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Designing a Variable EWMA Controller for Process Disturbance Subject to Linear Drift and Step Changes

Identifieur interne : 000114 ( Pascal/Corpus ); précédent : 000113; suivant : 000115

Designing a Variable EWMA Controller for Process Disturbance Subject to Linear Drift and Step Changes

Auteurs : Bo-Yan Jou ; Ya-Ting Chan ; Sheng-Tsaing Tseng

Source :

RBID : Pascal:13-0024171

Descripteurs français

English descriptors

Abstract

Linear drift and step changes are two commonly encountered disturbances in many semiconductor manufacturing processes. The former may be typically caused by the aging of equipment or tool wearing, while the latter may be caused by using different batches of raw material, preventive maintenance, and sudden changes in manufacturing environment, which are prevalent in the integrated circuit industries. However, most of the existent literature on run-to-run controls has only dealt with processes with linear drift or step changes. Until now, there has been no efficient run-to-run controller to simultaneously adjust the process with these disturbances. In this paper, we first derive the stability conditions and optimal sequence of variable discount factors of the modified variable exponentially weighted moving average controller analytically. Next, we demonstrate that the proposed method is capable of reducing total mean square error (TMSE) of the process output efficiently when both types of process disturbances are present. Finally, a comprehensive comparison is presented to address the process performance of the proposed method compared to the conventional method. The results demonstrate that the proposed method is quite robust in that it is able to reduce the process TMSE even when the process parameters are not accurately estimated.

Notice en format standard (ISO 2709)

Pour connaître la documentation sur le format Inist Standard.

pA  
A01 01  1    @0 0894-6507
A03   1    @0 IEEE trans. semicond. manuf.
A05       @2 25
A06       @2 4
A08 01  1  ENG  @1 Designing a Variable EWMA Controller for Process Disturbance Subject to Linear Drift and Step Changes
A11 01  1    @1 JOU (Bo-Yan)
A11 02  1    @1 CHAN (Ya-Ting)
A11 03  1    @1 TSENG (Sheng-Tsaing)
A14 01      @1 Taiwan Semiconductor Manufacturing Company @2 Hsinchu 300 @3 TWN @Z 1 aut.
A14 02      @1 National Tsing Hua University @2 Hsinchu 300 @3 TWN @Z 2 aut. @Z 3 aut.
A20       @1 614-622
A21       @1 2012
A23 01      @0 ENG
A43 01      @1 INIST @2 21454 @5 354000502947360090
A44       @0 0000 @1 © 2013 INIST-CNRS. All rights reserved.
A45       @0 20 ref.
A47 01  1    @0 13-0024171
A60       @1 P
A61       @0 A
A64 01  1    @0 IEEE transactions on semiconductor manufacturing
A66 01      @0 USA
C01 01    ENG  @0 Linear drift and step changes are two commonly encountered disturbances in many semiconductor manufacturing processes. The former may be typically caused by the aging of equipment or tool wearing, while the latter may be caused by using different batches of raw material, preventive maintenance, and sudden changes in manufacturing environment, which are prevalent in the integrated circuit industries. However, most of the existent literature on run-to-run controls has only dealt with processes with linear drift or step changes. Until now, there has been no efficient run-to-run controller to simultaneously adjust the process with these disturbances. In this paper, we first derive the stability conditions and optimal sequence of variable discount factors of the modified variable exponentially weighted moving average controller analytically. Next, we demonstrate that the proposed method is capable of reducing total mean square error (TMSE) of the process output efficiently when both types of process disturbances are present. Finally, a comprehensive comparison is presented to address the process performance of the proposed method compared to the conventional method. The results demonstrate that the proposed method is quite robust in that it is able to reduce the process TMSE even when the process parameters are not accurately estimated.
C02 01  X    @0 001D03F17
C02 02  X    @0 001D03F06A
C03 01  X  FRE  @0 Système commande @5 01
C03 01  X  ENG  @0 Control system @5 01
C03 01  X  SPA  @0 Sistema control @5 01
C03 02  X  FRE  @0 Fabrication microélectronique @5 02
C03 02  X  ENG  @0 Microelectronic fabrication @5 02
C03 02  X  SPA  @0 Fabricación microeléctrica @5 02
C03 03  X  FRE  @0 Procédé fabrication @5 03
C03 03  X  ENG  @0 Manufacturing process @5 03
C03 03  X  SPA  @0 Procedimiento fabricación @5 03
C03 04  X  FRE  @0 Vieillissement @5 04
C03 04  X  ENG  @0 Ageing @5 04
C03 04  X  SPA  @0 Envejecimiento @5 04
C03 05  X  FRE  @0 Matière première @5 05
C03 05  X  ENG  @0 Raw materials @5 05
C03 05  X  SPA  @0 Materia prima @5 05
C03 06  X  FRE  @0 Circuit intégré @5 06
C03 06  X  ENG  @0 Integrated circuit @5 06
C03 06  X  SPA  @0 Circuito integrado @5 06
C03 07  X  FRE  @0 Critère stabilité @5 07
C03 07  X  ENG  @0 Stability criterion @5 07
C03 07  X  SPA  @0 Criterio estabilidad @5 07
C03 08  X  FRE  @0 Moyenne pondérée @5 08
C03 08  X  ENG  @0 Weighted average @5 08
C03 08  X  SPA  @0 Promedio pondero @5 08
C03 09  X  FRE  @0 Erreur quadratique moyenne @5 09
C03 09  X  ENG  @0 Mean square error @5 09
C03 09  X  SPA  @0 Error medio cuadrático @5 09
C03 10  X  FRE  @0 Etude comparative @5 10
C03 10  X  ENG  @0 Comparative study @5 10
C03 10  X  SPA  @0 Estudio comparativo @5 10
C03 11  X  FRE  @0 Evaluation performance @5 11
C03 11  X  ENG  @0 Performance evaluation @5 11
C03 11  X  SPA  @0 Evaluación prestación @5 11
C03 12  3  FRE  @0 Séléniure de thulium @2 NK @5 22
C03 12  3  ENG  @0 Thulium selenides @2 NK @5 22
C03 13  X  FRE  @0 TmSe @4 INC @5 82
N21       @1 014
N44 01      @1 OTO
N82       @1 OTO

Format Inist (serveur)

NO : PASCAL 13-0024171 INIST
ET : Designing a Variable EWMA Controller for Process Disturbance Subject to Linear Drift and Step Changes
AU : JOU (Bo-Yan); CHAN (Ya-Ting); TSENG (Sheng-Tsaing)
AF : Taiwan Semiconductor Manufacturing Company/Hsinchu 300/Taïwan (1 aut.); National Tsing Hua University/Hsinchu 300/Taïwan (2 aut., 3 aut.)
DT : Publication en série; Niveau analytique
SO : IEEE transactions on semiconductor manufacturing; ISSN 0894-6507; Etats-Unis; Da. 2012; Vol. 25; No. 4; Pp. 614-622; Bibl. 20 ref.
LA : Anglais
EA : Linear drift and step changes are two commonly encountered disturbances in many semiconductor manufacturing processes. The former may be typically caused by the aging of equipment or tool wearing, while the latter may be caused by using different batches of raw material, preventive maintenance, and sudden changes in manufacturing environment, which are prevalent in the integrated circuit industries. However, most of the existent literature on run-to-run controls has only dealt with processes with linear drift or step changes. Until now, there has been no efficient run-to-run controller to simultaneously adjust the process with these disturbances. In this paper, we first derive the stability conditions and optimal sequence of variable discount factors of the modified variable exponentially weighted moving average controller analytically. Next, we demonstrate that the proposed method is capable of reducing total mean square error (TMSE) of the process output efficiently when both types of process disturbances are present. Finally, a comprehensive comparison is presented to address the process performance of the proposed method compared to the conventional method. The results demonstrate that the proposed method is quite robust in that it is able to reduce the process TMSE even when the process parameters are not accurately estimated.
CC : 001D03F17; 001D03F06A
FD : Système commande; Fabrication microélectronique; Procédé fabrication; Vieillissement; Matière première; Circuit intégré; Critère stabilité; Moyenne pondérée; Erreur quadratique moyenne; Etude comparative; Evaluation performance; Séléniure de thulium; TmSe
ED : Control system; Microelectronic fabrication; Manufacturing process; Ageing; Raw materials; Integrated circuit; Stability criterion; Weighted average; Mean square error; Comparative study; Performance evaluation; Thulium selenides
SD : Sistema control; Fabricación microeléctrica; Procedimiento fabricación; Envejecimiento; Materia prima; Circuito integrado; Criterio estabilidad; Promedio pondero; Error medio cuadrático; Estudio comparativo; Evaluación prestación
LO : INIST-21454.354000502947360090
ID : 13-0024171

Links to Exploration step

Pascal:13-0024171

Le document en format XML

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<AU>JOU (Bo-Yan); CHAN (Ya-Ting); TSENG (Sheng-Tsaing)</AU>
<AF>Taiwan Semiconductor Manufacturing Company/Hsinchu 300/Taïwan (1 aut.); National Tsing Hua University/Hsinchu 300/Taïwan (2 aut., 3 aut.)</AF>
<DT>Publication en série; Niveau analytique</DT>
<SO>IEEE transactions on semiconductor manufacturing; ISSN 0894-6507; Etats-Unis; Da. 2012; Vol. 25; No. 4; Pp. 614-622; Bibl. 20 ref.</SO>
<LA>Anglais</LA>
<EA>Linear drift and step changes are two commonly encountered disturbances in many semiconductor manufacturing processes. The former may be typically caused by the aging of equipment or tool wearing, while the latter may be caused by using different batches of raw material, preventive maintenance, and sudden changes in manufacturing environment, which are prevalent in the integrated circuit industries. However, most of the existent literature on run-to-run controls has only dealt with processes with linear drift or step changes. Until now, there has been no efficient run-to-run controller to simultaneously adjust the process with these disturbances. In this paper, we first derive the stability conditions and optimal sequence of variable discount factors of the modified variable exponentially weighted moving average controller analytically. Next, we demonstrate that the proposed method is capable of reducing total mean square error (TMSE) of the process output efficiently when both types of process disturbances are present. Finally, a comprehensive comparison is presented to address the process performance of the proposed method compared to the conventional method. The results demonstrate that the proposed method is quite robust in that it is able to reduce the process TMSE even when the process parameters are not accurately estimated.</EA>
<CC>001D03F17; 001D03F06A</CC>
<FD>Système commande; Fabrication microélectronique; Procédé fabrication; Vieillissement; Matière première; Circuit intégré; Critère stabilité; Moyenne pondérée; Erreur quadratique moyenne; Etude comparative; Evaluation performance; Séléniure de thulium; TmSe</FD>
<ED>Control system; Microelectronic fabrication; Manufacturing process; Ageing; Raw materials; Integrated circuit; Stability criterion; Weighted average; Mean square error; Comparative study; Performance evaluation; Thulium selenides</ED>
<SD>Sistema control; Fabricación microeléctrica; Procedimiento fabricación; Envejecimiento; Materia prima; Circuito integrado; Criterio estabilidad; Promedio pondero; Error medio cuadrático; Estudio comparativo; Evaluación prestación</SD>
<LO>INIST-21454.354000502947360090</LO>
<ID>13-0024171</ID>
</server>
</inist>
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