A. Katsuta < A. Katz < A. Katzenmeyer

Facettes :

List of bibliographic references

Number of relevant bibliographic references: 43.
[0-20] [0 - 20][0 - 43][20-40]

Ident.	Authors (with country if any)	Title
01DC99 (1993)		Dry and wet etching characteristics of InN, AlN, and GaN deposited by electron cyclotron resonance metalorganic molecular beam epitaxy
01DD08 (1994)		Advanced metallization schemes for bondong of InP-based laser devices to CVD-diamond heatsinks
01E261 (1994)		New dry-etch chemistries for III-V semiconductors
01E982 (1994)		Bonding of InP laser diodes by Au-Sn solder and tungsten-based barrier metallization schemes
01F073 (1994-01-01)		Au-Sn/W and Au-Sn/Cr metallized chemical vapor deposited diamond heat sinks for InP laser device applications
01F550 (1993)		Growth of InP epitaxial layers by rapid thermal low pressure metalorganic chemical vapor deposition, using tertiarybutylphosphine
01F642 (1993)		Optical emission spectroscopy of electron cyclotron resonance discharges for III-V semiconductor processing
01F686 (1993)		Rapid thermal low pressure metalorganic chemical vapor deposition of In0.53Ga0.47As films using tertiarylbutylarsine
01F738 (1993)		Low-temperature rapid thermal low pressure metalorganic chemical vapor deposition of Zn-doped InP layers using tertiarybutylphosphine
01F893 (1993)		W(Zn) selectively deposited and locally diffused ohmic contacts to p-InGaAs/InP formed by rapid thermal low pressure metalorganic chemical vapor deposition
01FD45 (1993)		Dry etching of via connections for InP power devices
01FD55 (1993)		High temperature rapid thermal annealing of InP and related materials
01FE77 (1993)		Rapid thermal low-pressure metalorganic chemical vapour deposition of local diffused W(Zn) contacts
020814 (1993)		Dry etching of thin-film InN, AlN and GaN
020B40 (1992)		Single wafer integrated processes by RT-LPMOCVD modules : application in the manufacturing of InP-based laser devices
020C38 (1992)		Plasma etching of III-V semiconductor thin films
021234 (1992)		Study of Ni as a barrier metal in AuSn soldering application for laser chip/submout assembly
021258 (1991)		Comparison of CH4/H2/Ar reactive ion etching and electron cyclotron resonance plasma etching of In-based III-V alloys
021965 (1992)		Hydrogen iodide-based dry etching of GaAs, InP, and related compounds
021C70 (1992)		New high-rate dry etch mixure for InP-based heterostructures
021D51 (1990)		Tungsten metallization for stable and self-aligned InP-based laser devices

---

Pour manipuler ce document sous Unix (Dilib)

EXPLOR_STEP=IndiumV3/Data/Main/Corpus

HfdIndexSelect -h $EXPLOR_AREA/Data/Main/Corpus/Author.i -k "A. Katz" 

HfdIndexSelect -h $EXPLOR_AREA/Data/Main/Corpus/Author.i  \
                -Sk "A. Katz" \
         | HfdSelect -Kh $EXPLOR_AREA/Data/Main/Corpus/biblio.hfd 

Pour mettre un lien sur cette page dans le réseau Wicri

{{Explor lien
   |wiki=   *** parameter Area/wikiCode missing *** 
   |area=    IndiumV3
   |flux=    Main
   |étape=   Corpus
   |type=    indexItem
   |index=    Author.i
   |clé=    A. Katz
}}

---

This area was generated with Dilib version V0.5.77. Data generation: Mon Jun 9 10:27:54 2014. Site generation: Thu Mar 7 16:19:59 2024