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Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate

Identifieur interne : 001396 ( Istex/Corpus ); précédent : 001395; suivant : 001397

Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate

Auteurs : A. Mzerd ; D. Sayah ; G. Brun ; J. C. Tedenac ; A. Boyer

Source :

RBID : ISTEX:397BA38C533A317C81EF7715614D355466111705
Url:
DOI: 10.1007/BF00318254

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ISTEX:397BA38C533A317C81EF7715614D355466111705

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<topic>Polymer Sciences</topic>
<topic>Industrial Chemistry/Chemical Engineering</topic>
<topic>Mechanics</topic>
<topic>Materials Processing, Characterization, and Design</topic>
</subject>
<identifier type="ISSN">0261-8028</identifier>
<identifier type="eISSN">1573-4811</identifier>
<identifier type="JournalID">10855</identifier>
<identifier type="IssueArticleCount">27</identifier>
<identifier type="VolumeIssueCount">24</identifier>
<part>
<date>1995</date>
<detail type="volume">
<number>14</number>
<caption>vol.</caption>
</detail>
<detail type="issue">
<number>3</number>
<caption>no.</caption>
</detail>
<extent unit="pages">
<start>194</start>
<end>197</end>
</extent>
</part>
<recordInfo>
<recordOrigin>Chapman & Hall, 1995</recordOrigin>
</recordInfo>
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<identifier type="istex">397BA38C533A317C81EF7715614D355466111705</identifier>
<identifier type="DOI">10.1007/BF00318254</identifier>
<identifier type="ArticleID">BF00318254</identifier>
<identifier type="ArticleID">Art17</identifier>
<accessCondition type="use and reproduction" contentType="copyright">Chapman & Hall, 1995</accessCondition>
<recordInfo>
<recordContentSource>SPRINGER</recordContentSource>
<recordOrigin>Chapman & Hall, 1995</recordOrigin>
</recordInfo>
</mods>
</metadata>
<serie></serie>
</istex>
</record>

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