Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique
Identifieur interne : 002695 ( Main/Merge ); précédent : 002694; suivant : 002696Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique
Auteurs : A. Bertsch [France] ; J. Y. Jezequel [France] ; J. C. Andre [France]Source :
- Journal of photochemistry and photobiology. A, Chemistry [ 1010-6030 ] ; 1997.
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Abstract
In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 μm.
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique</title><author><name sortKey="Bertsch, A" sort="Bertsch, A" uniqKey="Bertsch A" first="A." last="Bertsch">A. Bertsch</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1><s2>54001 Nancy</s2><s3>FRA</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Jezequel, J Y" sort="Jezequel, J Y" uniqKey="Jezequel J" first="J. Y." last="Jezequel">J. Y. Jezequel</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1><s2>54001 Nancy</s2><s3>FRA</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="Andre">J. C. Andre</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1><s2>54001 Nancy</s2><s3>FRA</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author></titleStmt><publicationStmt><idno type="wicri:source">INIST</idno><idno type="inist">97-0463232</idno><date when="1997">1997</date><idno type="stanalyst">PASCAL 97-0463232 INIST</idno><idno type="RBID">Pascal:97-0463232</idno><idno type="wicri:Area/PascalFrancis/Corpus">000D50</idno><idno type="wicri:Area/PascalFrancis/Curation">001199</idno><idno type="wicri:Area/PascalFrancis/Checkpoint">000D25</idno><idno type="wicri:explorRef" wicri:stream="PascalFrancis" wicri:step="Checkpoint">000D25</idno><idno type="wicri:doubleKey">1010-6030:1997:Bertsch A:study:of:the</idno><idno type="wicri:Area/Main/Merge">002695</idno></publicationStmt><sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique</title><author><name sortKey="Bertsch, A" sort="Bertsch, A" uniqKey="Bertsch A" first="A." last="Bertsch">A. Bertsch</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1><s2>54001 Nancy</s2><s3>FRA</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Jezequel, J Y" sort="Jezequel, J Y" uniqKey="Jezequel J" first="J. Y." last="Jezequel">J. Y. Jezequel</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1><s2>54001 Nancy</s2><s3>FRA</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="Andre">J. C. Andre</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1><s2>54001 Nancy</s2><s3>FRA</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author></analytic><series><title level="j" type="main">Journal of photochemistry and photobiology. A, Chemistry</title><title level="j" type="abbreviated">J. photochem. photobiol., A Chem.</title><idno type="ISSN">1010-6030</idno><imprint><date when="1997">1997</date></imprint></series></biblStruct></sourceDesc><seriesStmt><title level="j" type="main">Journal of photochemistry and photobiology. A, Chemistry</title><title level="j" type="abbreviated">J. photochem. photobiol., A Chem.</title><idno type="ISSN">1010-6030</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Acrylate polymer</term><term>Experimental study</term><term>Microelectronic fabrication</term><term>Microstructure</term><term>Photolithography</term><term>Photopolymerization</term><term>Rapid prototyping</term><term>Three dimensional structure</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>Etude expérimentale</term><term>Fabrication microélectronique</term><term>Microstructure</term><term>Structure 3 dimensions</term><term>Photolithographie</term><term>Prototypage rapide</term><term>Acrylate polymère</term><term>Polymérisation photochimique</term><term>Microactionneur</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 μm.</div></front></TEI><affiliations><list><country><li>France</li></country><region><li>Grand Est</li><li>Lorraine (région)</li></region><settlement><li>Nancy</li></settlement></list><tree><country name="France"><region name="Grand Est"><name sortKey="Bertsch, A" sort="Bertsch, A" uniqKey="Bertsch A" first="A." last="Bertsch">A. Bertsch</name></region><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="Andre">J. C. Andre</name><name sortKey="Jezequel, J Y" sort="Jezequel, J Y" uniqKey="Jezequel J" first="J. Y." last="Jezequel">J. Y. Jezequel</name></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
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