA6F91433DD3122DC3F3F1FD2B217176A6</idno><date when="1978" year="1978">1978</date><idno type="doi">10.1016/0040-6090(78)90281-X</idno><idno type="url">https://api.istex.fr/document/20E608BA6F91433DD3122DC3F3F1FD2B217176A6/fulltext/pdf</idno><idno type="wicri:Area/Istex/Corpus">000191</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">000191</idno></publicationStmt><sourceDesc><biblStruct><analytic><title level="a">Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation</title><author><name sortKey="Jacobson, B E" sort="Jacobson, B E" uniqKey="Jacobson B" first="B. E." last="Jacobson">B. E. Jacobson</name></author><author><name sortKey="Bunshah, R F" sort="Bunshah, R F" uniqKey="Bunshah R" first="R. F." last="Bunshah">R. F. Bunshah</name><affiliation><mods:affiliation>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</mods:affiliation></affiliation></author><author><name sortKey="Nimmagadda, R" sort="Nimmagadda, R" uniqKey="Nimmagadda R" first="R." last="Nimmagadda">R. Nimmagadda</name><affiliation><mods:affiliation>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</mods:affiliation></affiliation></author></analytic><monogr></monogr><series><title level="j">Thin Solid Films</title><title level="j" type="abbrev">TSF</title><idno type="ISSN">0040-6090</idno><imprint><publisher>ELSEVIER</publisher><date type="published" when="1978">1978</date><biblScope unit="volume">54</biblScope><biblScope unit="issue">1</biblScope><biblScope unit="page" from="107">107</biblScope><biblScope unit="page" to="118">118</biblScope></imprint><idno type="ISSN">0040-6090</idno></series><idno type="istex">20E608BA6F91433DD3122DC3F3F1FD2B217176A6</idno><idno type="DOI">10.1016/0040-6090(78)90281-X</idno><idno type="PII">0040-6090(78)90281-X</idno></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">0040-6090</idno></seriesStmt></fileDesc><profileDesc><textClass></textClass><langUsage><language ident="en">en</language></langUsage></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">The activated reactive evaporation technique is used for processing carbide alloy coatings on tools. Improved properties of these films can be developed if the relationships between processing parameters, microstructural features and mechanical properties are well understood. The main aim of the present investigation was to characterize the microstructures of TiC and (V,Ti)C films prepared by the activated reactive evaporation process at varying deposition temperatures (550–1000°C) and to relate these features to the hardness. The transmission electron microscopy technique was used for this purpose. Two characteristic and completely different grain morphologies are produced in these films, one at low temperatures (extremely fine grained with grain diameters of about 10 nm) and one at high temperatures (of more normal grain structure with micronsized grains). These are all equilibrium single-phase structures of TiC and (V,Ti)C respectively except for the low temperature deposit of (V-23 at.% Ti)C prepared at 550°C; (V-23 at.% Ti)C is a mixture of TiC, VC and free graphite phases. The hardness is superior in the large-grained structures.</div></front></TEI><istex><corpusName>elsevier</corpusName><author><json:item><name>B.E. Jacobson</name></json:item><json:item><name>R.F. Bunshah</name><affiliations><json:string>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</json:string></affiliations></json:item><json:item><name>R. Nimmagadda</name><affiliations><json:string>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</json:string></affiliations></json:item></author><language><json:string>eng</json:string></language><abstract>The activated reactive evaporation technique is used for processing carbide alloy coatings on tools. Improved properties of these films can be developed if the relationships between processing parameters, microstructural features and mechanical properties are well understood. The main aim of the present investigation was to characterize the microstructures of TiC and (V,Ti)C films prepared by the activated reactive evaporation process at varying deposition temperatures (550–1000°C) and to relate these features to the hardness. The transmission electron microscopy technique was used for this purpose. Two characteristic and completely different grain morphologies are produced in these films, one at low temperatures (extremely fine grained with grain diameters of about 10 nm) and one at high temperatures (of more normal grain structure with micronsized grains). These are all equilibrium single-phase structures of TiC and (V,Ti)C respectively except for the low temperature deposit of (V-23 at.% Ti)C prepared at 550°C; (V-23 at.% Ti)C is a mixture of TiC, VC and free graphite phases. 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Improved properties of these films can be developed if the relationships between processing parameters, microstructural features and mechanical properties are well understood. The main aim of the present investigation was to characterize the microstructures of TiC and (V,Ti)C films prepared by the activated reactive evaporation process at varying deposition temperatures (550–1000°C) and to relate these features to the hardness. The transmission electron microscopy technique was used for this purpose. Two characteristic and completely different grain morphologies are produced in these films, one at low temperatures (extremely fine grained with grain diameters of about 10 nm) and one at high temperatures (of more normal grain structure with micronsized grains). These are all equilibrium single-phase structures of TiC and (V,Ti)C respectively except for the low temperature deposit of (V-23 at.% Ti)C prepared at 550°C; (V-23 at.% Ti)C is a mixture of TiC, VC and free graphite phases. The hardness is superior in the large-grained structures.</p></abstract></profileDesc><revisionDesc><change when="1978-04-16">Registration</change><change when="1978">Published</change></revisionDesc></teiHeader></istex:fulltextTEI></fulltext><metadata><istex:metadataXml wicri:clean="Elsevier, elements deleted: tail"><istex:xmlDeclaration>version="1.0" encoding="utf-8"</istex:xmlDeclaration><istex:docType PUBLIC="-//ES//DTD journal article DTD version 4.5.2//EN//XML" URI="art452.dtd" name="istex:docType"></istex:docType><istex:document><converted-article version="4.5.2" docsubtype="fla"><item-info><jid>TSF</jid><aid>7890281X</aid><ce:pii>0040-6090(78)90281-X</ce:pii><ce:doi>10.1016/0040-6090(78)90281-X</ce:doi><ce:copyright type="unknown" year="1978"></ce:copyright></item-info><head><ce:article-footnote><ce:label>☆</ce:label><ce:note-para>Paper presented at the International Conference on Metallurgical Coatings, San Francisco, California, U.S.A., April 3–7, 1978.</ce:note-para></ce:article-footnote><ce:title>Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporation</ce:title><ce:author-group><ce:author><ce:given-name>B.E.</ce:given-name><ce:surname>Jacobson</ce:surname></ce:author><ce:affiliation><ce:textfn>Department of Materials Science and Engineering, Stanford University, Stanford, Calif. 94305, U.S.A.</ce:textfn></ce:affiliation></ce:author-group><ce:author-group><ce:author><ce:given-name>R.F.</ce:given-name><ce:surname>Bunshah</ce:surname><ce:cross-ref refid="AFF1"><ce:sup>a</ce:sup></ce:cross-ref></ce:author><ce:author><ce:given-name>R.</ce:given-name><ce:surname>Nimmagadda</ce:surname><ce:cross-ref refid="AFF1"><ce:sup>a</ce:sup></ce:cross-ref></ce:author><ce:affiliation id="AFF1"><ce:label>a</ce:label><ce:textfn>Materials Department, 6532 Boelter Hall, University of California at Los Angeles, Los Angeles, Calif. 90025, U.S.A.</ce:textfn></ce:affiliation></ce:author-group><ce:date-received day="4" month="4" year="1978"></ce:date-received><ce:date-accepted day="16" month="4" year="1978"></ce:date-accepted><ce:abstract><ce:section-title>Abstract</ce:section-title><ce:abstract-sec><ce:simple-para>The activated reactive evaporation technique is used for processing carbide alloy coatings on tools. Improved properties of these films can be developed if the relationships between processing parameters, microstructural features and mechanical properties are well understood. The main aim of the present investigation was to characterize the microstructures of TiC and (V,Ti)C films prepared by the activated reactive evaporation process at varying deposition temperatures (550–1000°C) and to relate these features to the hardness. The transmission electron microscopy technique was used for this purpose. Two characteristic and completely different grain morphologies are produced in these films, one at low temperatures (extremely fine grained with grain diameters of about 10 nm) and one at high temperatures (of more normal grain structure with micronsized grains). These are all equilibrium single-phase structures of TiC and (V,Ti)C respectively except for the low temperature deposit of (V-23 at.% Ti)C prepared at 550°C; (V-23 at.% Ti)C is a mixture of TiC, VC and free graphite phases. 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Improved properties of these films can be developed if the relationships between processing parameters, microstructural features and mechanical properties are well understood. The main aim of the present investigation was to characterize the microstructures of TiC and (V,Ti)C films prepared by the activated reactive evaporation process at varying deposition temperatures (550–1000°C) and to relate these features to the hardness. The transmission electron microscopy technique was used for this purpose. Two characteristic and completely different grain morphologies are produced in these films, one at low temperatures (extremely fine grained with grain diameters of about 10 nm) and one at high temperatures (of more normal grain structure with micronsized grains). These are all equilibrium single-phase structures of TiC and (V,Ti)C respectively except for the low temperature deposit of (V-23 at.% Ti)C prepared at 550°C; (V-23 at.% Ti)C is a mixture of TiC, VC and free graphite phases. The hardness is superior in the large-grained structures.</abstract><note>Paper presented at the International Conference on Metallurgical Coatings, San Francisco, California, U.S.A., April 3–7, 1978.</note><relatedItem type="host"><titleInfo><title>Thin Solid Films</title></titleInfo><titleInfo type="abbreviated"><title>TSF</title></titleInfo><genre type="Journal">journal</genre><originInfo><dateIssued encoding="w3cdtf">19781002</dateIssued></originInfo><identifier type="ISSN">0040-6090</identifier><identifier type="PII">S0040-6090(00)X0440-3</identifier><part><date>19781002</date><detail type="volume"><number>54</number><caption>vol.</caption></detail><detail type="issue"><number>1</number><caption>no.</caption></detail><extent unit="issue pages"><start>1</start><end>137</end></extent><extent unit="pages"><start>107</start><end>118</end></extent></part></relatedItem><identifier type="istex">20E608BA6F91433DD3122DC3F3F1FD2B217176A6</identifier><identifier type="DOI">10.1016/0040-6090(78)90281-X</identifier><identifier type="PII">0040-6090(78)90281-X</identifier><recordInfo><recordContentSource>ELSEVIER</recordContentSource></recordInfo></mods></metadata><serie></serie></istex></record>Pour manipuler ce document sous Unix (Dilib)
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