Nano-analysis of grain boundary and triple junction transport in nanocrystalline Ni/Cu.
Identifieur interne : 000063 ( PubMed/Checkpoint ); précédent : 000062; suivant : 000064Nano-analysis of grain boundary and triple junction transport in nanocrystalline Ni/Cu.
Auteurs : Mohammed Reda Chellali [Algérie] ; Zoltan Balogh ; Guido SchmitzSource :
- Ultramicroscopy [ 1879-2723 ] ; 2013.
Abstract
Nanocrystalline materials are distinguished by a high density of structural defects and grain boundaries. Due to the small grain size, a particular defect of the grain boundary topology, the so-called triple junction takes a dominant role for grain growth and atomic transport. We demonstrate by atom probe tomography that triple junctions in nanocrystalline Cu have 100-300 times higher diffusivity of Ni than standard high angle grain boundaries. Also, a previously unexpected systematic variation of the grain boundary width with temperature is detected. The impurity segregation layer at the grain boundaries grows from the 0.7 nm at 563 K to 2.5 nm at 643 K. This variation is clearly not controlled by simple bulk diffusion. Taking this effect into consideration, the activation energies for Ni diffusion in triple junctions and grain boundaries in Cu can be determined to be (83 ± 10) and (120 ± 15) kJ/mol, respectively. Thus, triple junctions are distinguished by considerably lower activation energy with respect to grain boundaries.
DOI: 10.1016/j.ultramic.2012.12.002
PubMed: 23294555
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Wilhelms-Universität Münster, Wilhelm-Klemm-Str. 10, D-48149 Münster, Germany; Laboratoire de Chimie des Polymères, Faculté des Sciences, Université d'Oran, Algérie. Electronic address: m_chel01@uni-muenster.de.</nlm:affiliation><country xml:lang="fr">Algérie</country><wicri:regionArea>Institute of Materials Physics, Westf. Wilhelms-Universität Münster, Wilhelm-Klemm-Str. 10, D-48149 Münster, Germany; Laboratoire de Chimie des Polymères, Faculté des Sciences, Université d'Oran</wicri:regionArea><wicri:noRegion>Université d'Oran</wicri:noRegion></affiliation></author><author><name sortKey="Balogh, Zoltan" sort="Balogh, Zoltan" uniqKey="Balogh Z" first="Zoltan" last="Balogh">Zoltan Balogh</name></author><author><name sortKey="Schmitz, Guido" sort="Schmitz, Guido" uniqKey="Schmitz G" first="Guido" last="Schmitz">Guido Schmitz</name></author></analytic><series><title level="j">Ultramicroscopy</title><idno type="eISSN">1879-2723</idno><imprint><date when="2013" type="published">2013</date></imprint></series></biblStruct></sourceDesc></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">Nanocrystalline materials are distinguished by a high density of structural defects and grain boundaries. Due to the small grain size, a particular defect of the grain boundary topology, the so-called triple junction takes a dominant role for grain growth and atomic transport. We demonstrate by atom probe tomography that triple junctions in nanocrystalline Cu have 100-300 times higher diffusivity of Ni than standard high angle grain boundaries. Also, a previously unexpected systematic variation of the grain boundary width with temperature is detected. The impurity segregation layer at the grain boundaries grows from the 0.7 nm at 563 K to 2.5 nm at 643 K. This variation is clearly not controlled by simple bulk diffusion. Taking this effect into consideration, the activation energies for Ni diffusion in triple junctions and grain boundaries in Cu can be determined to be (83 ± 10) and (120 ± 15) kJ/mol, respectively. Thus, triple junctions are distinguished by considerably lower activation energy with respect to grain boundaries.</div></front></TEI><pubmed><MedlineCitation Status="PubMed-not-MEDLINE" Owner="NLM"><PMID Version="1">23294555</PMID><DateCreated><Year>2013</Year><Month>09</Month><Day>16</Day></DateCreated><DateCompleted><Year>2014</Year><Month>04</Month><Day>24</Day></DateCompleted><DateRevised><Year>2013</Year><Month>09</Month><Day>16</Day></DateRevised><Article PubModel="Print-Electronic"><Journal><ISSN IssnType="Electronic">1879-2723</ISSN><JournalIssue CitedMedium="Internet"><Volume>132</Volume><PubDate><Year>2013</Year><Month>Sep</Month></PubDate></JournalIssue><Title>Ultramicroscopy</Title><ISOAbbreviation>Ultramicroscopy</ISOAbbreviation></Journal><ArticleTitle>Nano-analysis of grain boundary and triple junction transport in nanocrystalline Ni/Cu.</ArticleTitle><Pagination><MedlinePgn>164-70</MedlinePgn></Pagination><ELocationID EIdType="doi" ValidYN="Y">10.1016/j.ultramic.2012.12.002</ELocationID><ELocationID EIdType="pii" ValidYN="Y">S0304-3991(12)00289-6</ELocationID><Abstract><AbstractText>Nanocrystalline materials are distinguished by a high density of structural defects and grain boundaries. Due to the small grain size, a particular defect of the grain boundary topology, the so-called triple junction takes a dominant role for grain growth and atomic transport. We demonstrate by atom probe tomography that triple junctions in nanocrystalline Cu have 100-300 times higher diffusivity of Ni than standard high angle grain boundaries. Also, a previously unexpected systematic variation of the grain boundary width with temperature is detected. The impurity segregation layer at the grain boundaries grows from the 0.7 nm at 563 K to 2.5 nm at 643 K. This variation is clearly not controlled by simple bulk diffusion. Taking this effect into consideration, the activation energies for Ni diffusion in triple junctions and grain boundaries in Cu can be determined to be (83 ± 10) and (120 ± 15) kJ/mol, respectively. Thus, triple junctions are distinguished by considerably lower activation energy with respect to grain boundaries.</AbstractText><CopyrightInformation>Copyright © 2013 Elsevier B.V. All rights reserved.</CopyrightInformation></Abstract><AuthorList CompleteYN="Y"><Author ValidYN="Y"><LastName>Reda Chellali</LastName><ForeName>Mohammed</ForeName><Initials>M</Initials><AffiliationInfo><Affiliation>Institute of Materials Physics, Westf. Wilhelms-Universität Münster, Wilhelm-Klemm-Str. 10, D-48149 Münster, Germany; Laboratoire de Chimie des Polymères, Faculté des Sciences, Université d'Oran, Algérie. Electronic address: m_chel01@uni-muenster.de.</Affiliation></AffiliationInfo></Author><Author ValidYN="Y"><LastName>Balogh</LastName><ForeName>Zoltan</ForeName><Initials>Z</Initials></Author><Author ValidYN="Y"><LastName>Schmitz</LastName><ForeName>Guido</ForeName><Initials>G</Initials></Author></AuthorList><Language>eng</Language><PublicationTypeList><PublicationType UI="D016428">Journal Article</PublicationType><PublicationType UI="D013485">Research Support, Non-U.S. Gov't</PublicationType></PublicationTypeList><ArticleDate DateType="Electronic"><Year>2012</Year><Month>12</Month><Day>13</Day></ArticleDate></Article><MedlineJournalInfo><Country>Netherlands</Country><MedlineTA>Ultramicroscopy</MedlineTA><NlmUniqueID>7513702</NlmUniqueID><ISSNLinking>0304-3991</ISSNLinking></MedlineJournalInfo><KeywordList Owner="NOTNLM"><Keyword MajorTopicYN="N">Atom probe tomography</Keyword><Keyword MajorTopicYN="N">Copper</Keyword><Keyword MajorTopicYN="N">Grain boundary</Keyword><Keyword MajorTopicYN="N">Nanocrystalline metals</Keyword><Keyword MajorTopicYN="N">Nickel</Keyword><Keyword MajorTopicYN="N">Triple junctions</Keyword></KeywordList></MedlineCitation><PubmedData><History><PubMedPubDate PubStatus="received"><Year>2012</Year><Month>05</Month><Day>11</Day></PubMedPubDate><PubMedPubDate PubStatus="revised"><Year>2012</Year><Month>10</Month><Day>01</Day></PubMedPubDate><PubMedPubDate PubStatus="accepted"><Year>2012</Year><Month>12</Month><Day>03</Day></PubMedPubDate><PubMedPubDate PubStatus="entrez"><Year>2013</Year><Month>1</Month><Day>9</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="pubmed"><Year>2013</Year><Month>1</Month><Day>9</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="medline"><Year>2013</Year><Month>1</Month><Day>9</Day><Hour>6</Hour><Minute>1</Minute></PubMedPubDate></History><PublicationStatus>ppublish</PublicationStatus><ArticleIdList><ArticleId IdType="pubmed">23294555</ArticleId><ArticleId IdType="pii">S0304-3991(12)00289-6</ArticleId><ArticleId IdType="doi">10.1016/j.ultramic.2012.12.002</ArticleId></ArticleIdList></PubmedData></pubmed><affiliations><list><country><li>Algérie</li></country></list><tree><noCountry><name sortKey="Balogh, Zoltan" sort="Balogh, Zoltan" uniqKey="Balogh Z" first="Zoltan" last="Balogh">Zoltan Balogh</name><name sortKey="Schmitz, Guido" sort="Schmitz, Guido" uniqKey="Schmitz G" first="Guido" last="Schmitz">Guido Schmitz</name></noCountry><country name="Algérie"><noRegion><name sortKey="Reda Chellali, Mohammed" sort="Reda Chellali, Mohammed" uniqKey="Reda Chellali M" first="Mohammed" last="Reda Chellali">Mohammed Reda Chellali</name></noRegion></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
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