Preparation of nano-polycrystalline WO3 thin films and their solid-state electrochromic display devices.
Identifieur interne : 000456 ( Main/Exploration ); précédent : 000455; suivant : 000457Preparation of nano-polycrystalline WO3 thin films and their solid-state electrochromic display devices.
Auteurs : RBID : pubmed:23646640Abstract
In this paper, nano-polycrystalline WO3 thin films with the thickness in the range of 100-200 nm have been uniformly prepared on the designed regions of ITO (indium tin oxide) glass substrates by thermal evaporation deposition. Their crystal structures, surface morphologies and uniformities are investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM), respectively. The solid-state electrochromic display (ECD) devices based on these nano-polycrystalline WO3 thin films have been also fabricated and have demonstrated to have better performance than normal thin films, including shorter response time, higher contrast, and furthermore, higher stability to keep the colored state without power consumption. These results demonstrate nano-polycrystalline WO3 thin films can be applied to improve the performance of ECD devices, especially suitable to static display.
PubMed: 23646640
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en">Preparation of nano-polycrystalline WO3 thin films and their solid-state electrochromic display devices.</title><author><name sortKey="Luo, Jianyi" uniqKey="Luo J">Jianyi Luo</name><affiliation wicri:level="1"><nlm:affiliation>Institute of Thin Film and Nano Materials, School of Applied Physics and Materials, Wuyi University, Jiangmen, Guangdong 529020, China.</nlm:affiliation><country xml:lang="fr">République populaire de Chine</country><wicri:regionArea>Institute of Thin Film and Nano Materials, School of Applied Physics and Materials, Wuyi University, Jiangmen, Guangdong 529020</wicri:regionArea></affiliation></author><author><name sortKey="Zeng, Qingguang" uniqKey="Zeng Q">Qingguang Zeng</name></author><author><name sortKey="Long, Yongbing" uniqKey="Long Y">Yongbing Long</name></author><author><name sortKey="Wang, Yi" uniqKey="Wang Y">Yi Wang</name></author></titleStmt><publicationStmt><date when="2013">2013</date><idno type="RBID">pubmed:23646640</idno><idno type="pmid">23646640</idno><idno type="wicri:Area/Main/Corpus">000636</idno><idno type="wicri:Area/Main/Curation">000636</idno><idno type="wicri:Area/Main/Exploration">000456</idno></publicationStmt></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">In this paper, nano-polycrystalline WO3 thin films with the thickness in the range of 100-200 nm have been uniformly prepared on the designed regions of ITO (indium tin oxide) glass substrates by thermal evaporation deposition. Their crystal structures, surface morphologies and uniformities are investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM), respectively. The solid-state electrochromic display (ECD) devices based on these nano-polycrystalline WO3 thin films have been also fabricated and have demonstrated to have better performance than normal thin films, including shorter response time, higher contrast, and furthermore, higher stability to keep the colored state without power consumption. These results demonstrate nano-polycrystalline WO3 thin films can be applied to improve the performance of ECD devices, especially suitable to static display.</div></front></TEI><pubmed><MedlineCitation Owner="NLM" Status="PubMed-not-MEDLINE"><PMID Version="1">23646640</PMID><DateCreated><Year>2013</Year><Month>05</Month><Day>07</Day></DateCreated><DateCompleted><Year>2013</Year><Month>06</Month><Day>19</Day></DateCompleted><Article PubModel="Print"><Journal><ISSN IssnType="Print">1533-4880</ISSN><JournalIssue CitedMedium="Print"><Volume>13</Volume><Issue>2</Issue><PubDate><Year>2013</Year><Month>Feb</Month></PubDate></JournalIssue><Title>Journal of nanoscience and nanotechnology</Title><ISOAbbreviation>J Nanosci Nanotechnol</ISOAbbreviation></Journal><ArticleTitle>Preparation of nano-polycrystalline WO3 thin films and their solid-state electrochromic display devices.</ArticleTitle><Pagination><MedlinePgn>1372-6</MedlinePgn></Pagination><Abstract><AbstractText>In this paper, nano-polycrystalline WO3 thin films with the thickness in the range of 100-200 nm have been uniformly prepared on the designed regions of ITO (indium tin oxide) glass substrates by thermal evaporation deposition. Their crystal structures, surface morphologies and uniformities are investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM), respectively. The solid-state electrochromic display (ECD) devices based on these nano-polycrystalline WO3 thin films have been also fabricated and have demonstrated to have better performance than normal thin films, including shorter response time, higher contrast, and furthermore, higher stability to keep the colored state without power consumption. These results demonstrate nano-polycrystalline WO3 thin films can be applied to improve the performance of ECD devices, especially suitable to static display.</AbstractText></Abstract><AuthorList CompleteYN="Y"><Author ValidYN="Y"><LastName>Luo</LastName><ForeName>Jianyi</ForeName><Initials>J</Initials><Affiliation>Institute of Thin Film and Nano Materials, School of Applied Physics and Materials, Wuyi University, Jiangmen, Guangdong 529020, China.</Affiliation></Author><Author ValidYN="Y"><LastName>Zeng</LastName><ForeName>Qingguang</ForeName><Initials>Q</Initials></Author><Author ValidYN="Y"><LastName>Long</LastName><ForeName>Yongbing</ForeName><Initials>Y</Initials></Author><Author ValidYN="Y"><LastName>Wang</LastName><ForeName>Yi</ForeName><Initials>Y</Initials></Author></AuthorList><Language>eng</Language><PublicationTypeList><PublicationType>Journal Article</PublicationType></PublicationTypeList></Article><MedlineJournalInfo><Country>United States</Country><MedlineTA>J Nanosci Nanotechnol</MedlineTA><NlmUniqueID>101088195</NlmUniqueID><ISSNLinking>1533-4880</ISSNLinking></MedlineJournalInfo></MedlineCitation><PubmedData><History><PubMedPubDate PubStatus="entrez"><Year>2013</Year><Month>5</Month><Day>8</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="pubmed"><Year>2013</Year><Month>5</Month><Day>8</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="medline"><Year>2013</Year><Month>5</Month><Day>8</Day><Hour>6</Hour><Minute>1</Minute></PubMedPubDate></History><PublicationStatus>ppublish</PublicationStatus><ArticleIdList><ArticleId IdType="pubmed">23646640</ArticleId></ArticleIdList></PubmedData></pubmed></record>Pour manipuler ce document sous Unix (Dilib)
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