Serveur d'exploration sur l'Indium - Analysis (Chine)

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Reactive ion etching < Reactive sputtering < Reactivity  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 24.
[0-20] [0 - 20][0 - 24][20-23][20-40]
Ident.Authors (with country if any)Title
000924 (2011) Cu-In-O composite thin films deposited by reactive DC magnetron sputtering
000D27 (2009) Structure and optical properties of ZnO:V thin films with different doping concentrations
000E57 (2009) Formation of p-type ZnMgO thin films by In-N codoping method
001029 (2008) Structure and electrical properties of CdIn2O4 thin films prepared by DC reactive magnetron sputtering
001117 (2008) Indium oxide thin film transistors via reactive sputtering using metal targets
001199 (2008) Dependence of electrical and optical properties on thickness of tungsten-doped indium oxide thin films
001319 (2007) Properties of indium-doped ZnO films prepared in an oxygen-rich plasma
001464 (2007) Controlled growth of nanostructured III-nitride films via a reactive magnetron sputtering method
001506 (2006) Transparent conductive In2O3:Mo thin films prepared by reactive direct current magnetron sputtering at room temperature
001555 (2006) Separated AlxIn1-xN quantum dots grown by plasma-reactive co-sputtering
001708 (2005) The electrical and optical properties of molybdenum-doped indium oxide films grown at room temperature from metallic target
001756 (2005) Post-growth treatment effects on properties of CuInS2 thin films deposited by RF reactive sputtering
001759 (2005) Point-defects-induced band edge displacements and band-gap narrowing in CdIn2O4 thin films
001978 (2004) Optical and electrical properties of InN thin films grown by reactive magnetron sputtering
001984 (2004) Micro-raman study of hexagonal InN thin films grown by reactive sputtering on GaAs
001B60 (2003) Piezoelectric coefficient of InN thin films prepared by magnetron sputtering
001B88 (2003) Influence of the preparation conditions on the properties of CuInS2 films deposited by one-stage RF reactive sputtering
001C27 (2003) Deposition of CuInS2 thin films by RF reactive sputtering with a ZnO:Al buffer layer
001D38 (2002) Self-assembled large-scale and cylindrical CuInSe2 quantum dots on indium tin oxide films
001F29 (2001) Internal stress and adhesive strength of reactive magnetron sputtered indium tin oxide films on acrylics
001F57 (2001) Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

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