Serveur d'exploration sur l'Indium - Analysis (Chine)

Index « Auteurs » - entrée « P. Han »
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P. H. Lu < P. Han < P. Hannaford  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 8.
Ident.Authors (with country if any)Title
000165 (2013) Obvious improvement of light extraction obtained by anodic aluminum oxide coverage on GaN surface
000520 (2012) Growth and characterization of InGaN nanodots hybrid with InGaN/GaN quantum wells
000B75 (2010) Electron concentration dependence of exciton localization and freeze-out at local potential fluctuations in InN films
001211 (2008) Circular photogalvanic effect at inter-band excitation in InN
001265 (2007) The high mobility InN film grown by MOCVD with GaN buffer layer
001501 (2006) Two-dimensional electron gas densities in AlGaN/AlN/GaN heterostructures
001513 (2006) Theoretical study of improved two-dimensional electron gas density in AlGaN/GaN/AlGaN double heterostructure
001865 (2005) A novel InxGa1-xN/InN heterostructure field-effect transistor with extremely high two-dimensional electron-gas sheet density

List of associated KwdEn.i

Nombre de
documents
Descripteur
4Indium nitride
4Photoluminescence
3Gallium nitrides
3Heterostructures
3III-V semiconductors
3Indium nitrides
3Inorganic compounds
3Poisson equation
2Aluminium nitrides
2Barrier layer
2Buffer layer
2Carrier density
2Electronic properties
2Energy gap
2Gallium nitride
2III-V compound
2MOCVD
2Quantum wells
2Schroedinger equation
2Self consistency
2Semiconductor materials
2Thin films
2Two-dimensional electron gas
1Absorption edge
1Absorption spectra
1Aluminium
1Ambient temperature
1Annealing
1Anodic oxide
1Anodizing
1Atomic force microscopy
1Band structure
1Binary compounds
1Comparative study
1Compressive stress
1Computing method
1Conduction band
1Coverage rate
1Critical phenomena
1Crystal structure
1Doping profile
1Electrical characteristic
1Electrical properties
1Electron distribution
1Electron gas model
1Electron interaction
1Electronic structure
1Experimental result
1Field effect transistor
1Field effect transistors
1Fluctuations
1Gallium Nitrides
1Gallium compound
1Hall mobility
1Helicity
1Incidence angle
1Indium Nitrides
1Indium compound
1Indium compounds
1Infrared spectra
1Interband transitions
1Interfacial layer
1Laser radiation
1Line widths
1Localized exciton
1Microscopic model
1Mirrors
1Molecular beam epitaxy
1Multiple quantum well
1Nanodot
1Nanostructures
1Nitrogen compounds
1Operating conditions
1Optical absorption
1Phase separation
1Phenomenological model
1Photovoltaic effects
1Polarization mode
1Porosity
1Radiation effects
1Sapphire
1Scanning electron microscopy
1Schrödinger equation
1Spectral line shift
1Spin polarized transport
1Strained layer
1Temperature dependence
1Ternary compounds
1Thickness
1Two dimensional model
1VPE
1Wafers
1Waveform
1XRD

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HfdIndexSelect -h $EXPLOR_AREA/Data/Chine/Analysis/Author.i  \
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