Photoluminescence study of thulium-doped silicon substrates for light emitting diodes
Identifieur interne : 000E15 ( Main/Exploration ); précédent : 000E14; suivant : 000E16Photoluminescence study of thulium-doped silicon substrates for light emitting diodes
Auteurs : M. A. Lourenco [Royaume-Uni] ; C. Opoku [Royaume-Uni] ; R. M. Gwilliam [Royaume-Uni] ; K. P. Homewood [Royaume-Uni]Source :
- Optical materials : (Amsterdam) [ 0925-3467 ] ; 2010.
Descripteurs français
- Pascal (Inist)
English descriptors
- KwdEn :
Abstract
Photoluminescence in the 1.2-1.35 μm range has been observed in silicon substrates incorporating thulium in the trivalent Tm3+ state and co-doped with boron. The results showed eight sharp lines at 1211.5, 1231.0, 1250.8, 1269.3, 1283.8, 1290.6, 1311.3 and 1326.0 nm, corresponding to known internal Tm3+ transitions in the manifold from the 3H5 to the 3H6 ground states. The luminescence was strongly dependent on the sample fabrication processes. In this paper we will discuss the influence of Tm implantation parameters and post-implant annealing conditions on the photoluminescence response of silicon doped with Tm3+.
Affiliations:
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Le document en format XML
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Codoping</term>
<term>Doped materials</term>
<term>Electroluminescence</term>
<term>Experimental study</term>
<term>Ground states</term>
<term>Light emitting diodes</term>
<term>Luminescence</term>
<term>Manufacturing processes</term>
<term>Optical materials</term>
<term>Photoluminescence</term>
<term>Silicon</term>
<term>Thulium</term>
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<keywords scheme="Pascal" xml:lang="fr"><term>Photoluminescence</term>
<term>Luminescence</term>
<term>Electroluminescence</term>
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<term>Etude expérimentale</term>
<term>Procédé fabrication</term>
<term>Etat fondamental</term>
<term>Matériau dopé</term>
<term>Codopage</term>
<term>Matériau optique</term>
<term>Addition thulium</term>
<term>Thulium</term>
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<front><div type="abstract" xml:lang="en">Photoluminescence in the 1.2-1.35 μm range has been observed in silicon substrates incorporating thulium in the trivalent Tm<sup>3+</sup>
state and co-doped with boron. The results showed eight sharp lines at 1211.5, 1231.0, 1250.8, 1269.3, 1283.8, 1290.6, 1311.3 and 1326.0 nm, corresponding to known internal Tm<sup>3+</sup>
transitions in the manifold from the <sup>3</sup>
H<sub>5</sub>
to the <sup>3</sup>
H<sub>6</sub>
ground states. The luminescence was strongly dependent on the sample fabrication processes. In this paper we will discuss the influence of Tm implantation parameters and post-implant annealing conditions on the photoluminescence response of silicon doped with Tm<sup>3+</sup>
.</div>
</front>
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<affiliations><list><country><li>Royaume-Uni</li>
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<tree><country name="Royaume-Uni"><noRegion><name sortKey="Lourenco, M A" sort="Lourenco, M A" uniqKey="Lourenco M" first="M. A." last="Lourenco">M. A. Lourenco</name>
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<name sortKey="Gwilliam, R M" sort="Gwilliam, R M" uniqKey="Gwilliam R" first="R. M." last="Gwilliam">R. M. Gwilliam</name>
<name sortKey="Homewood, K P" sort="Homewood, K P" uniqKey="Homewood K" first="K. P." last="Homewood">K. P. Homewood</name>
<name sortKey="Opoku, C" sort="Opoku, C" uniqKey="Opoku C" first="C." last="Opoku">C. Opoku</name>
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