Lasing characteristics of a CW Tm, Ho:YLF double cavity microchip laser
Identifieur interne : 000A55 ( Pascal/Corpus ); précédent : 000A54; suivant : 000A56Lasing characteristics of a CW Tm, Ho:YLF double cavity microchip laser
Auteurs : C. Nagasawa ; D. Sakaizawa ; H. Hara ; K. MizutaniSource :
- Optics communications [ 0030-4018 ] ; 2004.
Descripteurs français
- Pascal (Inist)
- Cavité laser, Laser continu, Matériau dopé, Addition thulium, Addition holmium, Matériau laser, Laser solide, Dispositif expérimental, Yttrium Lithium Fluorure, Composé ternaire, Etude expérimentale, Pompage par diode, Puissance sortie, Yttrium fluorure, Lithium fluorure, Puissance pompage, LiYF4:Ho:Tm, YLF:Ho:Tm, F Li Y, 4260D, 4255R.
English descriptors
- KwdEn :
Abstract
The lasing characteristics of a cw Tm,Ho:YLF microchip laser in a double cavity configuration are reported. The oscillation wavelength decreased continuously and periodic mode hopping occurred as the absorbed pump power increased. Furthermore, the output power could be changed by varying the thickness of the air gap distance at constant absorbed pump power.
Notice en format standard (ISO 2709)
Pour connaître la documentation sur le format Inist Standard.
pA |
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Format Inist (serveur)
NO : | PASCAL 04-0233908 INIST |
---|---|
ET : | Lasing characteristics of a CW Tm, Ho:YLF double cavity microchip laser |
AU : | NAGASAWA (C.); SAKAIZAWA (D.); HARA (H.); MIZUTANI (K.) |
AF : | Department of Electrical Engineering, Tokyo Metropolitan University 1-1, Minamiosawa/Hachioji, Tokyo 192-0397/Japon (1 aut., 2 aut.); Leadintex Inc. 1-3, Nihonbashi-odennma/chuo, Tokyo 103-0011/Japon (3 aut.); Communication Research Laboratory 4-2-1, Nukui-kita/Koganei, Tokyo 184-8795/Japon (4 aut.) |
DT : | Publication en série; Niveau analytique |
SO : | Optics communications; ISSN 0030-4018; Coden OPCOB8; Pays-Bas; Da. 2004; Vol. 234; No. 1-6; Pp. 301-304; Bibl. 6 ref. |
LA : | Anglais |
EA : | The lasing characteristics of a cw Tm,Ho:YLF microchip laser in a double cavity configuration are reported. The oscillation wavelength decreased continuously and periodic mode hopping occurred as the absorbed pump power increased. Furthermore, the output power could be changed by varying the thickness of the air gap distance at constant absorbed pump power. |
CC : | 001B40B60D; 001B40B55R |
FD : | Cavité laser; Laser continu; Matériau dopé; Addition thulium; Addition holmium; Matériau laser; Laser solide; Dispositif expérimental; Yttrium Lithium Fluorure; Composé ternaire; Etude expérimentale; Pompage par diode; Puissance sortie; Yttrium fluorure; Lithium fluorure; Puissance pompage; LiYF4:Ho:Tm; YLF:Ho:Tm; F Li Y; 4260D; 4255R |
ED : | Laser cavities; CW lasers; Doped materials; Thulium additions; Holmium additions; Laser materials; Solid state lasers; Experimental device; Yttrium Lithium Fluorides; Ternary compounds; Experimental study; Diode pumping; Output power; Yttrium fluorides; Lithium fluorides |
SD : | Dispositivo experimental; Bombeo por diodo; Potencia salida |
LO : | INIST-14750.354000117018520360 |
ID : | 04-0233908 |
Links to Exploration step
Pascal:04-0233908Le document en format XML
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<author><name sortKey="Hara, H" sort="Hara, H" uniqKey="Hara H" first="H." last="Hara">H. Hara</name>
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<author><name sortKey="Mizutani, K" sort="Mizutani, K" uniqKey="Mizutani K" first="K." last="Mizutani">K. Mizutani</name>
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<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Lasing characteristics of a CW Tm, Ho:YLF double cavity microchip laser</title>
<author><name sortKey="Nagasawa, C" sort="Nagasawa, C" uniqKey="Nagasawa C" first="C." last="Nagasawa">C. Nagasawa</name>
<affiliation><inist:fA14 i1="01"><s1>Department of Electrical Engineering, Tokyo Metropolitan University 1-1, Minamiosawa</s1>
<s2>Hachioji, Tokyo 192-0397</s2>
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<sZ>2 aut.</sZ>
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<author><name sortKey="Sakaizawa, D" sort="Sakaizawa, D" uniqKey="Sakaizawa D" first="D." last="Sakaizawa">D. Sakaizawa</name>
<affiliation><inist:fA14 i1="01"><s1>Department of Electrical Engineering, Tokyo Metropolitan University 1-1, Minamiosawa</s1>
<s2>Hachioji, Tokyo 192-0397</s2>
<s3>JPN</s3>
<sZ>1 aut.</sZ>
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<author><name sortKey="Hara, H" sort="Hara, H" uniqKey="Hara H" first="H." last="Hara">H. Hara</name>
<affiliation><inist:fA14 i1="02"><s1>Leadintex Inc. 1-3, Nihonbashi-odennma</s1>
<s2>chuo, Tokyo 103-0011</s2>
<s3>JPN</s3>
<sZ>3 aut.</sZ>
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</affiliation>
</author>
<author><name sortKey="Mizutani, K" sort="Mizutani, K" uniqKey="Mizutani K" first="K." last="Mizutani">K. Mizutani</name>
<affiliation><inist:fA14 i1="03"><s1>Communication Research Laboratory 4-2-1, Nukui-kita</s1>
<s2>Koganei, Tokyo 184-8795</s2>
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<sZ>4 aut.</sZ>
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<series><title level="j" type="main">Optics communications</title>
<title level="j" type="abbreviated">Opt. commun.</title>
<idno type="ISSN">0030-4018</idno>
<imprint><date when="2004">2004</date>
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<seriesStmt><title level="j" type="main">Optics communications</title>
<title level="j" type="abbreviated">Opt. commun.</title>
<idno type="ISSN">0030-4018</idno>
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>CW lasers</term>
<term>Diode pumping</term>
<term>Doped materials</term>
<term>Experimental device</term>
<term>Experimental study</term>
<term>Holmium additions</term>
<term>Laser cavities</term>
<term>Laser materials</term>
<term>Lithium fluorides</term>
<term>Output power</term>
<term>Solid state lasers</term>
<term>Ternary compounds</term>
<term>Thulium additions</term>
<term>Yttrium Lithium Fluorides</term>
<term>Yttrium fluorides</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Cavité laser</term>
<term>Laser continu</term>
<term>Matériau dopé</term>
<term>Addition thulium</term>
<term>Addition holmium</term>
<term>Matériau laser</term>
<term>Laser solide</term>
<term>Dispositif expérimental</term>
<term>Yttrium Lithium Fluorure</term>
<term>Composé ternaire</term>
<term>Etude expérimentale</term>
<term>Pompage par diode</term>
<term>Puissance sortie</term>
<term>Yttrium fluorure</term>
<term>Lithium fluorure</term>
<term>Puissance pompage</term>
<term>LiYF4:Ho:Tm</term>
<term>YLF:Ho:Tm</term>
<term>F Li Y</term>
<term>4260D</term>
<term>4255R</term>
</keywords>
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<front><div type="abstract" xml:lang="en">The lasing characteristics of a cw Tm,Ho:YLF microchip laser in a double cavity configuration are reported. The oscillation wavelength decreased continuously and periodic mode hopping occurred as the absorbed pump power increased. Furthermore, the output power could be changed by varying the thickness of the air gap distance at constant absorbed pump power.</div>
</front>
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<fA05><s2>234</s2>
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<fA06><s2>1-6</s2>
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<fA08 i1="01" i2="1" l="ENG"><s1>Lasing characteristics of a CW Tm, Ho:YLF double cavity microchip laser</s1>
</fA08>
<fA11 i1="01" i2="1"><s1>NAGASAWA (C.)</s1>
</fA11>
<fA11 i1="02" i2="1"><s1>SAKAIZAWA (D.)</s1>
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<fA11 i1="03" i2="1"><s1>HARA (H.)</s1>
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<fA11 i1="04" i2="1"><s1>MIZUTANI (K.)</s1>
</fA11>
<fA14 i1="01"><s1>Department of Electrical Engineering, Tokyo Metropolitan University 1-1, Minamiosawa</s1>
<s2>Hachioji, Tokyo 192-0397</s2>
<s3>JPN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
</fA14>
<fA14 i1="02"><s1>Leadintex Inc. 1-3, Nihonbashi-odennma</s1>
<s2>chuo, Tokyo 103-0011</s2>
<s3>JPN</s3>
<sZ>3 aut.</sZ>
</fA14>
<fA14 i1="03"><s1>Communication Research Laboratory 4-2-1, Nukui-kita</s1>
<s2>Koganei, Tokyo 184-8795</s2>
<s3>JPN</s3>
<sZ>4 aut.</sZ>
</fA14>
<fA20><s1>301-304</s1>
</fA20>
<fA21><s1>2004</s1>
</fA21>
<fA23 i1="01"><s0>ENG</s0>
</fA23>
<fA43 i1="01"><s1>INIST</s1>
<s2>14750</s2>
<s5>354000117018520360</s5>
</fA43>
<fA44><s0>0000</s0>
<s1>© 2004 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45><s0>6 ref.</s0>
</fA45>
<fA47 i1="01" i2="1"><s0>04-0233908</s0>
</fA47>
<fA60><s1>P</s1>
</fA60>
<fA61><s0>A</s0>
</fA61>
<fA64 i1="01" i2="1"><s0>Optics communications</s0>
</fA64>
<fA66 i1="01"><s0>NLD</s0>
</fA66>
<fC01 i1="01" l="ENG"><s0>The lasing characteristics of a cw Tm,Ho:YLF microchip laser in a double cavity configuration are reported. The oscillation wavelength decreased continuously and periodic mode hopping occurred as the absorbed pump power increased. Furthermore, the output power could be changed by varying the thickness of the air gap distance at constant absorbed pump power.</s0>
</fC01>
<fC02 i1="01" i2="3"><s0>001B40B60D</s0>
</fC02>
<fC02 i1="02" i2="3"><s0>001B40B55R</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE"><s0>Cavité laser</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG"><s0>Laser cavities</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE"><s0>Laser continu</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG"><s0>CW lasers</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE"><s0>Matériau dopé</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG"><s0>Doped materials</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE"><s0>Addition thulium</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG"><s0>Thulium additions</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Addition holmium</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Holmium additions</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE"><s0>Matériau laser</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Laser materials</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE"><s0>Laser solide</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="3" l="ENG"><s0>Solid state lasers</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="X" l="FRE"><s0>Dispositif expérimental</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="X" l="ENG"><s0>Experimental device</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="X" l="SPA"><s0>Dispositivo experimental</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>Yttrium Lithium Fluorure</s0>
<s2>NC</s2>
<s2>NA</s2>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="3" l="ENG"><s0>Yttrium Lithium Fluorides</s0>
<s2>NC</s2>
<s2>NA</s2>
<s5>09</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE"><s0>Composé ternaire</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG"><s0>Ternary compounds</s0>
<s5>10</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE"><s0>Etude expérimentale</s0>
<s5>11</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG"><s0>Experimental study</s0>
<s5>11</s5>
</fC03>
<fC03 i1="12" i2="X" l="FRE"><s0>Pompage par diode</s0>
<s5>29</s5>
</fC03>
<fC03 i1="12" i2="X" l="ENG"><s0>Diode pumping</s0>
<s5>29</s5>
</fC03>
<fC03 i1="12" i2="X" l="SPA"><s0>Bombeo por diodo</s0>
<s5>29</s5>
</fC03>
<fC03 i1="13" i2="X" l="FRE"><s0>Puissance sortie</s0>
<s5>42</s5>
</fC03>
<fC03 i1="13" i2="X" l="ENG"><s0>Output power</s0>
<s5>42</s5>
</fC03>
<fC03 i1="13" i2="X" l="SPA"><s0>Potencia salida</s0>
<s5>42</s5>
</fC03>
<fC03 i1="14" i2="3" l="FRE"><s0>Yttrium fluorure</s0>
<s2>NK</s2>
<s5>55</s5>
</fC03>
<fC03 i1="14" i2="3" l="ENG"><s0>Yttrium fluorides</s0>
<s2>NK</s2>
<s5>55</s5>
</fC03>
<fC03 i1="15" i2="3" l="FRE"><s0>Lithium fluorure</s0>
<s2>NK</s2>
<s5>56</s5>
</fC03>
<fC03 i1="15" i2="3" l="ENG"><s0>Lithium fluorides</s0>
<s2>NK</s2>
<s5>56</s5>
</fC03>
<fC03 i1="16" i2="3" l="FRE"><s0>Puissance pompage</s0>
<s4>INC</s4>
<s5>71</s5>
</fC03>
<fC03 i1="17" i2="3" l="FRE"><s0>LiYF4:Ho:Tm</s0>
<s4>INC</s4>
<s5>75</s5>
</fC03>
<fC03 i1="18" i2="3" l="FRE"><s0>YLF:Ho:Tm</s0>
<s4>INC</s4>
<s5>76</s5>
</fC03>
<fC03 i1="19" i2="3" l="FRE"><s0>F Li Y</s0>
<s4>INC</s4>
<s5>77</s5>
</fC03>
<fC03 i1="20" i2="3" l="FRE"><s0>4260D</s0>
<s4>INC</s4>
<s5>91</s5>
</fC03>
<fC03 i1="21" i2="3" l="FRE"><s0>4255R</s0>
<s2>PAC</s2>
<s4>INC</s4>
<s5>92</s5>
</fC03>
<fN21><s1>152</s1>
</fN21>
<fN82><s1>PSI</s1>
</fN82>
</pA>
</standard>
<server><NO>PASCAL 04-0233908 INIST</NO>
<ET>Lasing characteristics of a CW Tm, Ho:YLF double cavity microchip laser</ET>
<AU>NAGASAWA (C.); SAKAIZAWA (D.); HARA (H.); MIZUTANI (K.)</AU>
<AF>Department of Electrical Engineering, Tokyo Metropolitan University 1-1, Minamiosawa/Hachioji, Tokyo 192-0397/Japon (1 aut., 2 aut.); Leadintex Inc. 1-3, Nihonbashi-odennma/chuo, Tokyo 103-0011/Japon (3 aut.); Communication Research Laboratory 4-2-1, Nukui-kita/Koganei, Tokyo 184-8795/Japon (4 aut.)</AF>
<DT>Publication en série; Niveau analytique</DT>
<SO>Optics communications; ISSN 0030-4018; Coden OPCOB8; Pays-Bas; Da. 2004; Vol. 234; No. 1-6; Pp. 301-304; Bibl. 6 ref.</SO>
<LA>Anglais</LA>
<EA>The lasing characteristics of a cw Tm,Ho:YLF microchip laser in a double cavity configuration are reported. The oscillation wavelength decreased continuously and periodic mode hopping occurred as the absorbed pump power increased. Furthermore, the output power could be changed by varying the thickness of the air gap distance at constant absorbed pump power.</EA>
<CC>001B40B60D; 001B40B55R</CC>
<FD>Cavité laser; Laser continu; Matériau dopé; Addition thulium; Addition holmium; Matériau laser; Laser solide; Dispositif expérimental; Yttrium Lithium Fluorure; Composé ternaire; Etude expérimentale; Pompage par diode; Puissance sortie; Yttrium fluorure; Lithium fluorure; Puissance pompage; LiYF4:Ho:Tm; YLF:Ho:Tm; F Li Y; 4260D; 4255R</FD>
<ED>Laser cavities; CW lasers; Doped materials; Thulium additions; Holmium additions; Laser materials; Solid state lasers; Experimental device; Yttrium Lithium Fluorides; Ternary compounds; Experimental study; Diode pumping; Output power; Yttrium fluorides; Lithium fluorides</ED>
<SD>Dispositivo experimental; Bombeo por diodo; Potencia salida</SD>
<LO>INIST-14750.354000117018520360</LO>
<ID>04-0233908</ID>
</server>
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