Reactive magnetron sputtering as a way to improve the knowledge of metastable f.c.c. nitrogen solid solutions formed during plasma assisted nitriding of Inconel 690
Identifieur interne :
000339 ( PascalFrancis/Corpus );
précédent :
000338;
suivant :
000340
Reactive magnetron sputtering as a way to improve the knowledge of metastable f.c.c. nitrogen solid solutions formed during plasma assisted nitriding of Inconel 690
Auteurs : T. Czerwiec ;
H. He ;
A. Saker ;
L. Tran Huu ;
C. Dong ;
C. Frantz ;
H. MichelSource :
-
Surface & coatings technology [ 0257-8972 ] ; 2003.
RBID : Pascal:04-0503490
Descripteurs français
English descriptors
Abstract
Low temperature plasma assisted nitriding (PAN) treatments of Inconel 690 (a nickel base alloy with a 30 wt.% chromium content) produce a complex layer constituted by two different metastable f.c.c. solid solutions denoted (γN1 and γN2). In addition, different layer thicknesses are observed for differently oriented grains. Reactive magnetron sputtering (RMS) of Inconel 690 in argon-nitrogen containing mixtures is used to produce homogeneous films constituted by a well defined γN phase. In reactive conditions, the as-deposited coatings (T< 100 °C) containing up to 30 at.% of nitrogen are nanocrystalline supersaturated f.c.c. solid solution (γN) with a grain size lying between 3 and 7.5 nm. A comparison between the products synthesized by these two techniques (PAN and RMS) is presented in this study. The formation of γN phases in low temperature PAN is discussed in the light of electron backscatter diffraction measurements and by comparison with X-ray diffraction patterns of RMS coatings. By using the results obtained in situ by RMS on heated substrates and by tempering of as-deposited films, the decomposition products of the γN phase at high temperature (>450 °C) or long PAN treatments at 400 °C are identified to be f.c.c. CrN and γ(Ni,Fe) depleted in nitrogen.
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Pour connaître la documentation sur le format Inist Standard.
| pA |
| A01 | 01 | 1 | | @0 0257-8972 |
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| A02 | 01 | | | @0 SCTEEJ |
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| A03 | | 1 | | @0 Surf. coat. technol. |
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| A05 | | | | @2 174-75 |
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| A08 | 01 | 1 | ENG | @1 Reactive magnetron sputtering as a way to improve the knowledge of metastable f.c.c. nitrogen solid solutions formed during plasma assisted nitriding of Inconel 690 |
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| A09 | 01 | 1 | ENG | @1 Proceedings of the Eight International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 9-13, 2002 |
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| A11 | 01 | 1 | | @1 CZERWIEC (T.) |
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| A11 | 02 | 1 | | @1 HE (H.) |
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| A11 | 03 | 1 | | @1 SAKER (A.) |
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| A11 | 04 | 1 | | @1 TRAN HUU (L.) |
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| A11 | 05 | 1 | | @1 DONG (C.) |
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| A11 | 06 | 1 | | @1 FRANTZ (C.) |
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| A11 | 07 | 1 | | @1 MICHEL (H.) |
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| A12 | 01 | 1 | | @1 BRÄUER (G.) @9 ed. |
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| A12 | 02 | 1 | | @1 CAMERON (D.) @9 ed. |
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| A12 | 03 | 1 | | @1 RIE (K.-T.) @9 ed. |
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| A12 | 04 | 1 | | @1 BEWILOGUA (K.) @9 ed. |
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| A12 | 05 | 1 | | @1 OEHR (C.) @9 ed. |
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| A12 | 06 | 1 | | @1 REICHEL (K.) @9 ed. |
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| A12 | 07 | 1 | | @1 RICARD (A.) @9 ed. |
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| A12 | 08 | 1 | | @1 SUCHENTRUNK (R.) @9 ed. |
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| A14 | 01 | | | @1 Laboratoire de Science et Génie des Surfaces (UMR CNRS 7570), Ecole des Mines, Parc de Saurupt @2 54042 Nancy @3 FRA @Z 1 aut. @Z 2 aut. @Z 4 aut. @Z 6 aut. @Z 7 aut. |
|---|
| A14 | 02 | | | @1 State Key Laboratory for Materials Modification by Laser Ion and Electron Beams, Dalian University of Technology @2 Dalian 116024 @3 CHN @Z 2 aut. @Z 5 aut. |
|---|
| A14 | 03 | | | @1 Département de Physique de l'Université Badji Mokhtar, BP 12 El Hadjar @2 Annaba @3 DZA @Z 3 aut. |
|---|
| A18 | 01 | 1 | | @1 European Joint Committee on Plasma and Ion Surface Engineering (EJC/PISE) @3 EUR @9 patr. |
|---|
| A20 | | | | @1 131-138 |
|---|
| A21 | | | | @1 2003 |
|---|
| A23 | 01 | | | @0 ENG |
|---|
| A43 | 01 | | | @1 INIST @2 15987 @5 354000119149920210 |
|---|
| A44 | | | | @0 0000 @1 © 2004 INIST-CNRS. All rights reserved. |
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| A45 | | | | @0 28 ref. |
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| A47 | 01 | 1 | | @0 04-0503490 |
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| A60 | | | | @1 P @2 C |
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| A61 | | | | @0 A |
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| A64 | 01 | 1 | | @0 Surface & coatings technology |
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| A66 | 01 | | | @0 CHE |
|---|
| C01 | 01 | | ENG | @0 Low temperature plasma assisted nitriding (PAN) treatments of Inconel 690 (a nickel base alloy with a 30 wt.% chromium content) produce a complex layer constituted by two different metastable f.c.c. solid solutions denoted (γN1 and γN2). In addition, different layer thicknesses are observed for differently oriented grains. Reactive magnetron sputtering (RMS) of Inconel 690 in argon-nitrogen containing mixtures is used to produce homogeneous films constituted by a well defined γN phase. In reactive conditions, the as-deposited coatings (T< 100 °C) containing up to 30 at.% of nitrogen are nanocrystalline supersaturated f.c.c. solid solution (γN) with a grain size lying between 3 and 7.5 nm. A comparison between the products synthesized by these two techniques (PAN and RMS) is presented in this study. The formation of γN phases in low temperature PAN is discussed in the light of electron backscatter diffraction measurements and by comparison with X-ray diffraction patterns of RMS coatings. By using the results obtained in situ by RMS on heated substrates and by tempering of as-deposited films, the decomposition products of the γN phase at high temperature (>450 °C) or long PAN treatments at 400 °C are identified to be f.c.c. CrN and γ(Ni,Fe) depleted in nitrogen. |
|---|
| C02 | 01 | X | | @0 001D11C06 |
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| C02 | 02 | X | | @0 240 |
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| C03 | 01 | X | FRE | @0 Traitement surface @5 55 |
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| C03 | 01 | X | ENG | @0 Surface treatment @5 55 |
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| C03 | 01 | X | GER | @0 Oberflaechenbehandlung @5 55 |
|---|
| C03 | 01 | X | SPA | @0 Tratamiento superficie @5 55 |
|---|
| C03 | 02 | X | FRE | @0 Plasma @5 56 |
|---|
| C03 | 02 | X | ENG | @0 Plasma @5 56 |
|---|
| C03 | 02 | X | GER | @0 Plasma @5 56 |
|---|
| C03 | 02 | X | SPA | @0 Plasma @5 56 |
|---|
| N21 | | | | @1 285 |
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| N44 | 01 | | | @1 OTO |
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| N82 | | | | @1 OTO |
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| pR |
| A30 | 01 | 1 | ENG | @1 PSE 2002: Plasma Surface Engineering. Conference @2 8 @3 Garmisch-Partenkirchen DEU @4 2002-09-09 |
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Format Inist (serveur)
| NO : | PASCAL 04-0503490 INIST |
|---|
| ET : | Reactive magnetron sputtering as a way to improve the knowledge of metastable f.c.c. nitrogen solid solutions formed during plasma assisted nitriding of Inconel 690 |
|---|
| AU : | CZERWIEC (T.); HE (H.); SAKER (A.); TRAN HUU (L.); DONG (C.); FRANTZ (C.); MICHEL (H.); BRÄUER (G.); CAMERON (D.); RIE (K.-T.); BEWILOGUA (K.); OEHR (C.); REICHEL (K.); RICARD (A.); SUCHENTRUNK (R.) |
|---|
| AF : | Laboratoire de Science et Génie des Surfaces (UMR CNRS 7570), Ecole des Mines, Parc de Saurupt/54042 Nancy/France (1 aut., 2 aut., 4 aut., 6 aut., 7 aut.); State Key Laboratory for Materials Modification by Laser Ion and Electron Beams, Dalian University of Technology/Dalian 116024/Chine (2 aut., 5 aut.); Département de Physique de l'Université Badji Mokhtar, BP 12 El Hadjar/Annaba/Algérie (3 aut.) |
|---|
| DT : | Publication en série; Congrès; Niveau analytique |
|---|
| SO : | Surface & coatings technology; ISSN 0257-8972; Coden SCTEEJ; Suisse; Da. 2003; Vol. 174-75; Pp. 131-138; Bibl. 28 ref. |
|---|
| LA : | Anglais |
|---|
| EA : | Low temperature plasma assisted nitriding (PAN) treatments of Inconel 690 (a nickel base alloy with a 30 wt.% chromium content) produce a complex layer constituted by two different metastable f.c.c. solid solutions denoted (γN1 and γN2). In addition, different layer thicknesses are observed for differently oriented grains. Reactive magnetron sputtering (RMS) of Inconel 690 in argon-nitrogen containing mixtures is used to produce homogeneous films constituted by a well defined γN phase. In reactive conditions, the as-deposited coatings (T< 100 °C) containing up to 30 at.% of nitrogen are nanocrystalline supersaturated f.c.c. solid solution (γN) with a grain size lying between 3 and 7.5 nm. A comparison between the products synthesized by these two techniques (PAN and RMS) is presented in this study. The formation of γN phases in low temperature PAN is discussed in the light of electron backscatter diffraction measurements and by comparison with X-ray diffraction patterns of RMS coatings. By using the results obtained in situ by RMS on heated substrates and by tempering of as-deposited films, the decomposition products of the γN phase at high temperature (>450 °C) or long PAN treatments at 400 °C are identified to be f.c.c. CrN and γ(Ni,Fe) depleted in nitrogen. |
|---|
| CC : | 001D11C06; 240 |
|---|
| FD : | Traitement surface; Plasma |
|---|
| ED : | Surface treatment; Plasma |
|---|
| GD : | Oberflaechenbehandlung; Plasma |
|---|
| SD : | Tratamiento superficie; Plasma |
|---|
| LO : | INIST-15987.354000119149920210 |
|---|
| ID : | 04-0503490 |
|---|
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Pascal:04-0503490
Le document en format XML
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</publicationStmt><sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Reactive magnetron sputtering as a way to improve the knowledge of metastable f.c.c. nitrogen solid solutions formed during plasma assisted nitriding of Inconel 690</title>
<author><name sortKey="Czerwiec, T" sort="Czerwiec, T" uniqKey="Czerwiec T" first="T." last="Czerwiec">T. Czerwiec</name>
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<s2>54042 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14><author><name sortKey="He, H" sort="He, H" uniqKey="He H" first="H." last="He">H. He</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Science et Génie des Surfaces (UMR CNRS 7570), Ecole des Mines, Parc de Saurupt</s1>
<s2>54042 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14><affiliation><inist:fA14 i1="02"><s1>State Key Laboratory for Materials Modification by Laser Ion and Electron Beams, Dalian University of Technology</s1>
<s2>Dalian 116024</s2>
<s3>CHN</s3>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14><author><name sortKey="Saker, A" sort="Saker, A" uniqKey="Saker A" first="A." last="Saker">A. Saker</name>
<affiliation><inist:fA14 i1="03"><s1>Département de Physique de l'Université Badji Mokhtar, BP 12 El Hadjar</s1>
<s2>Annaba</s2>
<s3>DZA</s3>
<sZ>3 aut.</sZ>
</inist:fA14><author><name sortKey="Tran Huu, L" sort="Tran Huu, L" uniqKey="Tran Huu L" first="L." last="Tran Huu">L. Tran Huu</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Science et Génie des Surfaces (UMR CNRS 7570), Ecole des Mines, Parc de Saurupt</s1>
<s2>54042 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14><author><name sortKey="Dong, C" sort="Dong, C" uniqKey="Dong C" first="C." last="Dong">C. Dong</name>
<affiliation><inist:fA14 i1="02"><s1>State Key Laboratory for Materials Modification by Laser Ion and Electron Beams, Dalian University of Technology</s1>
<s2>Dalian 116024</s2>
<s3>CHN</s3>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
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<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Science et Génie des Surfaces (UMR CNRS 7570), Ecole des Mines, Parc de Saurupt</s1>
<s2>54042 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14><author><name sortKey="Michel, H" sort="Michel, H" uniqKey="Michel H" first="H." last="Michel">H. Michel</name>
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<s2>54042 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14><series><title level="j" type="main">Surface & coatings technology</title>
<title level="j" type="abbreviated">Surf. coat. technol.</title>
<idno type="ISSN">0257-8972</idno>
<imprint><date when="2003">2003</date>
</imprint><seriesStmt><title level="j" type="main">Surface & coatings technology</title>
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<idno type="ISSN">0257-8972</idno>
</seriesStmt><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Plasma</term>
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<term>Plasma</term>
</keywords><front><div type="abstract" xml:lang="en">Low temperature plasma assisted nitriding (PAN) treatments of Inconel 690 (a nickel base alloy with a 30 wt.% chromium content) produce a complex layer constituted by two different metastable f.c.c. solid solutions denoted (γ<sub>N1</sub>
and γ<sub>N2</sub>
). In addition, different layer thicknesses are observed for differently oriented grains. Reactive magnetron sputtering (RMS) of Inconel 690 in argon-nitrogen containing mixtures is used to produce homogeneous films constituted by a well defined γ<sub>N</sub>
phase. In reactive conditions, the as-deposited coatings (T< 100 °C) containing up to 30 at.% of nitrogen are nanocrystalline supersaturated f.c.c. solid solution (γ<sub>N</sub>
) with a grain size lying between 3 and 7.5 nm. A comparison between the products synthesized by these two techniques (PAN and RMS) is presented in this study. The formation of γ<sub>N</sub>
phases in low temperature PAN is discussed in the light of electron backscatter diffraction measurements and by comparison with X-ray diffraction patterns of RMS coatings. By using the results obtained in situ by RMS on heated substrates and by tempering of as-deposited films, the decomposition products of the γ<sub>N</sub>
phase at high temperature (>450 °C) or long PAN treatments at 400 °C are identified to be f.c.c. CrN and γ(Ni,Fe) depleted in nitrogen.</div><inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0257-8972</s0>
</fA01><fA02 i1="01"><s0>SCTEEJ</s0>
</fA02><fA03 i2="1"><s0>Surf. coat. technol.</s0>
</fA03><fA05><s2>174-75</s2>
</fA05><fA08 i1="01" i2="1" l="ENG"><s1>Reactive magnetron sputtering as a way to improve the knowledge of metastable f.c.c. nitrogen solid solutions formed during plasma assisted nitriding of Inconel 690</s1>
</fA08><fA09 i1="01" i2="1" l="ENG"><s1>Proceedings of the Eight International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 9-13, 2002</s1>
</fA09><fA11 i1="01" i2="1"><s1>CZERWIEC (T.)</s1>
</fA11><fA11 i1="02" i2="1"><s1>HE (H.)</s1>
</fA11><fA11 i1="03" i2="1"><s1>SAKER (A.)</s1>
</fA11><fA11 i1="04" i2="1"><s1>TRAN HUU (L.)</s1>
</fA11><fA11 i1="05" i2="1"><s1>DONG (C.)</s1>
</fA11><fA11 i1="06" i2="1"><s1>FRANTZ (C.)</s1>
</fA11><fA11 i1="07" i2="1"><s1>MICHEL (H.)</s1>
</fA11><fA12 i1="01" i2="1"><s1>BRÄUER (G.)</s1>
<s9>ed.</s9>
</fA12><fA12 i1="02" i2="1"><s1>CAMERON (D.)</s1>
<s9>ed.</s9>
</fA12><fA12 i1="03" i2="1"><s1>RIE (K.-T.)</s1>
<s9>ed.</s9>
</fA12><fA12 i1="04" i2="1"><s1>BEWILOGUA (K.)</s1>
<s9>ed.</s9>
</fA12><fA12 i1="05" i2="1"><s1>OEHR (C.)</s1>
<s9>ed.</s9>
</fA12><fA12 i1="06" i2="1"><s1>REICHEL (K.)</s1>
<s9>ed.</s9>
</fA12><fA12 i1="07" i2="1"><s1>RICARD (A.)</s1>
<s9>ed.</s9>
</fA12><fA12 i1="08" i2="1"><s1>SUCHENTRUNK (R.)</s1>
<s9>ed.</s9>
</fA12><fA14 i1="01"><s1>Laboratoire de Science et Génie des Surfaces (UMR CNRS 7570), Ecole des Mines, Parc de Saurupt</s1>
<s2>54042 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</fA14><fA14 i1="02"><s1>State Key Laboratory for Materials Modification by Laser Ion and Electron Beams, Dalian University of Technology</s1>
<s2>Dalian 116024</s2>
<s3>CHN</s3>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</fA14><fA14 i1="03"><s1>Département de Physique de l'Université Badji Mokhtar, BP 12 El Hadjar</s1>
<s2>Annaba</s2>
<s3>DZA</s3>
<sZ>3 aut.</sZ>
</fA14><fA18 i1="01" i2="1"><s1>European Joint Committee on Plasma and Ion Surface Engineering (EJC/PISE)</s1>
<s3>EUR</s3>
<s9>patr.</s9>
</fA18><fA20><s1>131-138</s1>
</fA20><fA21><s1>2003</s1>
</fA21><fA23 i1="01"><s0>ENG</s0>
</fA23><fA43 i1="01"><s1>INIST</s1>
<s2>15987</s2>
<s5>354000119149920210</s5>
</fA43><fA44><s0>0000</s0>
<s1>© 2004 INIST-CNRS. All rights reserved.</s1>
</fA44><fA45><s0>28 ref.</s0>
</fA45><fA47 i1="01" i2="1"><s0>04-0503490</s0>
</fA47><fA60><s1>P</s1>
<s2>C</s2>
</fA60><fA64 i1="01" i2="1"><s0>Surface & coatings technology</s0>
</fA64><fA66 i1="01"><s0>CHE</s0>
</fA66><fC01 i1="01" l="ENG"><s0>Low temperature plasma assisted nitriding (PAN) treatments of Inconel 690 (a nickel base alloy with a 30 wt.% chromium content) produce a complex layer constituted by two different metastable f.c.c. solid solutions denoted (γ<sub>N1</sub>
and γ<sub>N2</sub>
). In addition, different layer thicknesses are observed for differently oriented grains. Reactive magnetron sputtering (RMS) of Inconel 690 in argon-nitrogen containing mixtures is used to produce homogeneous films constituted by a well defined γ<sub>N</sub>
phase. In reactive conditions, the as-deposited coatings (T< 100 °C) containing up to 30 at.% of nitrogen are nanocrystalline supersaturated f.c.c. solid solution (γ<sub>N</sub>
) with a grain size lying between 3 and 7.5 nm. A comparison between the products synthesized by these two techniques (PAN and RMS) is presented in this study. The formation of γ<sub>N</sub>
phases in low temperature PAN is discussed in the light of electron backscatter diffraction measurements and by comparison with X-ray diffraction patterns of RMS coatings. By using the results obtained in situ by RMS on heated substrates and by tempering of as-deposited films, the decomposition products of the γ<sub>N</sub>
phase at high temperature (>450 °C) or long PAN treatments at 400 °C are identified to be f.c.c. CrN and γ(Ni,Fe) depleted in nitrogen.</s0><fC02 i1="01" i2="X"><s0>001D11C06</s0>
</fC02><fC02 i1="02" i2="X"><s0>240</s0>
</fC02><fC03 i1="01" i2="X" l="FRE"><s0>Traitement surface</s0>
<s5>55</s5>
</fC03><fC03 i1="01" i2="X" l="ENG"><s0>Surface treatment</s0>
<s5>55</s5>
</fC03><fC03 i1="01" i2="X" l="GER"><s0>Oberflaechenbehandlung</s0>
<s5>55</s5>
</fC03><fC03 i1="01" i2="X" l="SPA"><s0>Tratamiento superficie</s0>
<s5>55</s5>
</fC03><fC03 i1="02" i2="X" l="FRE"><s0>Plasma</s0>
<s5>56</s5>
</fC03><fC03 i1="02" i2="X" l="ENG"><s0>Plasma</s0>
<s5>56</s5>
</fC03><fC03 i1="02" i2="X" l="GER"><s0>Plasma</s0>
<s5>56</s5>
</fC03><fC03 i1="02" i2="X" l="SPA"><s0>Plasma</s0>
<s5>56</s5>
</fC03><fN21><s1>285</s1>
</fN21><fN44 i1="01"><s1>OTO</s1>
</fN44><fN82><s1>OTO</s1>
</fN82><pR><fA30 i1="01" i2="1" l="ENG"><s1>PSE 2002: Plasma Surface Engineering. Conference</s1>
<s2>8</s2>
<s3>Garmisch-Partenkirchen DEU</s3>
<s4>2002-09-09</s4>
</fA30><server><NO>PASCAL 04-0503490 INIST</NO>
<ET>Reactive magnetron sputtering as a way to improve the knowledge of metastable f.c.c. nitrogen solid solutions formed during plasma assisted nitriding of Inconel 690</ET>
<AU>CZERWIEC (T.); HE (H.); SAKER (A.); TRAN HUU (L.); DONG (C.); FRANTZ (C.); MICHEL (H.); BRÄUER (G.); CAMERON (D.); RIE (K.-T.); BEWILOGUA (K.); OEHR (C.); REICHEL (K.); RICARD (A.); SUCHENTRUNK (R.)</AU>
<AF>Laboratoire de Science et Génie des Surfaces (UMR CNRS 7570), Ecole des Mines, Parc de Saurupt/54042 Nancy/France (1 aut., 2 aut., 4 aut., 6 aut., 7 aut.); State Key Laboratory for Materials Modification by Laser Ion and Electron Beams, Dalian University of Technology/Dalian 116024/Chine (2 aut., 5 aut.); Département de Physique de l'Université Badji Mokhtar, BP 12 El Hadjar/Annaba/Algérie (3 aut.)</AF>
<DT>Publication en série; Congrès; Niveau analytique</DT>
<SO>Surface & coatings technology; ISSN 0257-8972; Coden SCTEEJ; Suisse; Da. 2003; Vol. 174-75; Pp. 131-138; Bibl. 28 ref.</SO>
<LA>Anglais</LA>
<EA>Low temperature plasma assisted nitriding (PAN) treatments of Inconel 690 (a nickel base alloy with a 30 wt.% chromium content) produce a complex layer constituted by two different metastable f.c.c. solid solutions denoted (γ<sub>N1</sub>
and γ<sub>N2</sub>
). In addition, different layer thicknesses are observed for differently oriented grains. Reactive magnetron sputtering (RMS) of Inconel 690 in argon-nitrogen containing mixtures is used to produce homogeneous films constituted by a well defined γ<sub>N</sub>
phase. In reactive conditions, the as-deposited coatings (T< 100 °C) containing up to 30 at.% of nitrogen are nanocrystalline supersaturated f.c.c. solid solution (γ<sub>N</sub>
) with a grain size lying between 3 and 7.5 nm. A comparison between the products synthesized by these two techniques (PAN and RMS) is presented in this study. The formation of γ<sub>N</sub>
phases in low temperature PAN is discussed in the light of electron backscatter diffraction measurements and by comparison with X-ray diffraction patterns of RMS coatings. By using the results obtained in situ by RMS on heated substrates and by tempering of as-deposited films, the decomposition products of the γ<sub>N</sub>
phase at high temperature (>450 °C) or long PAN treatments at 400 °C are identified to be f.c.c. CrN and γ(Ni,Fe) depleted in nitrogen.</EA><CC>001D11C06; 240</CC>
<FD>Traitement surface; Plasma</FD>
<ED>Surface treatment; Plasma</ED>
<GD>Oberflaechenbehandlung; Plasma</GD>
<SD>Tratamiento superficie; Plasma</SD>
<LO>INIST-15987.354000119149920210</LO>
<ID>04-0503490</ID>
</server>
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