Serveur d'exploration sur l'Indium

Attention, ce site est en cours de développement !
Attention, site généré par des moyens informatiques à partir de corpus bruts.
Les informations ne sont donc pas validées.

Eléments de l'association

ZHIMING LI9
Hall effect80
ZHIMING LI Sauf Hall effect" 4
Hall effect Sauf ZHIMING LI" 75
ZHIMING LI Et Hall effect 5
ZHIMING LI Ou Hall effect 84
Corpus4194
\n\n\n\n \n

List of bibliographic references

Number of relevant bibliographic references: 5.
Ident.Authors (with country if any)Title
000808 Influence of buffer layer thickness and epilayer's growth temperature on crystalline quality of InAs0.6P0.4/InP grown by LP-MOCVD
000907 Effect of buffer layer annealing temperature on the crystalline quality of In0.82Ga0.18As layers grown by two-step growth method
000C01 Effect of epilayer's growth temperature on crystalline quality of In As0.6P0.4/InP grown by two-step growth method
000F05 Effect of buffer thickness on properties of In0.8Ga0.2As/InP with two-step growth technique
000F62 A study of two-step growth and properties of In0.82Ga0.18As on InP

Wicri

This area was generated with Dilib version V0.5.77.
Data generation: Mon Jun 9 10:27:54 2014. Site generation: Thu Mar 7 16:19:59 2024