Serveur d'exploration sur l'Indium - Analysis (Chine)

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DABIN YU < DABING LI < DACHENG LU  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 10.
Ident.Authors (with country if any)Title
000805 (2011) Influence of thermal annealing duration of buffer layer on the crystalline quality of In0.82Ga0.18As grown on InP substrate by LP-MOCVD
000808 (2011) Influence of buffer layer thickness and epilayer's growth temperature on crystalline quality of InAs0.6P0.4/InP grown by LP-MOCVD
000907 (2011) Effect of buffer layer annealing temperature on the crystalline quality of In0.82Ga0.18As layers grown by two-step growth method
000C01 (2010) Effect of epilayer's growth temperature on crystalline quality of In As0.6P0.4/InP grown by two-step growth method
000E20 (2009) Investigation on growth related aspects of catalyst-free InP nanowires grown by metal organic chemical vapor deposition
001952 (2004) Structural and optical properties of 3D growth multilayer InGaN/GaN quantum dots by metalorganic chemical vapor deposition
001A29 (2004) Dislocation scattering in a two-dimensional electron gas of an AlxGa1-xN/GaN heterostructure
001A34 (2004) Crack-free InAlGaN quaternary alloy films grown on Si(1 1 1) substrate by metalorganic chemical vapor deposition
001B46 (2003) Structural and optical properties of InAlGaN films grown directly on low-temperature buffer layer with (0 0 0 1) sapphire substrate
001D36 (2002) Strain relaxation of InP film directly grown on GaAs patterned compliant substrate

List of associated KwdEn.i

Nombre de
documents
Descripteur
8MOCVD
6Buffer layer
6Photoluminescence
6XRD
4Crystal growth from vapors
4Epitaxial layers
4Experimental study
4Gallium nitrides
4Hall effect
4III-V semiconductors
4Indium nitrides
4Low pressure
4Scanning electron microscopy
3Aluminium nitrides
3Atomic force microscopy
3Semiconductor materials
3Thin films
2CVD
2Dislocations
2Gallium Indium Arsenides Mixed
2Gallium arsenides
2Indium phosphide
2Mismatch lattice
2Morphology
2Nanostructures
2Quantum dots
2Stress relaxation
2Ternary compounds
1Activation energy
1Annealing
1Band structure
1Binary compounds
1Carrier mobility
1Characterization
1Charge carriers
1Charge transfer
1Compliance
1Crystal perfection
1Deposition process
1Droplets
1Electron-defect interactions
1Energy dispersive spectroscopy
1Film growth
1Growth mechanism
1Growth rate
1Heat treatments
1Heteroepitaxy
1Heterojunctions
1Heterostructures
1III-V compound
1Indium arsenides
1Indium phosphides
1Inorganic compounds
1Localized exciton
1Low temperature
1MOVPE method
1Molecular beam epitaxy
1Monocrystals
1Multilayers
1Nanotechnology
1Nanowires
1Optical microscopy
1Passivation
1Patterning
1Phosphides
1Poisson equation
1Potential well
1Pretreatment
1Quantity ratio
1Quaternary compounds
1RBS
1Radiative recombination
1Raman scattering
1Raman spectra
1Recrystallization
1Residual stresses
1Scanning force microscopy
1Schroedinger equation
1Self consistency
1Square-well potential
1Stacking sequence
1Subband
1Substrates
1Surface morphology
1Surface structure
1Surface treatments
1Surfaces
1Temperature dependence
1Thermal annealing
1Thermal stresses
1Thickness
1Transmission electron microscopy
1Two-dimensional electron gas
1VPE
1Wave functions

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