Designing a Variable EWMA Controller for Process Disturbance Subject to Linear Drift and Step Changes
Identifieur interne : 000114 ( Pascal/Corpus ); précédent : 000113; suivant : 000115Designing a Variable EWMA Controller for Process Disturbance Subject to Linear Drift and Step Changes
Auteurs : Bo-Yan Jou ; Ya-Ting Chan ; Sheng-Tsaing TsengSource :
- IEEE transactions on semiconductor manufacturing [ 0894-6507 ] ; 2012.
Descripteurs français
- Pascal (Inist)
English descriptors
- KwdEn :
Abstract
Linear drift and step changes are two commonly encountered disturbances in many semiconductor manufacturing processes. The former may be typically caused by the aging of equipment or tool wearing, while the latter may be caused by using different batches of raw material, preventive maintenance, and sudden changes in manufacturing environment, which are prevalent in the integrated circuit industries. However, most of the existent literature on run-to-run controls has only dealt with processes with linear drift or step changes. Until now, there has been no efficient run-to-run controller to simultaneously adjust the process with these disturbances. In this paper, we first derive the stability conditions and optimal sequence of variable discount factors of the modified variable exponentially weighted moving average controller analytically. Next, we demonstrate that the proposed method is capable of reducing total mean square error (TMSE) of the process output efficiently when both types of process disturbances are present. Finally, a comprehensive comparison is presented to address the process performance of the proposed method compared to the conventional method. The results demonstrate that the proposed method is quite robust in that it is able to reduce the process TMSE even when the process parameters are not accurately estimated.
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Pour connaître la documentation sur le format Inist Standard.
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Format Inist (serveur)
NO : | PASCAL 13-0024171 INIST |
---|---|
ET : | Designing a Variable EWMA Controller for Process Disturbance Subject to Linear Drift and Step Changes |
AU : | JOU (Bo-Yan); CHAN (Ya-Ting); TSENG (Sheng-Tsaing) |
AF : | Taiwan Semiconductor Manufacturing Company/Hsinchu 300/Taïwan (1 aut.); National Tsing Hua University/Hsinchu 300/Taïwan (2 aut., 3 aut.) |
DT : | Publication en série; Niveau analytique |
SO : | IEEE transactions on semiconductor manufacturing; ISSN 0894-6507; Etats-Unis; Da. 2012; Vol. 25; No. 4; Pp. 614-622; Bibl. 20 ref. |
LA : | Anglais |
EA : | Linear drift and step changes are two commonly encountered disturbances in many semiconductor manufacturing processes. The former may be typically caused by the aging of equipment or tool wearing, while the latter may be caused by using different batches of raw material, preventive maintenance, and sudden changes in manufacturing environment, which are prevalent in the integrated circuit industries. However, most of the existent literature on run-to-run controls has only dealt with processes with linear drift or step changes. Until now, there has been no efficient run-to-run controller to simultaneously adjust the process with these disturbances. In this paper, we first derive the stability conditions and optimal sequence of variable discount factors of the modified variable exponentially weighted moving average controller analytically. Next, we demonstrate that the proposed method is capable of reducing total mean square error (TMSE) of the process output efficiently when both types of process disturbances are present. Finally, a comprehensive comparison is presented to address the process performance of the proposed method compared to the conventional method. The results demonstrate that the proposed method is quite robust in that it is able to reduce the process TMSE even when the process parameters are not accurately estimated. |
CC : | 001D03F17; 001D03F06A |
FD : | Système commande; Fabrication microélectronique; Procédé fabrication; Vieillissement; Matière première; Circuit intégré; Critère stabilité; Moyenne pondérée; Erreur quadratique moyenne; Etude comparative; Evaluation performance; Séléniure de thulium; TmSe |
ED : | Control system; Microelectronic fabrication; Manufacturing process; Ageing; Raw materials; Integrated circuit; Stability criterion; Weighted average; Mean square error; Comparative study; Performance evaluation; Thulium selenides |
SD : | Sistema control; Fabricación microeléctrica; Procedimiento fabricación; Envejecimiento; Materia prima; Circuito integrado; Criterio estabilidad; Promedio pondero; Error medio cuadrático; Estudio comparativo; Evaluación prestación |
LO : | INIST-21454.354000502947360090 |
ID : | 13-0024171 |
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Pascal:13-0024171Le document en format XML
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<front><div type="abstract" xml:lang="en">Linear drift and step changes are two commonly encountered disturbances in many semiconductor manufacturing processes. The former may be typically caused by the aging of equipment or tool wearing, while the latter may be caused by using different batches of raw material, preventive maintenance, and sudden changes in manufacturing environment, which are prevalent in the integrated circuit industries. However, most of the existent literature on run-to-run controls has only dealt with processes with linear drift or step changes. Until now, there has been no efficient run-to-run controller to simultaneously adjust the process with these disturbances. In this paper, we first derive the stability conditions and optimal sequence of variable discount factors of the modified variable exponentially weighted moving average controller analytically. Next, we demonstrate that the proposed method is capable of reducing total mean square error (TMSE) of the process output efficiently when both types of process disturbances are present. Finally, a comprehensive comparison is presented to address the process performance of the proposed method compared to the conventional method. The results demonstrate that the proposed method is quite robust in that it is able to reduce the process TMSE even when the process parameters are not accurately estimated.</div>
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<server><NO>PASCAL 13-0024171 INIST</NO>
<ET>Designing a Variable EWMA Controller for Process Disturbance Subject to Linear Drift and Step Changes</ET>
<AU>JOU (Bo-Yan); CHAN (Ya-Ting); TSENG (Sheng-Tsaing)</AU>
<AF>Taiwan Semiconductor Manufacturing Company/Hsinchu 300/Taïwan (1 aut.); National Tsing Hua University/Hsinchu 300/Taïwan (2 aut., 3 aut.)</AF>
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<EA>Linear drift and step changes are two commonly encountered disturbances in many semiconductor manufacturing processes. The former may be typically caused by the aging of equipment or tool wearing, while the latter may be caused by using different batches of raw material, preventive maintenance, and sudden changes in manufacturing environment, which are prevalent in the integrated circuit industries. However, most of the existent literature on run-to-run controls has only dealt with processes with linear drift or step changes. Until now, there has been no efficient run-to-run controller to simultaneously adjust the process with these disturbances. In this paper, we first derive the stability conditions and optimal sequence of variable discount factors of the modified variable exponentially weighted moving average controller analytically. Next, we demonstrate that the proposed method is capable of reducing total mean square error (TMSE) of the process output efficiently when both types of process disturbances are present. Finally, a comprehensive comparison is presented to address the process performance of the proposed method compared to the conventional method. The results demonstrate that the proposed method is quite robust in that it is able to reduce the process TMSE even when the process parameters are not accurately estimated.</EA>
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