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Tm3+-related emissions in III-V semiconductors grown by metalorganic vapor phase epitaxy

Identifieur interne : 001A03 ( Pascal/Curation ); précédent : 001A02; suivant : 001A04

Tm3+-related emissions in III-V semiconductors grown by metalorganic vapor phase epitaxy

Auteurs : K. Pressel [Allemagne] ; J. Weber ; C. Hiller ; D. Ottenw Lder ; W. Kürner ; A. Dörnen ; F. Scholz ; K. Locke ; D. Wiedmann ; F. Cordeddu

Source :

RBID : Pascal:92-0499350

Descripteurs français

English descriptors

Abstract

Layers of InP:Tm, GaAs:Tm, GaP:Tm, and GaInP:Tm have been grown by metal-organic vapor phase epitaxy at atmospheric pressure using tris(isopropylcyclopentadienyl)thulium as a liquid Tm source. Electrical measurements revealed no characteristic influence of Tm on the electrical properties of the semiconductor host. Tm3+-related 4f emissions at 1.2 and 1.9 μm are observed both in GaAs and GaInP. In GaAs, the Tm3+ 4f luminescence at 1.2 μm consists of a series of very sharp lines. In GaInP samples, the Tm3+-related luminescence at 1.2 μm is much stronger than in the GaAs samples and is still observable at room temperature
pA  
A01 01  1    @0 0003-6951
A02 01      @0 APPLAB
A03   1    @0 Appl. phys. lett.
A05       @2 61
A06       @2 5
A08 01  1  ENG  @1 Tm3+-related emissions in III-V semiconductors grown by metalorganic vapor phase epitaxy
A11 01  1    @1 PRESSEL (K.)
A11 02  1    @1 WEBER (J.)
A11 03  1    @1 HILLER (C.)
A11 04  1    @1 OTTENWÄLDER (D.)
A11 05  1    @1 KÜRNER (W.)
A11 06  1    @1 DÖRNEN (A.)
A11 07  1    @1 SCHOLZ (F.)
A11 08  1    @1 LOCKE (K.)
A11 09  1    @1 WIEDMANN (D.)
A11 10  1    @1 CORDEDDU (F.)
A14 01      @1 Univ. Stuttgart, IV. Physikalisches Inst. @2 7000 Stuttgart @3 DEU @Z 1 aut., 2 aut., 3 aut., 4 aut., 5 aut., 6 aut., 7 aut.
A20       @1 560-562
A21       @1 1992
A23 01      @0 ENG
A43 01      @1 INIST @2 10020 @5 354000020348260210
A44       @0 0000
A45       @0 11 ref.
A47 01  1    @0 92-0499350
A60       @1 P
A61       @0 A
A64   1    @0 Applied physics letters
A66 01      @0 USA
C01 01    ENG  @0 Layers of InP:Tm, GaAs:Tm, GaP:Tm, and GaInP:Tm have been grown by metal-organic vapor phase epitaxy at atmospheric pressure using tris(isopropylcyclopentadienyl)thulium as a liquid Tm source. Electrical measurements revealed no characteristic influence of Tm on the electrical properties of the semiconductor host. Tm3+-related 4f emissions at 1.2 and 1.9 μm are observed both in GaAs and GaInP. In GaAs, the Tm3+ 4f luminescence at 1.2 μm consists of a series of very sharp lines. In GaInP samples, the Tm3+-related luminescence at 1.2 μm is much stronger than in the GaAs samples and is still observable at room temperature
C02 01  X    @0 001B11H08
C03 01  X  FRE  @0 Etude expérimentale
C03 01  X  ENG  @0 Experimental study
C03 01  X  GER  @0 Experimentelle Untersuchung
C03 01  X  SPA  @0 Estudio experimental
C03 02  X  FRE  @0 Photoluminescence
C03 02  X  ENG  @0 Photoluminescence
C03 02  X  SPA  @0 Fotoluminiscencia
C03 03  X  FRE  @0 Transition optique
C03 03  X  ENG  @0 Optical transition
C03 03  X  GER  @0 Optischer Uebergang
C03 03  X  SPA  @0 Transición óptica
C03 04  X  FRE  @0 Impureté
C03 04  X  ENG  @0 Impurity
C03 04  X  GER  @0 Begleitelement
C03 04  X  SPA  @0 Impureza
C03 05  X  FRE  @0 Semiconducteur
C03 05  X  ENG  @0 Semiconductor materials
C03 05  X  GER  @0 Halbleiter
C03 05  X  SPA  @0 Semiconductor(material)
C03 06  X  FRE  @0 Composé minéral
C03 06  X  ENG  @0 Inorganic compound
C03 06  X  SPA  @0 Compuesto inorgánico
C03 07  X  FRE  @0 Gallium Arséniure @2 NC @2 FX @2 NA
C03 07  X  ENG  @0 Gallium Arsenides @2 NC @2 FX @2 NA
C03 07  X  SPA  @0 Galio Arseniuro @2 NC @2 FX @2 NA
C03 08  X  FRE  @0 Indium Phosphure @2 NC @2 NA
C03 08  X  ENG  @0 Indium Phosphides @2 NC @2 NA
C03 08  X  SPA  @0 Indio Fosfuro @2 NC @2 NA
C03 09  X  FRE  @0 Gallium Phosphure @2 NC @2 FX @2 NA
C03 09  X  ENG  @0 Gallium Phosphides @2 NC @2 FX @2 NA
C03 09  X  SPA  @0 Galio Fosfuro @2 NC @2 FX @2 NA
C03 10  X  FRE  @0 Gallium Indium Phosphure Mixte @2 NC @2 FX @2 NA
C03 10  X  ENG  @0 Gallium Indium Phosphides Mixed @2 NC @2 FX @2 NA
C03 10  X  SPA  @0 Galio Indio Fosfuro Mixto @2 NC @2 FX @2 NA
C03 11  X  FRE  @0 Thulium @2 NC
C03 11  X  ENG  @0 Thulium @2 NC
C03 11  X  GER  @0 Thulium @2 NC
C03 11  X  SPA  @0 Tulio @2 NC
N21       @1 289

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Pascal:92-0499350

Le document en format XML

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<sup>3+</sup>
-related emissions in III-V semiconductors grown by metalorganic vapor phase epitaxy</title>
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<term>Impurity</term>
<term>Indium Phosphides</term>
<term>Inorganic compound</term>
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<term>Thulium</term>
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<term>Gallium Arséniure</term>
<term>Indium Phosphure</term>
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<div type="abstract" xml:lang="en">Layers of InP:Tm, GaAs:Tm, GaP:Tm, and GaInP:Tm have been grown by metal-organic vapor phase epitaxy at atmospheric pressure using tris(isopropylcyclopentadienyl)thulium as a liquid Tm source. Electrical measurements revealed no characteristic influence of Tm on the electrical properties of the semiconductor host. Tm
<sup>3+</sup>
-related 4f emissions at 1.2 and 1.9 μm are observed both in GaAs and GaInP. In GaAs, the Tm
<sup>3+</sup>
4f luminescence at 1.2 μm consists of a series of very sharp lines. In GaInP samples, the Tm
<sup>3+</sup>
-related luminescence at 1.2 μm is much stronger than in the GaAs samples and is still observable at room temperature</div>
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<sup>3+</sup>
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<s0>Layers of InP:Tm, GaAs:Tm, GaP:Tm, and GaInP:Tm have been grown by metal-organic vapor phase epitaxy at atmospheric pressure using tris(isopropylcyclopentadienyl)thulium as a liquid Tm source. Electrical measurements revealed no characteristic influence of Tm on the electrical properties of the semiconductor host. Tm
<sup>3+</sup>
-related 4f emissions at 1.2 and 1.9 μm are observed both in GaAs and GaInP. In GaAs, the Tm
<sup>3+</sup>
4f luminescence at 1.2 μm consists of a series of very sharp lines. In GaInP samples, the Tm
<sup>3+</sup>
-related luminescence at 1.2 μm is much stronger than in the GaAs samples and is still observable at room temperature</s0>
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<fC03 i1="03" i2="X" l="GER">
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</fC03>
<fC03 i1="03" i2="X" l="SPA">
<s0>Transición óptica</s0>
</fC03>
<fC03 i1="04" i2="X" l="FRE">
<s0>Impureté</s0>
</fC03>
<fC03 i1="04" i2="X" l="ENG">
<s0>Impurity</s0>
</fC03>
<fC03 i1="04" i2="X" l="GER">
<s0>Begleitelement</s0>
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<fC03 i1="04" i2="X" l="SPA">
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<s0>Compuesto inorgánico</s0>
</fC03>
<fC03 i1="07" i2="X" l="FRE">
<s0>Gallium Arséniure</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="07" i2="X" l="ENG">
<s0>Gallium Arsenides</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="07" i2="X" l="SPA">
<s0>Galio Arseniuro</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="08" i2="X" l="FRE">
<s0>Indium Phosphure</s0>
<s2>NC</s2>
<s2>NA</s2>
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<fC03 i1="08" i2="X" l="ENG">
<s0>Indium Phosphides</s0>
<s2>NC</s2>
<s2>NA</s2>
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<fC03 i1="08" i2="X" l="SPA">
<s0>Indio Fosfuro</s0>
<s2>NC</s2>
<s2>NA</s2>
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<fC03 i1="09" i2="X" l="FRE">
<s0>Gallium Phosphure</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
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<s0>Gallium Phosphides</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
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<s0>Galio Fosfuro</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="10" i2="X" l="FRE">
<s0>Gallium Indium Phosphure Mixte</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="10" i2="X" l="ENG">
<s0>Gallium Indium Phosphides Mixed</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
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<fC03 i1="10" i2="X" l="SPA">
<s0>Galio Indio Fosfuro Mixto</s0>
<s2>NC</s2>
<s2>FX</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="11" i2="X" l="FRE">
<s0>Thulium</s0>
<s2>NC</s2>
</fC03>
<fC03 i1="11" i2="X" l="ENG">
<s0>Thulium</s0>
<s2>NC</s2>
</fC03>
<fC03 i1="11" i2="X" l="GER">
<s0>Thulium</s0>
<s2>NC</s2>
</fC03>
<fC03 i1="11" i2="X" l="SPA">
<s0>Tulio</s0>
<s2>NC</s2>
</fC03>
<fN21>
<s1>289</s1>
</fN21>
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   |flux=    Pascal
   |étape=   Curation
   |type=    RBID
   |clé=     Pascal:92-0499350
   |texte=   Tm3+-related emissions in III-V semiconductors grown by metalorganic vapor phase epitaxy
}}

Wicri

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