Etching of Si(111) by SF plasma in a triode RF (13.56 MHz) multipolar reactor
Identifieur interne : 001056 ( Main/Exploration ); précédent : 001055; suivant : 001057Etching of Si(111) by SF plasma in a triode RF (13.56 MHz) multipolar reactor
Auteurs :Source :
- Journal of Physics D: Applied Physics [ 0022-3727 ] ; 1993-09-14.
Url:
DOI: 10.1088/0022-3727/26/9/028
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