Serveur d'exploration sur l'Indium

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QING WAN And NotLamellar structure

List of bibliographic references

Number of relevant bibliographic references: 19.
Ident.Authors (with country if any)Title
000066 Transparent Junctionless Thin-Film Transistors With Tunable Operation Mode
000067 Transparent Junctionless Electric-Double-Layer Transistors Gated by a Reinforced Chitosan-Based Biopolymer Electrolyte
000094 Synaptic Behaviors Mimicked in Flexible Oxide-Based Transistors on Plastic Substrates
000114 Short-Term Memory to Long-Term Memory Transition Mimicked in IZO Homojunction Synaptic Transistors
000248 Flexible Transparent Junctionless TFTs With Oxygen-Tuned Indium-Zinc-Oxide Channels
000249 Flexible Dual-Gate Oxide TFTs Gated by Chitosan Film on Paper Substrates
000362 Transparent In-Plane-Gate Junctionless Oxide-Based TFTs Directly Written by Laser Scribing
000475 Low-Voltage Junctionless Oxide-Based Thin-Film Transistors Self-Assembled by a Gradient Shadow Mask
000482 Junctionless Flexible Oxide-Based Thin-Film Transistors on Paper Substrates
000655 Ultralow-Voltage Transparent In2O3 Nanowire Electric-Double-Layer Transistors
000721 Self-Assembled Ultralow-Voltage Flexible Transparent Thin-Film Transistors Gated by SiO2-Based Solid Electrolyte
000786 Low-Voltage Transparent Indium-Zinc-Oxide Coplanar Homojunction TFTs Self-Assembled on Inorganic Proton Conductors
000787 Low-Voltage Organic/Inorganic Hybrid Transparent Thin-Film Transistors Gated by Chitosan-Based Proton Conductors
000788 Low-Voltage Electric-Double-Layer TFTs on SiO2-Covered Paper Substrates
000944 Anomalous Threshold Voltage Shift and Surface Passivation of Transparent Indium-Zinc-Oxide Electric-Double-Layer TFTs
000979 Vertical Oxide Homojunction TFTs of 0.8 V Gated by H3PO4-Treated Si02 Nanogranular Dielectric
000A83 One-Shadow-Mask Self-Assembled Ultralow-Voltage Coplanar Homojunction Thin-Film Transistors
000B19 Influence of the channel layer thickness on electrical properties of indium zinc oxide thin-film transistor
000B65 Enhancement of electrical performance in In2O3 thin-film transistors by improving the densification and surface morphology of channel layers

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