0040-6031 < 0040-6090 < 0041-3763

Facettes :

List of bibliographic references indexed by 0040-6090

Number of relevant bibliographic references: 21.
[0-20] [0 - 20][0 - 21][20-20][20-40]

Ident.	Authors (with country if any)	Title
000095 (2014)	M. Hemmous [Algérie] ; A. Layadi [Algérie] ; A. Guittoum [Algérie] ; N. Souami [Algérie] ; M. Mebarki [Algérie] ; N. Menni [Algérie]	Structure, surface morphology and electrical properties of evaporated Ni thin films: Effect of substrates, thickness and Cu underlayer
000098 (2014)	I. Sta [Tunisie] ; M. Jlassi [Tunisie] ; M. Hajji [Tunisie] ; H. Ezzaouia [Tunisie]	Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method
000261 (2012)	M. Boudard [France] ; C. Girardot [France] ; N. Ihzaz [France, Tunisie] ; S. Pignard [France] ; L. Rapenne [France] ; H. Roussel [France] ; A. Bartasyte [France]	X-ray and transmission electron microscopy structural characterization of multifunctional Perovskite thin films
000347 (2011)	M. Boukelkoul [Algérie] ; A. Haroun [Algérie]	Structural, magnetic and magneto-optical properties of ultrathin films of nickel on iridium (001)
000414 (2010)	Z. Beji [France, Tunisie] ; L. S. Smiri [Tunisie] ; M.-J. Vaulay [France] ; F. Herbst [France] ; S. Ammar [France] ; F. Fievet [France]	Nanocrystalline Ni0.8Zn0.2Fe2O4 films prepared by spray deposition from polyol-mediated sol: Microstructural and magnetic characterization
000578 (2008)	A. Saker [Algérie] ; H. He [France, République populaire de Chine] ; T. Czerwiec [France] ; X. Li [République populaire de Chine] ; L. Tran Huu [France] ; C. Dong [République populaire de Chine] ; H. Michel [France] ; C. Frantz [France]	Reactive magnetron sputtering of Inconel 690 by Ar-N2 plasma
000711 (2006)	M. Charbonnier [France] ; M. Romand [France] ; Y. Goepfert [France] ; D. Leonard [France] ; F. Bessueille [France] ; M. Bouadi [Algérie]	Palladium (+2) reduction : A key step for the electroless Ni metallization of insulating substrates by a tin-free process
000955 (2003)	R. Ben Chaabane [Tunisie] ; A. Ltaief [Tunisie] ; C. Dridi [Tunisie] ; H. Rahmouni [Tunisie] ; A. Bouazizi [Tunisie] ; H. Ben Ouada [Tunisie]	Study of organic thin film transistors based on nickel phthalocyanine: effect of annealing
000A78 (2001)	K. Lahem [Algérie] ; R. Cherfi [Algérie] ; M. Aoucher [Algérie]	Hydrogen interaction on metal/hydrogenated amorphous silicon Schottky structures: adsorption/desorption effects
000A80 (2001)	H. Lassri [Maroc] ; H. Ouahmane [Maroc] ; H. El Fanity [Maroc] ; M. Bouanani [Maroc] ; F. Cherkaoui [Maroc] ; A. Berrada [Maroc]	Ferromagnetic resonance studies of electrodeposited Ni/Cu multilayers
000B01 (2001)	K. Laïhem [Algérie] ; R. Cherfi [Algérie] ; M. Aoucher [Algérie]	Hydrogen interaction on metal/hydrogenated amorphous silicon schottky structures: adsorption/desorption effects
000D92 (1997)	R. Ben Chaabane [France] ; G. Guillaud [France] ; M. Gamoudi [France]	Study of the electrical properties of thin film transistors based on nickel phthalocyanine
000E41 (1996)	A. A. Benmassaoud [Maroc] ; R. W. Paynter [Canada]	Influence of the power and pressure on the growth rate and refractive index of a-C:H thin films deposited by r.f. plasma-enhanced chemical vapour deposition
000F77 (1994)	S. Kacim [Maroc] ; P. Delcambe [Belgique] ; L. Binst [Belgique] ; M. Jardinier-Offergeld [Belgique] ; F. Bouillon [Belgique]	Structural behavior of direct-current sputtered and thermally evaporated molybdenum thin films
000F89 (1994)	J. Crousier [France] ; Z. Hanane [Maroc] ; J-P. Crousier [France]	Electrodeposition of NiP amorphous alloys. A multilayer structure
001154 (1991)		Contents of volume 202
001264 (1989)		Contents of vol. 170
001314 (1988)		Contents of vol. 156
001400 (1986)	B. Nciri [France] ; L. Vandenbulcke [France]	Theoretical and experimental study of the aluminization of iron and steel in the pack and in the gas phase
001528 (1983)		Contents to volume 109
001731 (1974)	M. Hubin [France] ; J. Gouault [France]	Resistivity and thermoelectric power between -100 °C and +100 °C of gold and silver thin films formed and studied in ultrahigh vacuum

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