Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate
Identifieur interne : 001396 ( Istex/Corpus ); précédent : 001395; suivant : 001397Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate
Auteurs : A. Mzerd ; D. Sayah ; G. Brun ; J. C. Tedenac ; A. BoyerSource :
- Journal of Materials Science Letters [ 0261-8028 ] ; 1995-01-01.
Url:
DOI: 10.1007/BF00318254
Links to Exploration step
ISTEX:397BA38C533A317C81EF7715614D355466111705Le document en format XML
<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate</title>
<author><name sortKey="Mzerd, A" sort="Mzerd, A" uniqKey="Mzerd A" first="A." last="Mzerd">A. Mzerd</name>
<affiliation><mods:affiliation>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Sayah, D" sort="Sayah, D" uniqKey="Sayah D" first="D." last="Sayah">D. Sayah</name>
<affiliation><mods:affiliation>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Brun, G" sort="Brun, G" uniqKey="Brun G" first="G." last="Brun">G. Brun</name>
<affiliation><mods:affiliation>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Tedenac, J C" sort="Tedenac, J C" uniqKey="Tedenac J" first="J. C." last="Tedenac">J. C. Tedenac</name>
<affiliation><mods:affiliation>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Boyer, A" sort="Boyer, A" uniqKey="Boyer A" first="A." last="Boyer">A. Boyer</name>
<affiliation><mods:affiliation>Centre d'Electronique de Montpellier, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</mods:affiliation>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">ISTEX</idno>
<idno type="RBID">ISTEX:397BA38C533A317C81EF7715614D355466111705</idno>
<date when="1995" year="1995">1995</date>
<idno type="doi">10.1007/BF00318254</idno>
<idno type="url">https://api.istex.fr/document/397BA38C533A317C81EF7715614D355466111705/fulltext/pdf</idno>
<idno type="wicri:Area/Istex/Corpus">001396</idno>
<idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">001396</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title level="a" type="main" xml:lang="en">Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate</title>
<author><name sortKey="Mzerd, A" sort="Mzerd, A" uniqKey="Mzerd A" first="A." last="Mzerd">A. Mzerd</name>
<affiliation><mods:affiliation>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Sayah, D" sort="Sayah, D" uniqKey="Sayah D" first="D." last="Sayah">D. Sayah</name>
<affiliation><mods:affiliation>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Brun, G" sort="Brun, G" uniqKey="Brun G" first="G." last="Brun">G. Brun</name>
<affiliation><mods:affiliation>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Tedenac, J C" sort="Tedenac, J C" uniqKey="Tedenac J" first="J. C." last="Tedenac">J. C. Tedenac</name>
<affiliation><mods:affiliation>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Boyer, A" sort="Boyer, A" uniqKey="Boyer A" first="A." last="Boyer">A. Boyer</name>
<affiliation><mods:affiliation>Centre d'Electronique de Montpellier, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</mods:affiliation>
</affiliation>
</author>
</analytic>
<monogr></monogr>
<series><title level="j">Journal of Materials Science Letters</title>
<title level="j" type="abbrev">J Mater Sci Lett</title>
<idno type="ISSN">0261-8028</idno>
<idno type="eISSN">1573-4811</idno>
<imprint><publisher>Kluwer Academic Publishers</publisher>
<pubPlace>Dordrecht</pubPlace>
<date type="published" when="1995-01-01">1995-01-01</date>
<biblScope unit="volume">14</biblScope>
<biblScope unit="issue">3</biblScope>
<biblScope unit="page" from="194">194</biblScope>
<biblScope unit="page" to="197">197</biblScope>
</imprint>
<idno type="ISSN">0261-8028</idno>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><idno type="ISSN">0261-8028</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass></textClass>
<langUsage><language ident="en">en</language>
</langUsage>
</profileDesc>
</teiHeader>
</TEI>
<istex><corpusName>springer</corpusName>
<keywords><teeft><json:string>substrate temperature</json:string>
<json:string>flux ratio</json:string>
<json:string>stoichiometry</json:string>
<json:string>bi2te</json:string>
<json:string>tellurium</json:string>
<json:string>semiconductor</json:string>
<json:string>epitaxy</json:string>
<json:string>atomic ratio</json:string>
<json:string>deposition rates</json:string>
<json:string>quartz balance</json:string>
<json:string>recent years</json:string>
<json:string>thin films</json:string>
<json:string>single crystal</json:string>
<json:string>surface morphology</json:string>
<json:string>higher angles</json:string>
<json:string>residual strain</json:string>
<json:string>good agreement</json:string>
<json:string>film composition</json:string>
<json:string>molecular beam epitaxy</json:string>
<json:string>previous results</json:string>
</teeft>
</keywords>
<author><json:item><name>A. Mzerd</name>
<affiliations><json:string>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</json:string>
</affiliations>
</json:item>
<json:item><name>D. Sayah</name>
<affiliations><json:string>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</json:string>
</affiliations>
</json:item>
<json:item><name>G. Brun</name>
<affiliations><json:string>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</json:string>
</affiliations>
</json:item>
<json:item><name>J. C. Tedenac</name>
<affiliations><json:string>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</json:string>
</affiliations>
</json:item>
<json:item><name>A. Boyer</name>
<affiliations><json:string>Centre d'Electronique de Montpellier, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</json:string>
</affiliations>
</json:item>
</author>
<articleId><json:string>BF00318254</json:string>
<json:string>Art17</json:string>
</articleId>
<language><json:string>eng</json:string>
</language>
<originalGenre><json:string>OriginalPaper</json:string>
</originalGenre>
<qualityIndicators><score>2.086</score>
<pdfVersion>1.3</pdfVersion>
<pdfPageSize>598 x 843 pts</pdfPageSize>
<refBibsNative>false</refBibsNative>
<keywordCount>0</keywordCount>
<abstractCharCount>0</abstractCharCount>
<pdfWordCount>2074</pdfWordCount>
<pdfCharCount>9907</pdfCharCount>
<pdfPageCount>4</pdfPageCount>
<abstractWordCount>1</abstractWordCount>
</qualityIndicators>
<title>Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate</title>
<genre><json:string>research-article</json:string>
</genre>
<host><volume>14</volume>
<pages><last>197</last>
<first>194</first>
</pages>
<issn><json:string>0261-8028</json:string>
</issn>
<issue>3</issue>
<subject><json:item><value>Polymer Sciences</value>
</json:item>
<json:item><value>Industrial Chemistry/Chemical Engineering</value>
</json:item>
<json:item><value>Mechanics</value>
</json:item>
<json:item><value>Materials Processing, Characterization, and Design</value>
</json:item>
</subject>
<journalId><json:string>10855</json:string>
</journalId>
<genre><json:string>journal</json:string>
</genre>
<language><json:string>unknown</json:string>
</language>
<eissn><json:string>1573-4811</json:string>
</eissn>
<title>Journal of Materials Science Letters</title>
<publicationDate>1995</publicationDate>
<copyrightDate>1995</copyrightDate>
</host>
<categories><wos></wos>
<scienceMetrix><json:string>applied sciences</json:string>
<json:string>enabling & strategic technologies</json:string>
<json:string>materials</json:string>
</scienceMetrix>
</categories>
<publicationDate>1995</publicationDate>
<copyrightDate>1995</copyrightDate>
<doi><json:string>10.1007/BF00318254</json:string>
</doi>
<id>397BA38C533A317C81EF7715614D355466111705</id>
<score>1</score>
<fulltext><json:item><extension>pdf</extension>
<original>true</original>
<mimetype>application/pdf</mimetype>
<uri>https://api.istex.fr/document/397BA38C533A317C81EF7715614D355466111705/fulltext/pdf</uri>
</json:item>
<json:item><extension>zip</extension>
<original>false</original>
<mimetype>application/zip</mimetype>
<uri>https://api.istex.fr/document/397BA38C533A317C81EF7715614D355466111705/fulltext/zip</uri>
</json:item>
<istex:fulltextTEI uri="https://api.istex.fr/document/397BA38C533A317C81EF7715614D355466111705/fulltext/tei"><teiHeader><fileDesc><titleStmt><title level="a" type="main" xml:lang="en">Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate</title>
</titleStmt>
<publicationStmt><authority>ISTEX</authority>
<publisher>Kluwer Academic Publishers</publisher>
<pubPlace>Dordrecht</pubPlace>
<availability><p>Chapman & Hall, 1995</p>
</availability>
<date>1994-05-11</date>
</publicationStmt>
<sourceDesc><biblStruct type="inbook"><analytic><title level="a" type="main" xml:lang="en">Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate</title>
<author xml:id="author-0000"><persName><forename type="first">A.</forename>
<surname>Mzerd</surname>
</persName>
<affiliation>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</affiliation>
</author>
<author xml:id="author-0001"><persName><forename type="first">D.</forename>
<surname>Sayah</surname>
</persName>
<affiliation>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</affiliation>
</author>
<author xml:id="author-0002"><persName><forename type="first">G.</forename>
<surname>Brun</surname>
</persName>
<affiliation>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</affiliation>
</author>
<author xml:id="author-0003"><persName><forename type="first">J.</forename>
<surname>Tedenac</surname>
</persName>
<affiliation>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</affiliation>
</author>
<author xml:id="author-0004"><persName><forename type="first">A.</forename>
<surname>Boyer</surname>
</persName>
<affiliation>Centre d'Electronique de Montpellier, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</affiliation>
</author>
<idno type="istex">397BA38C533A317C81EF7715614D355466111705</idno>
<idno type="DOI">10.1007/BF00318254</idno>
<idno type="ArticleID">BF00318254</idno>
<idno type="ArticleID">Art17</idno>
</analytic>
<monogr><title level="j">Journal of Materials Science Letters</title>
<title level="j" type="abbrev">J Mater Sci Lett</title>
<idno type="pISSN">0261-8028</idno>
<idno type="eISSN">1573-4811</idno>
<idno type="journal-ID">true</idno>
<idno type="issue-article-count">27</idno>
<idno type="volume-issue-count">24</idno>
<imprint><publisher>Kluwer Academic Publishers</publisher>
<pubPlace>Dordrecht</pubPlace>
<date type="published" when="1995-01-01"></date>
<biblScope unit="volume">14</biblScope>
<biblScope unit="issue">3</biblScope>
<biblScope unit="page" from="194">194</biblScope>
<biblScope unit="page" to="197">197</biblScope>
</imprint>
</monogr>
</biblStruct>
</sourceDesc>
</fileDesc>
<profileDesc><creation><date>1994-05-11</date>
</creation>
<langUsage><language ident="en">en</language>
</langUsage>
<textClass><keywords scheme="Journal Subject"><list><head>Engineering</head>
<item><term>Polymer Sciences</term>
</item>
<item><term>Industrial Chemistry/Chemical Engineering</term>
</item>
<item><term>Mechanics</term>
</item>
<item><term>Materials Processing, Characterization, and Design</term>
</item>
</list>
</keywords>
</textClass>
</profileDesc>
<revisionDesc><change when="1994-05-11">Created</change>
<change when="1995-01-01">Published</change>
</revisionDesc>
</teiHeader>
</istex:fulltextTEI>
<json:item><extension>txt</extension>
<original>false</original>
<mimetype>text/plain</mimetype>
<uri>https://api.istex.fr/document/397BA38C533A317C81EF7715614D355466111705/fulltext/txt</uri>
</json:item>
</fulltext>
<metadata><istex:metadataXml wicri:clean="Springer, Publisher found" wicri:toSee="no header"><istex:xmlDeclaration>version="1.0" encoding="UTF-8"</istex:xmlDeclaration>
<istex:docType PUBLIC="-//Springer-Verlag//DTD A++ V2.4//EN" URI="http://devel.springer.de/A++/V2.4/DTD/A++V2.4.dtd" name="istex:docType"></istex:docType>
<istex:document><Publisher><PublisherInfo><PublisherName>Kluwer Academic Publishers</PublisherName>
<PublisherLocation>Dordrecht</PublisherLocation>
</PublisherInfo>
<Journal><JournalInfo JournalProductType="ArchiveJournal" NumberingStyle="Unnumbered"><JournalID>10855</JournalID>
<JournalPrintISSN>0261-8028</JournalPrintISSN>
<JournalElectronicISSN>1573-4811</JournalElectronicISSN>
<JournalTitle>Journal of Materials Science Letters</JournalTitle>
<JournalAbbreviatedTitle>J Mater Sci Lett</JournalAbbreviatedTitle>
<JournalSubjectGroup><JournalSubject Type="Primary">Engineering</JournalSubject>
<JournalSubject Type="Secondary">Polymer Sciences</JournalSubject>
<JournalSubject Type="Secondary">Industrial Chemistry/Chemical Engineering</JournalSubject>
<JournalSubject Type="Secondary">Mechanics</JournalSubject>
<JournalSubject Type="Secondary">Materials Processing, Characterization, and Design</JournalSubject>
</JournalSubjectGroup>
</JournalInfo>
<Volume><VolumeInfo VolumeType="Regular" TocLevels="0"><VolumeIDStart>14</VolumeIDStart>
<VolumeIDEnd>14</VolumeIDEnd>
<VolumeIssueCount>24</VolumeIssueCount>
</VolumeInfo>
<Issue IssueType="Regular"><IssueInfo TocLevels="0"><IssueIDStart>3</IssueIDStart>
<IssueIDEnd>3</IssueIDEnd>
<IssueArticleCount>27</IssueArticleCount>
<IssueHistory><CoverDate><DateString>1 February 1995</DateString>
<Year>1995</Year>
<Month>1</Month>
</CoverDate>
</IssueHistory>
<IssueCopyright><CopyrightHolderName>Chapman & Hall</CopyrightHolderName>
<CopyrightYear>1995</CopyrightYear>
</IssueCopyright>
</IssueInfo>
<Article ID="Art17"><ArticleInfo Language="En" ArticleType="OriginalPaper" NumberingStyle="Unnumbered" TocLevels="0" ContainsESM="No"><ArticleID>BF00318254</ArticleID>
<ArticleDOI>10.1007/BF00318254</ArticleDOI>
<ArticleSequenceNumber>17</ArticleSequenceNumber>
<ArticleTitle Language="En">Crystal growth and sticking coefficient of Bi<Subscript>2</Subscript>
Te<Subscript>3</Subscript>
thin films on Si(1 1 1) substrate</ArticleTitle>
<ArticleFirstPage>194</ArticleFirstPage>
<ArticleLastPage>197</ArticleLastPage>
<ArticleHistory><RegistrationDate><Year>2004</Year>
<Month>8</Month>
<Day>26</Day>
</RegistrationDate>
<Received><Year>1994</Year>
<Month>5</Month>
<Day>11</Day>
</Received>
<Accepted><Year>1994</Year>
<Month>10</Month>
<Day>4</Day>
</Accepted>
</ArticleHistory>
<ArticleCopyright><CopyrightHolderName>Chapman & Hall</CopyrightHolderName>
<CopyrightYear>1995</CopyrightYear>
</ArticleCopyright>
<ArticleGrants Type="Regular"><MetadataGrant Grant="OpenAccess"></MetadataGrant>
<AbstractGrant Grant="OpenAccess"></AbstractGrant>
<BodyPDFGrant Grant="Restricted"></BodyPDFGrant>
<BodyHTMLGrant Grant="Restricted"></BodyHTMLGrant>
<BibliographyGrant Grant="Restricted"></BibliographyGrant>
<ESMGrant Grant="Restricted"></ESMGrant>
</ArticleGrants>
<ArticleContext><JournalID>10855</JournalID>
<VolumeIDStart>14</VolumeIDStart>
<VolumeIDEnd>14</VolumeIDEnd>
<IssueIDStart>3</IssueIDStart>
<IssueIDEnd>3</IssueIDEnd>
</ArticleContext>
</ArticleInfo>
<ArticleHeader><AuthorGroup><Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>A.</GivenName>
<FamilyName>Mzerd</FamilyName>
</AuthorName>
</Author>
<Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>D.</GivenName>
<FamilyName>Sayah</FamilyName>
</AuthorName>
</Author>
<Author AffiliationIDS="Aff2"><AuthorName DisplayOrder="Western"><GivenName>G.</GivenName>
<FamilyName>Brun</FamilyName>
</AuthorName>
</Author>
<Author AffiliationIDS="Aff2"><AuthorName DisplayOrder="Western"><GivenName>J.</GivenName>
<GivenName>C.</GivenName>
<FamilyName>Tedenac</FamilyName>
</AuthorName>
</Author>
<Author AffiliationIDS="Aff3"><AuthorName DisplayOrder="Western"><GivenName>A.</GivenName>
<FamilyName>Boyer</FamilyName>
</AuthorName>
</Author>
<Affiliation ID="Aff1"><OrgDivision>Faculty of Sciences, Physics Department</OrgDivision>
<OrgName>Med V University</OrgName>
<OrgAddress><City>Rabat</City>
<Country>Morocco</Country>
</OrgAddress>
</Affiliation>
<Affiliation ID="Aff2"><OrgName>Laboratoire de Physico-Chimie des Matériaux</OrgName>
<OrgAddress><Street>Place Eugène Bataillon</Street>
<Postcode>34095</Postcode>
<City>Montpellier Cédex 5</City>
<Country>France</Country>
</OrgAddress>
</Affiliation>
<Affiliation ID="Aff3"><OrgName>Centre d'Electronique de Montpellier</OrgName>
<OrgAddress><Street>Place Eugène Bataillon</Street>
<Postcode>34095</Postcode>
<City>Montpellier Cédex 5</City>
<Country>France</Country>
</OrgAddress>
</Affiliation>
</AuthorGroup>
</ArticleHeader>
<NoBody></NoBody>
</Article>
</Issue>
</Volume>
</Journal>
</Publisher>
</istex:document>
</istex:metadataXml>
<mods version="3.6"><titleInfo lang="en"><title>Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate</title>
</titleInfo>
<titleInfo type="alternative" contentType="CDATA" lang="en"><title>Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate</title>
</titleInfo>
<name type="personal"><namePart type="given">A.</namePart>
<namePart type="family">Mzerd</namePart>
<affiliation>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">D.</namePart>
<namePart type="family">Sayah</namePart>
<affiliation>Faculty of Sciences, Physics Department, Med V University, Rabat, Morocco</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">G.</namePart>
<namePart type="family">Brun</namePart>
<affiliation>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">J.</namePart>
<namePart type="given">C.</namePart>
<namePart type="family">Tedenac</namePart>
<affiliation>Laboratoire de Physico-Chimie des Matériaux, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">A.</namePart>
<namePart type="family">Boyer</namePart>
<affiliation>Centre d'Electronique de Montpellier, Place Eugène Bataillon, 34095, Montpellier Cédex 5, France</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<typeOfResource>text</typeOfResource>
<genre type="research-article" displayLabel="OriginalPaper"></genre>
<originInfo><publisher>Kluwer Academic Publishers</publisher>
<place><placeTerm type="text">Dordrecht</placeTerm>
</place>
<dateCreated encoding="w3cdtf">1994-05-11</dateCreated>
<dateIssued encoding="w3cdtf">1995-01-01</dateIssued>
<copyrightDate encoding="w3cdtf">1995</copyrightDate>
</originInfo>
<language><languageTerm type="code" authority="rfc3066">en</languageTerm>
<languageTerm type="code" authority="iso639-2b">eng</languageTerm>
</language>
<physicalDescription><internetMediaType>text/html</internetMediaType>
</physicalDescription>
<relatedItem type="host"><titleInfo><title>Journal of Materials Science Letters</title>
</titleInfo>
<titleInfo type="abbreviated"><title>J Mater Sci Lett</title>
</titleInfo>
<genre type="journal" displayLabel="Archive Journal"></genre>
<originInfo><dateIssued encoding="w3cdtf">1995-01-01</dateIssued>
<copyrightDate encoding="w3cdtf">1995</copyrightDate>
</originInfo>
<subject><genre>Engineering</genre>
<topic>Polymer Sciences</topic>
<topic>Industrial Chemistry/Chemical Engineering</topic>
<topic>Mechanics</topic>
<topic>Materials Processing, Characterization, and Design</topic>
</subject>
<identifier type="ISSN">0261-8028</identifier>
<identifier type="eISSN">1573-4811</identifier>
<identifier type="JournalID">10855</identifier>
<identifier type="IssueArticleCount">27</identifier>
<identifier type="VolumeIssueCount">24</identifier>
<part><date>1995</date>
<detail type="volume"><number>14</number>
<caption>vol.</caption>
</detail>
<detail type="issue"><number>3</number>
<caption>no.</caption>
</detail>
<extent unit="pages"><start>194</start>
<end>197</end>
</extent>
</part>
<recordInfo><recordOrigin>Chapman & Hall, 1995</recordOrigin>
</recordInfo>
</relatedItem>
<identifier type="istex">397BA38C533A317C81EF7715614D355466111705</identifier>
<identifier type="DOI">10.1007/BF00318254</identifier>
<identifier type="ArticleID">BF00318254</identifier>
<identifier type="ArticleID">Art17</identifier>
<accessCondition type="use and reproduction" contentType="copyright">Chapman & Hall, 1995</accessCondition>
<recordInfo><recordContentSource>SPRINGER</recordContentSource>
<recordOrigin>Chapman & Hall, 1995</recordOrigin>
</recordInfo>
</mods>
</metadata>
<serie></serie>
</istex>
</record>
Pour manipuler ce document sous Unix (Dilib)
EXPLOR_STEP=$WICRI_ROOT/Wicri/Terre/explor/NickelMaghrebV1/Data/Istex/Corpus
HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 001396 | SxmlIndent | more
Ou
HfdSelect -h $EXPLOR_AREA/Data/Istex/Corpus/biblio.hfd -nk 001396 | SxmlIndent | more
Pour mettre un lien sur cette page dans le réseau Wicri
{{Explor lien |wiki= Wicri/Terre |area= NickelMaghrebV1 |flux= Istex |étape= Corpus |type= RBID |clé= ISTEX:397BA38C533A317C81EF7715614D355466111705 |texte= Crystal growth and sticking coefficient of Bi2Te3 thin films on Si(1 1 1) substrate }}
This area was generated with Dilib version V0.6.27. |