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Microstructural characterization of high indium-composition InXGa₁-XN epilayers grown on c-plane sapphire substrates.

Identifieur interne : 000546 ( Main/Exploration ); précédent : 000545; suivant : 000547

Microstructural characterization of high indium-composition InXGa₁-XN epilayers grown on c-plane sapphire substrates.

Auteurs : RBID : pubmed:23920194

Abstract

The growth of high-quality indium (In)-rich In(X)Ga(1-X)N alloys is technologically important for applications to attain highly efficient green light-emitting diodes and solar cells. However, phase separation and composition modulation in In-rich In(X )Ga(1-X)N alloys are inevitable phenomena that degrade the crystal quality of In-rich In(X)Ga(1-X)N layers. Composition modulations were observed in the In-rich In(X)Ga(1-X)N layers with various In compositions. The In composition modulation in the In X Ga1-X N alloys formed in samples with In compositions exceeding 47%. The misfit strain between the InGaN layer and the GaN buffer retarded the composition modulation, which resulted in the formation of modulated regions 100 nm above the In(0.67)Ga(0.33)N/GaN interface. The composition modulations were formed on the specific crystallographic planes of both the {0001} and {0114} planes of InGaN.

DOI: 10.1017/S143192761301252X
PubMed: 23920194

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<name sortKey="Lee, Jeong Yong" uniqKey="Lee J">Jeong Yong Lee</name>
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<name sortKey="Yang, Jun Mo" uniqKey="Yang J">Jun-Mo Yang</name>
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<div type="abstract" xml:lang="en">The growth of high-quality indium (In)-rich In(X)Ga(1-X)N alloys is technologically important for applications to attain highly efficient green light-emitting diodes and solar cells. However, phase separation and composition modulation in In-rich In(X )Ga(1-X)N alloys are inevitable phenomena that degrade the crystal quality of In-rich In(X)Ga(1-X)N layers. Composition modulations were observed in the In-rich In(X)Ga(1-X)N layers with various In compositions. The In composition modulation in the In X Ga1-X N alloys formed in samples with In compositions exceeding 47%. The misfit strain between the InGaN layer and the GaN buffer retarded the composition modulation, which resulted in the formation of modulated regions 100 nm above the In(0.67)Ga(0.33)N/GaN interface. The composition modulations were formed on the specific crystallographic planes of both the {0001} and {0114} planes of InGaN.</div>
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