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Thulium induced reconstructions of the Si(001 ) surface

Identifieur interne : 000180 ( Pascal/Corpus ); précédent : 000179; suivant : 000181

Thulium induced reconstructions of the Si(001 ) surface

Auteurs : Y. Cui ; J. Nogami

Source :

RBID : Pascal:12-0051710

Descripteurs français

English descriptors

Abstract

The initial stages of epitaxial growth of Tm on Si(001) are studied by using scanning tunneling microscopy. Tm induces two kinds of surface reconstructions: 2 × 4 and a striped pseudo 2 × 7 phase. The morphology of the 2 x 4 is similar to the 2 x 4 phase induced by other rare earth metals. The pseudo 2 × 7 phase has some common structural elements with the conventional 2 × 7 phase but shows a broad width distribution. Growth of silicide islands and nanowires is seen at higher metal coverages after post deposition annealing. Differences in behavior with respect to other rare earth metals can be attributed to differences in the stable bulk silicides in this system.

Notice en format standard (ISO 2709)

Pour connaître la documentation sur le format Inist Standard.

pA  
A01 01  1    @0 0039-6028
A02 01      @0 SUSCAS
A03   1    @0 Surf. sci.
A05       @2 605
A06       @2 23-24
A08 01  1  ENG  @1 Thulium induced reconstructions of the Si(001 ) surface
A11 01  1    @1 CUI (Y.)
A11 02  1    @1 NOGAMI (J.)
A14 01      @1 Department of Materials Science and Engineering, University of Toronto @2 Toronto @3 CAN @Z 1 aut. @Z 2 aut.
A20       @1 2038-2044
A21       @1 2011
A23 01      @0 ENG
A43 01      @1 INIST @2 12426 @5 354000505506730170
A44       @0 0000 @1 © 2012 INIST-CNRS. All rights reserved.
A45       @0 21 ref.
A47 01  1    @0 12-0051710
A60       @1 P
A61       @0 A
A64 01  1    @0 Surface science
A66 01      @0 GBR
C01 01    ENG  @0 The initial stages of epitaxial growth of Tm on Si(001) are studied by using scanning tunneling microscopy. Tm induces two kinds of surface reconstructions: 2 × 4 and a striped pseudo 2 × 7 phase. The morphology of the 2 x 4 is similar to the 2 x 4 phase induced by other rare earth metals. The pseudo 2 × 7 phase has some common structural elements with the conventional 2 × 7 phase but shows a broad width distribution. Growth of silicide islands and nanowires is seen at higher metal coverages after post deposition annealing. Differences in behavior with respect to other rare earth metals can be attributed to differences in the stable bulk silicides in this system.
C02 01  3    @0 001B60
C02 02  3    @0 001B70
C02 03  3    @0 001B80
C03 01  3  FRE  @0 Actinide @2 NC @5 01
C03 01  3  ENG  @0 Actinides @2 NC @5 01
C03 02  3  FRE  @0 Thulium @2 NC @5 02
C03 02  3  ENG  @0 Thulium @2 NC @5 02
C03 03  3  FRE  @0 Silicium @2 NC @5 03
C03 03  3  ENG  @0 Silicon @2 NC @5 03
C03 04  3  FRE  @0 Microscopie tunnel balayage @5 04
C03 04  3  ENG  @0 Scanning tunneling microscopy @5 04
C03 05  3  FRE  @0 Reconstruction surface @5 05
C03 05  3  ENG  @0 Surface reconstruction @5 05
C03 06  3  FRE  @0 Structure surface @5 06
C03 06  3  ENG  @0 Surface structure @5 06
C03 07  3  FRE  @0 Lanthanide @2 NC @5 07
C03 07  3  ENG  @0 Rare earths @2 NC @5 07
C03 08  3  FRE  @0 Tm @4 INC @5 32
C03 09  3  FRE  @0 Si @4 INC @5 33
N21       @1 030
N44 01      @1 OTO
N82       @1 OTO

Format Inist (serveur)

NO : PASCAL 12-0051710 INIST
ET : Thulium induced reconstructions of the Si(001 ) surface
AU : CUI (Y.); NOGAMI (J.)
AF : Department of Materials Science and Engineering, University of Toronto/Toronto/Canada (1 aut., 2 aut.)
DT : Publication en série; Niveau analytique
SO : Surface science; ISSN 0039-6028; Coden SUSCAS; Royaume-Uni; Da. 2011; Vol. 605; No. 23-24; Pp. 2038-2044; Bibl. 21 ref.
LA : Anglais
EA : The initial stages of epitaxial growth of Tm on Si(001) are studied by using scanning tunneling microscopy. Tm induces two kinds of surface reconstructions: 2 × 4 and a striped pseudo 2 × 7 phase. The morphology of the 2 x 4 is similar to the 2 x 4 phase induced by other rare earth metals. The pseudo 2 × 7 phase has some common structural elements with the conventional 2 × 7 phase but shows a broad width distribution. Growth of silicide islands and nanowires is seen at higher metal coverages after post deposition annealing. Differences in behavior with respect to other rare earth metals can be attributed to differences in the stable bulk silicides in this system.
CC : 001B60; 001B70; 001B80
FD : Actinide; Thulium; Silicium; Microscopie tunnel balayage; Reconstruction surface; Structure surface; Lanthanide; Tm; Si
ED : Actinides; Thulium; Silicon; Scanning tunneling microscopy; Surface reconstruction; Surface structure; Rare earths
LO : INIST-12426.354000505506730170
ID : 12-0051710

Links to Exploration step

Pascal:12-0051710

Le document en format XML

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<div type="abstract" xml:lang="en">The initial stages of epitaxial growth of Tm on Si(001) are studied by using scanning tunneling microscopy. Tm induces two kinds of surface reconstructions: 2 × 4 and a striped pseudo 2 × 7 phase. The morphology of the 2 x 4 is similar to the 2 x 4 phase induced by other rare earth metals. The pseudo 2 × 7 phase has some common structural elements with the conventional 2 × 7 phase but shows a broad width distribution. Growth of silicide islands and nanowires is seen at higher metal coverages after post deposition annealing. Differences in behavior with respect to other rare earth metals can be attributed to differences in the stable bulk silicides in this system.</div>
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<EA>The initial stages of epitaxial growth of Tm on Si(001) are studied by using scanning tunneling microscopy. Tm induces two kinds of surface reconstructions: 2 × 4 and a striped pseudo 2 × 7 phase. The morphology of the 2 x 4 is similar to the 2 x 4 phase induced by other rare earth metals. The pseudo 2 × 7 phase has some common structural elements with the conventional 2 × 7 phase but shows a broad width distribution. Growth of silicide islands and nanowires is seen at higher metal coverages after post deposition annealing. Differences in behavior with respect to other rare earth metals can be attributed to differences in the stable bulk silicides in this system.</EA>
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