Serveur d'exploration sur le thulium - Checkpoint (Istex)

Index « ISSN » - entrée « J. Anal. At. Spectrom. »
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List of bibliographic references

Number of relevant bibliographic references: 30.
[0-20] [0 - 20][0 - 30][20-29][20-40]
Ident.Authors (with country if any)Title
000252 (2010) Ahmed I. Abdelrahman [Canada] ; Olga Ornatsky [Canada] ; Dmitry Bandura [Canada] ; Vladimir Baranov [Canada] ; Robert Kinach [Canada] ; Sheng Dai [Canada] ; Stuart C. Thickett [Canada] ; Scott Tanner [Canada] ; Mitchell A. Winnik [Canada]Metal-containing polystyrene beads as standards for mass cytometry
000255 (2010) S. Dubascoux [France] ; I. Le Hcho [France] ; M. Hassellv [Suède] ; F. Von Der Kammer [Autriche] ; M. Potin Gautier [France] ; G. Lespes [France]Field-flow fractionation and inductively coupled plasma mass spectrometer coupling: History, development and applications
000259 (2010) Francisco Ardini [Italie] ; Francesco Soggia [Italie] ; Francesco Rugi [Italie] ; Roberto Udisti [Italie] ; Marco Grotti [Italie]Conversion of rare earth elements to molecular oxide ions in a dynamic reaction cell and consequences on their determination by inductively coupled plasma mass spectrometry
000365 (2009) Larissa Waentig [Allemagne] ; Peter H. Roos [Allemagne] ; Norbert Jakubowski [Allemagne]Labelling of antibodies and detection by laser ablation inductively coupled plasma mass spectrometryPART III. Optimization of antibody labelling for application in a Western blot procedure
000372 (2009) Simon Carter [Royaume-Uni] ; Andy S. Fisher [Royaume-Uni] ; Phill S. Goodall [Royaume-Uni] ; Michael W. Hinds [Canada] ; Steve Lancaster [Royaume-Uni] ; Sian Shore [Royaume-Uni]Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials
000462 (2008) Olga I. Ornatsky [Canada] ; Robert Kinach [Canada] ; Dmitry R. Bandura [Canada] ; Xudong Lou [Canada] ; Scott D. Tanner [Canada] ; Vladimir I. Baranov [Canada] ; Mark Nitz [Canada] ; Mitchell A. Winnik [Canada]Development of analytical methods for multiplex bio-assay with inductively coupled plasma mass spectrometry
000A62 (2000) Jason A. Day [États-Unis] ; Joseph A. Caruso [États-Unis] ; J. Sabine Becker [Allemagne] ; Hans-Joachim Dietze [Allemagne]Application of capillary electrophoresis interfaced to double focusing sector field ICP-MS for nuclide abundance determination of lanthanides produced via spallation reactions in an irradiated tantalum targetPresented in part as poster No. 558 at the 1999 Federation of Analytical Chemistry and Spectroscopy Societies (FACSS) Conference, Vancouver, Canada, October 24–29, 1999.
000B82 (1999) Ben Fairman ; Michael W. Hinds ; Simon M. Nelms ; Denise M. Penny ; Phill GoodallIndustrial analysis: metals, chemicals and advanced materials
000D19 (1998) Andrew T. Ellis ; Michael Holmes ; Peter Kregsamer ; Philip J. Potts ; Christina Streli ; Margaret West ; Peter WobrauschekAtomic Spectrometry Update—X-ray Fluorescence Spectrometry
000D20 (1998) Ben Fairman ; Michael W. Hinds ; Simon M. Nelms ; Denise M. PennydeAtomic Spectrometry Update-Industrial analysis: metals, chemicals and advanced materials
000E37 (1997) D. Günther ; H. Cousin ; B. Magyar ; I. LeopoldCalibration Studies on Dried Aerosols for LaserAblation–Inductively Coupled Plasma MassSpectrometry
000F80 (1996) Atomic Spectrometry Updates—References
001131 (1995) Einar Knutsen ; Grethe Wibetoe ; Ivar MartinsenDetermination of elevated levels of dysprosium in serum by electrothermal atomic absorption spectrometry
001246 (1994) John Marshall ; John Carroll ; James S. Crighton ; Charles L. R. BarnardAtomic Spectrometry Update—Industrial Analysis: Metals, Chemicals and Advanced Materials
001247 (1994) Atomic Spectrometry Updated References
001248 (1994) Atomic Spectrometry Updated References
001249 (1994) Atomic Spectrometry Updated References
001370 (1993) Atomic Spectrometry Update References
001501 (1992) Atomic Spectrometry Update References
001645 (1991) Atomic spectrometry update references
001646 (1991) John Marshall ; John Carroll ; James S. CrightonAtomic Spectrometry Update—Industrial Analysis: Metals, Chemicals and Advanced Materials

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