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Serveur d'exploration sur l'Indium - Analysis (Chine)

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Film resistor < Films < Fine grain structure  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 16.
Ident.Authors (with country if any)Title
000A29 (2010) Super-aligned carbon nanotube films as aligning layers and transparent electrodes for liquid crystal displays
001534 (2006) Surfactant functionalization of carbon nanotubes (CNTs) for layer-by-layer assembling of CNT multi-layer films and fabrication of gold nanoparticle/CNT nanohybrid
001580 (2006) Optical properties of InN films grown by molecular beam epitaxy at different conditions
001703 (2005) Thermal annealing of InN films grown by metal-organic chemical vapor deposition
001709 (2005) The effect of the AlxGa1-xN/AIN buffer layer on the properties of GaN/Si(111) film grown by NH3-MBE
001710 (2005) The effect of hydrothermal growth temperature on preparation and photoelectrochemical performance of ZnO nanorod array films
001748 (2005) Raman and photoluminescence studies on nanocrystalline ZnO grown on GaInPAs substrates
001759 (2005) Point-defects-induced band edge displacements and band-gap narrowing in CdIn2O4 thin films
001779 (2005) Magnetron sputtering growth of InAs0.3Sb0.7 films on (100) GaAs substrates : Strong effect of growth conditions on film structure
001793 (2005) Influence of post-heat treatment on the properties of CuInS2 thin films deposited by an ion layer gas reaction (ILGAR)
001814 (2005) Growth and characterization of InGaN blue LED structure on Si(111) by MOCVD
001838 (2005) Dendritic europium complex as a single dopant for white-light electroluminescent devices
001B90 (2003) In0.25Ga0.75As growth on low-temperature thin buffer layers formed on GaAs (001) substrate
001F29 (2001) Internal stress and adhesive strength of reactive magnetron sputtered indium tin oxide films on acrylics
002496 (1997) Preparation and properties of indium tin oxide films deposited on polyester substrates by reactive evaporation
002601 (1996) Optimization of the deposition process parameters for preparation of In2O3 films by reactive evaporation of indium metal

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