LrgpV1, PascalFrancis, Corpus, bibRecord, 000D50

Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique

Identifieur interne : 000D50 ( PascalFrancis/Corpus ); précédent : 000D49; suivant : 000D51

Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique

Auteurs : A. Bertsch ; J. Y. Jezequel ; J. C. Andre

Source :

Journal of photochemistry and photobiology. A, Chemistry [ 1010-6030 ] ; 1997.

RBID : Pascal:97-0463232

Descripteurs français

Pascal (Inist)
- Etude expérimentale, Fabrication microélectronique, Microstructure, Structure 3 dimensions, Photolithographie, Prototypage rapide, Acrylate polymère, Polymérisation photochimique, Microactionneur.

English descriptors

KwdEn :
- Acrylate polymer, Experimental study, Microelectronic fabrication, Microstructure, Photolithography, Photopolymerization, Rapid prototyping, Three dimensional structure.

Abstract

In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 μm.

Notice en format standard (ISO 2709)

Pour connaître la documentation sur le format Inist Standard.

A01	`01`	`1`		`@0 1010-6030`
A02	`01`			`@0 JPPCEJ`
A03		`1`		`@0 J. photochem. photobiol., A Chem.`
A05				`@2 107`
A06				`@2 1-3`
A08	`01`	`1`	`ENG`	`@1 Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique`
A11	`01`	`1`		`@1 BERTSCH (A.)`
A11	`02`	`1`		`@1 JEZEQUEL (J. Y.)`
A11	`03`	`1`		`@1 ANDRE (J. C.)`
A14	`01`			`@1 DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451 @2 54001 Nancy @3 FRA @Z 1 aut. @Z 2 aut. @Z 3 aut.`
A20				`@1 275-281`
A21				`@1 1997`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 15990A @5 354000067658470410`
A44				`@0 0000 @1 © 1997 INIST-CNRS. All rights reserved.`
A45				`@0 9 ref.`
A47	`01`	`1`		`@0 97-0463232`
A60				`@1 P`
A61				`@0 A`
A64	`01`	`1`		`@0 Journal of photochemistry and photobiology. A, Chemistry`
A66	`01`			`@0 CHE`
C01	`01`		`ENG`	@0 In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 μm.
C02	`01`	`X`		`@0 001D03F17`
C03	`01`	`X`	`FRE`	`@0 Etude expérimentale @5 02`
C03	`01`	`X`	`ENG`	`@0 Experimental study @5 02`
C03	`01`	`X`	`GER`	`@0 Experimentelle Untersuchung @5 02`
C03	`01`	`X`	`SPA`	`@0 Estudio experimental @5 02`
C03	`02`	`X`	`FRE`	`@0 Fabrication microélectronique @5 03`
C03	`02`	`X`	`ENG`	`@0 Microelectronic fabrication @5 03`
C03	`02`	`X`	`SPA`	`@0 Fabricación microeléctrica @5 03`
C03	`03`	`X`	`FRE`	`@0 Microstructure @5 04`
C03	`03`	`X`	`ENG`	`@0 Microstructure @5 04`
C03	`03`	`X`	`GER`	`@0 Mikrogefuege @5 04`
C03	`03`	`X`	`SPA`	`@0 Microestructura @5 04`
C03	`04`	`X`	`FRE`	`@0 Structure 3 dimensions @5 05`
C03	`04`	`X`	`ENG`	`@0 Three dimensional structure @5 05`
C03	`04`	`X`	`SPA`	`@0 Estructura 3 dimensiones @5 05`
C03	`05`	`X`	`FRE`	`@0 Photolithographie @5 06`
C03	`05`	`X`	`ENG`	`@0 Photolithography @5 06`
C03	`05`	`X`	`SPA`	`@0 Fotolitografía @5 06`
C03	`06`	`X`	`FRE`	`@0 Prototypage rapide @5 07`
C03	`06`	`X`	`ENG`	`@0 Rapid prototyping @5 07`
C03	`06`	`X`	`SPA`	`@0 Prototipificación rápida @5 07`
C03	`07`	`X`	`FRE`	`@0 Acrylate polymère @2 NK @5 08`
C03	`07`	`X`	`ENG`	`@0 Acrylate polymer @2 NK @5 08`
C03	`07`	`X`	`SPA`	`@0 Acrilato polímero @2 NK @5 08`
C03	`08`	`X`	`FRE`	`@0 Polymérisation photochimique @5 09`
C03	`08`	`X`	`ENG`	`@0 Photopolymerization @5 09`
C03	`08`	`X`	`SPA`	`@0 Polimerización fotoquímica @5 09`
C03	`09`	`X`	`FRE`	`@0 Microactionneur @4 INC @5 72`
N21				`@1 286`

Format Inist (serveur)

NO :	PASCAL 97-0463232 INIST
ET :	Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique
AU :	BERTSCH (A.); JEZEQUEL (J. Y.); ANDRE (J. C.)
AF :	DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451/54001 Nancy/France (1 aut., 2 aut., 3 aut.)
DT :	Publication en série; Niveau analytique
SO :	Journal of photochemistry and photobiology. A, Chemistry; ISSN 1010-6030; Coden JPPCEJ; Suisse; Da. 1997; Vol. 107; No. 1-3; Pp. 275-281; Bibl. 9 ref.
LA :	Anglais
EA :	In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 μm.
CC :	001D03F17
FD :	Etude expérimentale; Fabrication microélectronique; Microstructure; Structure 3 dimensions; Photolithographie; Prototypage rapide; Acrylate polymère; Polymérisation photochimique; Microactionneur
ED :	Experimental study; Microelectronic fabrication; Microstructure; Three dimensional structure; Photolithography; Rapid prototyping; Acrylate polymer; Photopolymerization
GD :	Experimentelle Untersuchung; Mikrogefuege
SD :	Estudio experimental; Fabricación microeléctrica; Microestructura; Estructura 3 dimensiones; Fotolitografía; Prototipificación rápida; Acrilato polímero; Polimerización fotoquímica
LO :	INIST-15990A.354000067658470410
ID :	97-0463232

Links to Exploration step

Pascal:97-0463232

Le document en format XML

<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique</title>
<author><name sortKey="Bertsch, A" sort="Bertsch, A" uniqKey="Bertsch A" first="A." last="Bertsch">A. Bertsch</name>
<affiliation><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Jezequel, J Y" sort="Jezequel, J Y" uniqKey="Jezequel J" first="J. Y." last="Jezequel">J. Y. Jezequel</name>
<affiliation><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="Andre">J. C. Andre</name>
<affiliation><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">INIST</idno>
<idno type="inist">97-0463232</idno>
<date when="1997">1997</date>
<idno type="stanalyst">PASCAL 97-0463232 INIST</idno>
<idno type="RBID">Pascal:97-0463232</idno>
<idno type="wicri:Area/PascalFrancis/Corpus">000D50</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique</title>
<author><name sortKey="Bertsch, A" sort="Bertsch, A" uniqKey="Bertsch A" first="A." last="Bertsch">A. Bertsch</name>
<affiliation><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Jezequel, J Y" sort="Jezequel, J Y" uniqKey="Jezequel J" first="J. Y." last="Jezequel">J. Y. Jezequel</name>
<affiliation><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="Andre">J. C. Andre</name>
<affiliation><inist:fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
</analytic>
<series><title level="j" type="main">Journal of photochemistry and photobiology. A, Chemistry</title>
<title level="j" type="abbreviated">J. photochem. photobiol., A Chem.</title>
<idno type="ISSN">1010-6030</idno>
<imprint><date when="1997">1997</date>
</imprint>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><title level="j" type="main">Journal of photochemistry and photobiology. A, Chemistry</title>
<title level="j" type="abbreviated">J. photochem. photobiol., A Chem.</title>
<idno type="ISSN">1010-6030</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Acrylate polymer</term>
<term>Experimental study</term>
<term>Microelectronic fabrication</term>
<term>Microstructure</term>
<term>Photolithography</term>
<term>Photopolymerization</term>
<term>Rapid prototyping</term>
<term>Three dimensional structure</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Etude expérimentale</term>
<term>Fabrication microélectronique</term>
<term>Microstructure</term>
<term>Structure 3 dimensions</term>
<term>Photolithographie</term>
<term>Prototypage rapide</term>
<term>Acrylate polymère</term>
<term>Polymérisation photochimique</term>
<term>Microactionneur</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front><div type="abstract" xml:lang="en">In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 μm.</div>
</front>
</TEI>
<inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>1010-6030</s0>
</fA01>
<fA02 i1="01"><s0>JPPCEJ</s0>
</fA02>
<fA03 i2="1"><s0>J. photochem. photobiol., A Chem.</s0>
</fA03>
<fA05><s2>107</s2>
</fA05>
<fA06><s2>1-3</s2>
</fA06>
<fA08 i1="01" i2="1" l="ENG"><s1>Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique</s1>
</fA08>
<fA11 i1="01" i2="1"><s1>BERTSCH (A.)</s1>
</fA11>
<fA11 i1="02" i2="1"><s1>JEZEQUEL (J. Y.)</s1>
</fA11>
<fA11 i1="03" i2="1"><s1>ANDRE (J. C.)</s1>
</fA11>
<fA14 i1="01"><s1>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</fA14>
<fA20><s1>275-281</s1>
</fA20>
<fA21><s1>1997</s1>
</fA21>
<fA23 i1="01"><s0>ENG</s0>
</fA23>
<fA43 i1="01"><s1>INIST</s1>
<s2>15990A</s2>
<s5>354000067658470410</s5>
</fA43>
<fA44><s0>0000</s0>
<s1>© 1997 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45><s0>9 ref.</s0>
</fA45>
<fA47 i1="01" i2="1"><s0>97-0463232</s0>
</fA47>
<fA60><s1>P</s1>
</fA60>
<fA61><s0>A</s0>
</fA61>
<fA64 i1="01" i2="1"><s0>Journal of photochemistry and photobiology. A, Chemistry</s0>
</fA64>
<fA66 i1="01"><s0>CHE</s0>
</fA66>
<fC01 i1="01" l="ENG"><s0>In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 μm.</s0>
</fC01>
<fC02 i1="01" i2="X"><s0>001D03F17</s0>
</fC02>
<fC03 i1="01" i2="X" l="FRE"><s0>Etude expérimentale</s0>
<s5>02</s5>
</fC03>
<fC03 i1="01" i2="X" l="ENG"><s0>Experimental study</s0>
<s5>02</s5>
</fC03>
<fC03 i1="01" i2="X" l="GER"><s0>Experimentelle Untersuchung</s0>
<s5>02</s5>
</fC03>
<fC03 i1="01" i2="X" l="SPA"><s0>Estudio experimental</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="X" l="FRE"><s0>Fabrication microélectronique</s0>
<s5>03</s5>
</fC03>
<fC03 i1="02" i2="X" l="ENG"><s0>Microelectronic fabrication</s0>
<s5>03</s5>
</fC03>
<fC03 i1="02" i2="X" l="SPA"><s0>Fabricación microeléctrica</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="FRE"><s0>Microstructure</s0>
<s5>04</s5>
</fC03>
<fC03 i1="03" i2="X" l="ENG"><s0>Microstructure</s0>
<s5>04</s5>
</fC03>
<fC03 i1="03" i2="X" l="GER"><s0>Mikrogefuege</s0>
<s5>04</s5>
</fC03>
<fC03 i1="03" i2="X" l="SPA"><s0>Microestructura</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="FRE"><s0>Structure 3 dimensions</s0>
<s5>05</s5>
</fC03>
<fC03 i1="04" i2="X" l="ENG"><s0>Three dimensional structure</s0>
<s5>05</s5>
</fC03>
<fC03 i1="04" i2="X" l="SPA"><s0>Estructura 3 dimensiones</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="X" l="FRE"><s0>Photolithographie</s0>
<s5>06</s5>
</fC03>
<fC03 i1="05" i2="X" l="ENG"><s0>Photolithography</s0>
<s5>06</s5>
</fC03>
<fC03 i1="05" i2="X" l="SPA"><s0>Fotolitografía</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="X" l="FRE"><s0>Prototypage rapide</s0>
<s5>07</s5>
</fC03>
<fC03 i1="06" i2="X" l="ENG"><s0>Rapid prototyping</s0>
<s5>07</s5>
</fC03>
<fC03 i1="06" i2="X" l="SPA"><s0>Prototipificación rápida</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="FRE"><s0>Acrylate polymère</s0>
<s2>NK</s2>
<s5>08</s5>
</fC03>
<fC03 i1="07" i2="X" l="ENG"><s0>Acrylate polymer</s0>
<s2>NK</s2>
<s5>08</s5>
</fC03>
<fC03 i1="07" i2="X" l="SPA"><s0>Acrilato polímero</s0>
<s2>NK</s2>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="X" l="FRE"><s0>Polymérisation photochimique</s0>
<s5>09</s5>
</fC03>
<fC03 i1="08" i2="X" l="ENG"><s0>Photopolymerization</s0>
<s5>09</s5>
</fC03>
<fC03 i1="08" i2="X" l="SPA"><s0>Polimerización fotoquímica</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="X" l="FRE"><s0>Microactionneur</s0>
<s4>INC</s4>
<s5>72</s5>
</fC03>
<fN21><s1>286</s1>
</fN21>
</pA>
</standard>
<server><NO>PASCAL 97-0463232 INIST</NO>
<ET>Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique</ET>
<AU>BERTSCH (A.); JEZEQUEL (J. Y.); ANDRE (J. C.)</AU>
<AF>DCPR (GRAPP) URA 328 and GdR 1080 CNRS, ENSIC-INPL B.P. 451/54001 Nancy/France (1 aut., 2 aut., 3 aut.)</AF>
<DT>Publication en série; Niveau analytique</DT>
<SO>Journal of photochemistry and photobiology. A, Chemistry; ISSN 1010-6030; Coden JPPCEJ; Suisse; Da. 1997; Vol. 107; No. 1-3; Pp. 275-281; Bibl. 9 ref.</SO>
<LA>Anglais</LA>
<EA>In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 μm.</EA>
<CC>001D03F17</CC>
<FD>Etude expérimentale; Fabrication microélectronique; Microstructure; Structure 3 dimensions; Photolithographie; Prototypage rapide; Acrylate polymère; Polymérisation photochimique; Microactionneur</FD>
<ED>Experimental study; Microelectronic fabrication; Microstructure; Three dimensional structure; Photolithography; Rapid prototyping; Acrylate polymer; Photopolymerization</ED>
<GD>Experimentelle Untersuchung; Mikrogefuege</GD>
<SD>Estudio experimental; Fabricación microeléctrica; Microestructura; Estructura 3 dimensiones; Fotolitografía; Prototipificación rápida; Acrilato polímero; Polimerización fotoquímica</SD>
<LO>INIST-15990A.354000067658470410</LO>
<ID>97-0463232</ID>
</server>
</inist>
</record>

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{{Explor lien
   |wiki=    Wicri/Lorraine
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   |clé=     Pascal:97-0463232
   |texte=   Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique
}}

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Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique

Study of the spatial resolution of a new 3D microfabrication process : the microstereophotolithography using a dynamic mask-generator technique

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