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Amorphous Tm3+ doped sulfide thin films fabricated by sputtering

Identifieur interne : 000043 ( Hal/Checkpoint ); précédent : 000042; suivant : 000044

Amorphous Tm3+ doped sulfide thin films fabricated by sputtering

Auteurs : Virginie Nazabal [France] ; Anne-Marie Jurdyc [France] ; P. Nemec [République tchèque] ; Marie-Laure Brandily-Anne [France] ; Laëtitia Petit [États-Unis] ; Katheleen Richardson [États-Unis] ; Philippe Vinatier [France] ; Cathel Bousquet [France] ; Thierry Cardinal [France] ; Stanislav Pechev [France] ; Jean-Luc Adam [France]

Source :

RBID : Hal:hal-00608450

English descriptors

Abstract

Amorphous chalcogenide films play a motivating role in the development of integrated planar optical circuits and their components. The aim of the present investigation was to optimize deposition conditions for preparation of pure and Tm3+ doped sulfide films by radio-frequency magnetron sputtering. The study of their composition, morphological characteristics and thermal properties was realized by scanning electronic microscope attached with energy dispersive spectroscopy, Rutherford backscattering, X-ray diffraction, and micro-thermal probe. Some optical properties, like transmission, index of refraction, optical band-gap, propagation modes from 633 to 1540 nm, were investigated on thin films. The whole results point out hopeful perspectives strengthened by the clear observation of the near-infrared photo-luminescence of Tm3+ doped sulfide films.

Url:
DOI: 10.1016/j.optmat.2010.08.023

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Le document en format XML

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