Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.
Identifieur interne : 000E29 ( Main/Corpus ); précédent : 000E28; suivant : 000E30Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.
Auteurs : RBID : pubmed:22414989Abstract
Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.
DOI: 10.1088/0957-4484/23/12/125707
PubMed: 22414989
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pubmed:22414989Le document en format XML
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<author><name sortKey="Tupala, Jere" uniqKey="Tupala J">Jere Tupala</name>
<affiliation><nlm:affiliation>Department of Chemistry, FI-00014 University of Helsinki, PO Box 55, Finland. jere.tupala@helsinki.fi</nlm:affiliation>
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<author><name sortKey="Kemell, Marianna" uniqKey="Kemell M">Marianna Kemell</name>
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<author><name sortKey="H Rk Nen, Emma" uniqKey="H Rk Nen E">Emma Härkönen</name>
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<author><name sortKey="Ritala, Mikko" uniqKey="Ritala M">Mikko Ritala</name>
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<author><name sortKey="Leskel, Markku" uniqKey="Leskel M">Markku Leskelä</name>
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<front><div type="abstract" xml:lang="en">Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.</div>
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<Title>Nanotechnology</Title>
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<ArticleTitle>Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.</ArticleTitle>
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<Abstract><AbstractText>Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.</AbstractText>
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