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Semiconducting properties of passive films formed on nickel–base alloys type Alloy 600: influence of the alloying elements

Identifieur interne : 000449 ( Istex/Corpus ); précédent : 000448; suivant : 000450

Semiconducting properties of passive films formed on nickel–base alloys type Alloy 600: influence of the alloying elements

Auteurs : M. Da Cunha Belo ; N. E Hakiki ; M. G. S Ferreira

Source :

RBID : ISTEX:C287F63BD279D547DFFBEAE47B7AB6180AA1357C

Abstract

The semiconducting properties of passive films formed on nickel–base alloys type Alloy 600 in borate buffer solution were studied by capacitance measurements and photoelectrochemistry. The influence of the alloying elements (Fe, Ni, Cr) on the film properties was examined using pure metals and pure alloys. The results obtained show that the presence of both chromium and mixed nickel–iron oxides in the films revealed by quantitative analysis develops a p-n heterojunction that controls their electronic structure, in a similar manner to the case of stainless steels. The nickel oxide present in the films acts as a barrier layer that confers improved protection. The relationship between the electronic structure and the physicochemical properties of the passive film are discussed.

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DOI: 10.1016/S0013-4686(98)00372-7

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<div type="abstract" xml:lang="en">The semiconducting properties of passive films formed on nickel–base alloys type Alloy 600 in borate buffer solution were studied by capacitance measurements and photoelectrochemistry. The influence of the alloying elements (Fe, Ni, Cr) on the film properties was examined using pure metals and pure alloys. The results obtained show that the presence of both chromium and mixed nickel–iron oxides in the films revealed by quantitative analysis develops a p-n heterojunction that controls their electronic structure, in a similar manner to the case of stainless steels. The nickel oxide present in the films acts as a barrier layer that confers improved protection. The relationship between the electronic structure and the physicochemical properties of the passive film are discussed.</div>
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<note type="content">Fig. 1: Potentiodynamic plots of Alloy 600 and 304 stainless steel. The inset presents the I=f(U) curves of the main alloying elements.</note>
<note type="content">Fig. 2: Potentiodynamic curves of high purity Ni–15Cr and Ni–15Cr–8Fe alloys in borate buffer solution.</note>
<note type="content">Fig. 3: Chemical composition depth profiles of the passive film formed on Alloy 600 at 0.3 V.</note>
<note type="content">Fig. 4: Chemical composition depth profiles of the passive films formed on pure alloys at 0.3 V. (a) 50Ni–17Cr–33Fe alloy. (b) 40Ni–17Cr–43Fe alloy.</note>
<note type="content">Fig. 5: Plots of 1/C2 versus the applied potential, U, for passive films formed at 0.3 V on Alloy 600 and 304 stainless steel.</note>
<note type="content">Fig. 6: Plots of C vs. the applied potential, U, for films formed on Alloy 600, AISI 304 and Ni at 0.3 V.</note>
<note type="content">Fig. 7: Plots of C−2 vs. the applied potential, U, for the passive film formed on Alloy 600 subtracted from the capacitance of the nickel passive film. Comparison is made with the capacitance behavior of the film formed on 304 stainless steel.</note>
<note type="content">Fig. 8: Plots of C−2 vs. the applied potential, U, for passive films formed on nickel, chromium and Ni–Cr alloys.</note>
<note type="content">Fig. 9: Plots of C−2 vs. the applied potential, U, for passive films formed on nickel, iron and Ni–8Fe alloy.</note>
<note type="content">Fig. 10: Plots of C−2 vs. the applied potential, U, for passive films formed on pure Ni–15Cr and Ni–15Cr–8Fe alloys.</note>
<note type="content">Fig. 11: Variation of the capacitance C in the flatband potential region with the iron and nickel concentrations for the passive films formed on Fe–Ni–Cr alloys with 17Cr and various Ni/Fe ratios.</note>
<note type="content">Fig. 12: Plots of (ηhν)0.5 vs. incident light energy, hν, for passive films formed at 0.3 V on both 304 stainless steel and Alloy 600.</note>
<note type="content">Fig. 13: C−2 vs. U plots and the respective flatband potentials obtained for the passive films formed on pure chromium and Fe–20Cr alloy. The passive films are previously formed by polarization at 0.3 V (2 h).</note>
<note type="content">Fig. 14: C−2 vs. U plots for passive films formed at 0.3 V on the different alloying elements (Fe, Ni, Cr).</note>
<note type="content">Table 1: Composition of the commercial alloys (wt%)</note>
<note type="content">Table 2: Estimated thickness (Å) of the space charge layers formed on the two oxide regions of the passive film</note>
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<ce:simple-para>The semiconducting properties of passive films formed on nickel–base alloys type Alloy 600 in borate buffer solution were studied by capacitance measurements and photoelectrochemistry. The influence of the alloying elements (Fe, Ni, Cr) on the film properties was examined using pure metals and pure alloys. The results obtained show that the presence of both chromium and mixed nickel–iron oxides in the films revealed by quantitative analysis develops a p-n heterojunction that controls their electronic structure, in a similar manner to the case of stainless steels. The nickel oxide present in the films acts as a barrier layer that confers improved protection. The relationship between the electronic structure and the physicochemical properties of the passive film are discussed.</ce:simple-para>
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<ce:keywords class="keyword">
<ce:section-title>Keywords</ce:section-title>
<ce:keyword>
<ce:text>Alloy 600</ce:text>
</ce:keyword>
<ce:keyword>
<ce:text>Passive films</ce:text>
</ce:keyword>
<ce:keyword>
<ce:text>Mott–Schottky plots</ce:text>
</ce:keyword>
<ce:keyword>
<ce:text>AES</ce:text>
</ce:keyword>
<ce:keyword>
<ce:text>Photoelectrochemistry</ce:text>
</ce:keyword>
</ce:keywords>
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<title>Semiconducting properties of passive films formed on nickel–base alloys type Alloy 600: influence of the alloying elements</title>
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<title>Semiconducting properties of passive films formed on nickel–base alloys type Alloy 600: influence of the alloying elements</title>
</titleInfo>
<name type="personal">
<namePart type="given">M</namePart>
<namePart type="family">Da Cunha Belo</namePart>
<affiliation>Departamento Engenharia Quı́mica, Instituto Superior Técnico, Av. Rovisco Pais, 1049-001 Lisboa, Portugal</affiliation>
<affiliation>1 e-mail: pcmarfer@alfa.ist.utl.pt</affiliation>
<role>
<roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal">
<namePart type="given">N.E</namePart>
<namePart type="family">Hakiki</namePart>
<affiliation>Laboratoire d'Optique des Couches Minces, Institut de Physique, Université d'Oran, Es-senia 31100, Algeria</affiliation>
<affiliation>2 e-mail: hakiki@elbahia.cerist.dz</affiliation>
<role>
<roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal">
<namePart type="given">M.G.S</namePart>
<namePart type="family">Ferreira</namePart>
<affiliation>Departamento Engenharia Quı́mica, Instituto Superior Técnico, Av. Rovisco Pais, 1049-001 Lisboa, Portugal</affiliation>
<affiliation>Corresponding author. Tel.: +351-1-841-7234; fax: +351-1-8404 589; e-mail: pcmarfer@alfa.ist.utl.pt</affiliation>
<role>
<roleTerm type="text">author</roleTerm>
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<publisher>ELSEVIER</publisher>
<dateIssued encoding="w3cdtf">1999</dateIssued>
<copyrightDate encoding="w3cdtf">1999</copyrightDate>
</originInfo>
<language>
<languageTerm type="code" authority="iso639-2b">eng</languageTerm>
<languageTerm type="code" authority="rfc3066">en</languageTerm>
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<internetMediaType>text/html</internetMediaType>
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<abstract lang="en">The semiconducting properties of passive films formed on nickel–base alloys type Alloy 600 in borate buffer solution were studied by capacitance measurements and photoelectrochemistry. The influence of the alloying elements (Fe, Ni, Cr) on the film properties was examined using pure metals and pure alloys. The results obtained show that the presence of both chromium and mixed nickel–iron oxides in the films revealed by quantitative analysis develops a p-n heterojunction that controls their electronic structure, in a similar manner to the case of stainless steels. The nickel oxide present in the films acts as a barrier layer that confers improved protection. The relationship between the electronic structure and the physicochemical properties of the passive film are discussed.</abstract>
<note type="content">Fig. 1: Potentiodynamic plots of Alloy 600 and 304 stainless steel. The inset presents the I=f(U) curves of the main alloying elements.</note>
<note type="content">Fig. 2: Potentiodynamic curves of high purity Ni–15Cr and Ni–15Cr–8Fe alloys in borate buffer solution.</note>
<note type="content">Fig. 3: Chemical composition depth profiles of the passive film formed on Alloy 600 at 0.3 V.</note>
<note type="content">Fig. 4: Chemical composition depth profiles of the passive films formed on pure alloys at 0.3 V. (a) 50Ni–17Cr–33Fe alloy. (b) 40Ni–17Cr–43Fe alloy.</note>
<note type="content">Fig. 5: Plots of 1/C2 versus the applied potential, U, for passive films formed at 0.3 V on Alloy 600 and 304 stainless steel.</note>
<note type="content">Fig. 6: Plots of C vs. the applied potential, U, for films formed on Alloy 600, AISI 304 and Ni at 0.3 V.</note>
<note type="content">Fig. 7: Plots of C−2 vs. the applied potential, U, for the passive film formed on Alloy 600 subtracted from the capacitance of the nickel passive film. Comparison is made with the capacitance behavior of the film formed on 304 stainless steel.</note>
<note type="content">Fig. 8: Plots of C−2 vs. the applied potential, U, for passive films formed on nickel, chromium and Ni–Cr alloys.</note>
<note type="content">Fig. 9: Plots of C−2 vs. the applied potential, U, for passive films formed on nickel, iron and Ni–8Fe alloy.</note>
<note type="content">Fig. 10: Plots of C−2 vs. the applied potential, U, for passive films formed on pure Ni–15Cr and Ni–15Cr–8Fe alloys.</note>
<note type="content">Fig. 11: Variation of the capacitance C in the flatband potential region with the iron and nickel concentrations for the passive films formed on Fe–Ni–Cr alloys with 17Cr and various Ni/Fe ratios.</note>
<note type="content">Fig. 12: Plots of (ηhν)0.5 vs. incident light energy, hν, for passive films formed at 0.3 V on both 304 stainless steel and Alloy 600.</note>
<note type="content">Fig. 13: C−2 vs. U plots and the respective flatband potentials obtained for the passive films formed on pure chromium and Fe–20Cr alloy. The passive films are previously formed by polarization at 0.3 V (2 h).</note>
<note type="content">Fig. 14: C−2 vs. U plots for passive films formed at 0.3 V on the different alloying elements (Fe, Ni, Cr).</note>
<note type="content">Table 1: Composition of the commercial alloys (wt%)</note>
<note type="content">Table 2: Estimated thickness (Å) of the space charge layers formed on the two oxide regions of the passive film</note>
<subject>
<genre>Keywords</genre>
<topic>Alloy 600</topic>
<topic>Passive films</topic>
<topic>Mott–Schottky plots</topic>
<topic>AES</topic>
<topic>Photoelectrochemistry</topic>
</subject>
<relatedItem type="host">
<titleInfo>
<title>Electrochimica Acta</title>
</titleInfo>
<titleInfo type="abbreviated">
<title>EA</title>
</titleInfo>
<genre type="journal">journal</genre>
<originInfo>
<dateIssued encoding="w3cdtf">19990301</dateIssued>
</originInfo>
<identifier type="ISSN">0013-4686</identifier>
<identifier type="PII">S0013-4686(00)X0093-X</identifier>
<part>
<date>19990301</date>
<detail type="volume">
<number>44</number>
<caption>vol.</caption>
</detail>
<detail type="issue">
<number>14</number>
<caption>no.</caption>
</detail>
<extent unit="issue pages">
<start>2336</start>
<end>2506</end>
</extent>
<extent unit="pages">
<start>2473</start>
<end>2481</end>
</extent>
</part>
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<identifier type="istex">C287F63BD279D547DFFBEAE47B7AB6180AA1357C</identifier>
<identifier type="DOI">10.1016/S0013-4686(98)00372-7</identifier>
<identifier type="PII">S0013-4686(98)00372-7</identifier>
<accessCondition type="use and reproduction" contentType="copyright">©1999 Elsevier Science Ltd</accessCondition>
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<recordContentSource>ELSEVIER</recordContentSource>
<recordOrigin>Elsevier Science Ltd, ©1999</recordOrigin>
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