Serveur d'exploration sur le cobalt au Maghreb

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Effect of annealing on Zn1-xCoxO thin films prepared by electrodeposition

Identifieur interne : 000180 ( PascalFrancis/Curation ); précédent : 000179; suivant : 000181

Effect of annealing on Zn1-xCoxO thin films prepared by electrodeposition

Auteurs : A. El Manouni [Espagne, Maroc] ; M. Tortosa [Espagne] ; F. J. Manjon [Espagne] ; M. Mollar [Espagne] ; B. Mari [Espagne] ; J. F. Sanchez-Royo [Espagne]

Source :

RBID : Pascal:09-0135602

Descripteurs français

English descriptors

Abstract

Polycrystalline thin films of Zn1-xCoxO with different cobalt (Co) content were grown on indium tin oxide (ITO) substrates by cathodic electrodeposition technique and subsequently annealed in air at 400°C. The effect of annealing in their structural, optical and chemical properties has been characterized by X-ray diffraction (XRD), energy-dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), Raman scattering and optical spectroscopy. Our measurements indicate that moderate annealing increases the crystal quality of the films. The films are highly transparent in the visible range and evidence an increase of the band gap and of the intensity of three typical Co absorption bands in the visible with the amount of Co. Thermal annealing produces an increase of the intensity of the Co2+-related absorption bands revealing that higher amount of Co atoms are occupying Zn sites.
pA  
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A03   1    @0 Microelectronics j.
A05       @2 40
A06       @2 2
A08 01  1  ENG  @1 Effect of annealing on Zn1-xCoxO thin films prepared by electrodeposition
A09 01  1  ENG  @1 Wide Band Gap Semiconductor Nanostructures for Optoelectronic Applications
A11 01  1    @1 EL MANOUNI (A.)
A11 02  1    @1 TORTOSA (M.)
A11 03  1    @1 MANJON (F. J.)
A11 04  1    @1 MOLLAR (M.)
A11 05  1    @1 MARI (B.)
A11 06  1    @1 SANCHEZ-ROYO (J. F.)
A12 01  1    @1 LISCHKA (K.) @9 ed.
A12 02  1    @1 WAAG (A.) @9 ed.
A12 03  1    @1 MARIETTE (H.) @9 ed.
A12 04  1    @1 NEUGEBAUER (J.) @9 ed.
A14 01      @1 Departament de Física Aplicada-ETSED, Universitat Politècnica de València, Camí de Vera, s/n @2 46022 València @3 ESP @Z 1 aut. @Z 2 aut. @Z 3 aut. @Z 4 aut. @Z 5 aut.
A14 02      @1 Departament de Physique, Faculté des Sciences et Techniques, Université Hassan II @2 Mohammedia @3 MAR @Z 1 aut.
A14 03      @1 Departament de Física Aplicada-ICMUV, Universitat de València, C/Dr. Moliner 50 @2 46100 Burjassot, Valènda @3 ESP @Z 6 aut.
A15 01      @1 Department of Physics, University of Paderborn @2 33098 Paderborn @3 DEU @Z 1 aut. @Z 2 aut. @Z 3 aut. @Z 4 aut.
A20       @1 268-271
A21       @1 2009
A23 01      @0 ENG
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A47 01  1    @0 09-0135602
A60       @1 P @2 C
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C01 01    ENG  @0 Polycrystalline thin films of Zn1-xCoxO with different cobalt (Co) content were grown on indium tin oxide (ITO) substrates by cathodic electrodeposition technique and subsequently annealed in air at 400°C. The effect of annealing in their structural, optical and chemical properties has been characterized by X-ray diffraction (XRD), energy-dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), Raman scattering and optical spectroscopy. Our measurements indicate that moderate annealing increases the crystal quality of the films. The films are highly transparent in the visible range and evidence an increase of the band gap and of the intensity of three typical Co absorption bands in the visible with the amount of Co. Thermal annealing produces an increase of the intensity of the Co2+-related absorption bands revealing that higher amount of Co atoms are occupying Zn sites.
C02 01  X    @0 001D03F17
C03 01  X  FRE  @0 Recuit thermique @5 01
C03 01  X  ENG  @0 Thermal annealing @5 01
C03 01  X  SPA  @0 Recocido térmico @5 01
C03 02  X  FRE  @0 Dépôt électrolytique @5 02
C03 02  X  ENG  @0 Electrodeposition @5 02
C03 02  X  SPA  @0 Depósito electrolítico @5 02
C03 03  X  FRE  @0 Caractéristique optique @5 03
C03 03  X  ENG  @0 Optical characteristic @5 03
C03 03  X  SPA  @0 Característica óptica @5 03
C03 04  X  FRE  @0 Propriété chimique @5 04
C03 04  X  ENG  @0 Chemical properties @5 04
C03 04  X  SPA  @0 Propiedad química @5 04
C03 05  X  FRE  @0 Diffraction RX @5 05
C03 05  X  ENG  @0 X ray diffraction @5 05
C03 05  X  SPA  @0 Difracción RX @5 05
C03 06  X  FRE  @0 Dispersion énergie @5 06
C03 06  X  ENG  @0 Energy dispersion @5 06
C03 06  X  SPA  @0 Dispersión energía @5 06
C03 07  X  FRE  @0 Spectrométrie dispersive @5 07
C03 07  X  ENG  @0 Dispersive spectrometry @5 07
C03 07  X  SPA  @0 Espectrometría dispersiva @5 07
C03 08  3  FRE  @0 Spectre photoélectron RX @5 08
C03 08  3  ENG  @0 X-ray photoelectron spectra @5 08
C03 09  X  FRE  @0 Diffusion Raman @5 09
C03 09  X  ENG  @0 Raman scattering @5 09
C03 09  X  SPA  @0 Difusión Ramán @5 09
C03 10  X  FRE  @0 Spectrométrie optique @5 10
C03 10  X  ENG  @0 Optical spectrometry @5 10
C03 10  X  SPA  @0 Espectrometría óptica @5 10
C03 11  X  FRE  @0 Bande interdite @5 11
C03 11  X  ENG  @0 Energy gap @5 11
C03 11  X  SPA  @0 Banda prohibida @5 11
C03 12  X  FRE  @0 Bande absorption @5 12
C03 12  X  ENG  @0 Absorption band @5 12
C03 12  X  SPA  @0 Banda absorción @5 12
C03 13  X  FRE  @0 Couche mince @5 22
C03 13  X  ENG  @0 Thin film @5 22
C03 13  X  SPA  @0 Capa fina @5 22
C03 14  X  FRE  @0 Polycristal @5 23
C03 14  X  ENG  @0 Polycrystal @5 23
C03 14  X  SPA  @0 Policristal @5 23
C03 15  X  FRE  @0 Semiconducteur semimagnétique @5 24
C03 15  X  ENG  @0 Semimagnetic semiconductor @5 24
C03 15  X  SPA  @0 Semiconductor semimagnético @5 24
C03 16  X  FRE  @0 Fabrication microélectronique @5 31
C03 16  X  ENG  @0 Microelectronic fabrication @5 31
C03 16  X  SPA  @0 Fabricación microeléctrica @5 31
N21       @1 096
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pR  
A30 01  1  ENG  @1 Symposium G of the E-MRS conference @3 Strasbourg FRA @4 2008-05

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<div type="abstract" xml:lang="en">Polycrystalline thin films of Zn
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O with different cobalt (Co) content were grown on indium tin oxide (ITO) substrates by cathodic electrodeposition technique and subsequently annealed in air at 400°C. The effect of annealing in their structural, optical and chemical properties has been characterized by X-ray diffraction (XRD), energy-dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), Raman scattering and optical spectroscopy. Our measurements indicate that moderate annealing increases the crystal quality of the films. The films are highly transparent in the visible range and evidence an increase of the band gap and of the intensity of three typical Co absorption bands in the visible with the amount of Co. Thermal annealing produces an increase of the intensity of the Co
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<fA44>
<s0>0000</s0>
<s1>© 2009 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45>
<s0>31 ref.</s0>
</fA45>
<fA47 i1="01" i2="1">
<s0>09-0135602</s0>
</fA47>
<fA60>
<s1>P</s1>
<s2>C</s2>
</fA60>
<fA61>
<s0>A</s0>
</fA61>
<fA64 i1="01" i2="1">
<s0>Microelectronics journal</s0>
</fA64>
<fA66 i1="01">
<s0>GBR</s0>
</fA66>
<fC01 i1="01" l="ENG">
<s0>Polycrystalline thin films of Zn
<sub>1-x</sub>
Co
<sub>x</sub>
O with different cobalt (Co) content were grown on indium tin oxide (ITO) substrates by cathodic electrodeposition technique and subsequently annealed in air at 400°C. The effect of annealing in their structural, optical and chemical properties has been characterized by X-ray diffraction (XRD), energy-dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), Raman scattering and optical spectroscopy. Our measurements indicate that moderate annealing increases the crystal quality of the films. The films are highly transparent in the visible range and evidence an increase of the band gap and of the intensity of three typical Co absorption bands in the visible with the amount of Co. Thermal annealing produces an increase of the intensity of the Co
<sup>2+</sup>
-related absorption bands revealing that higher amount of Co atoms are occupying Zn sites.</s0>
</fC01>
<fC02 i1="01" i2="X">
<s0>001D03F17</s0>
</fC02>
<fC03 i1="01" i2="X" l="FRE">
<s0>Recuit thermique</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="X" l="ENG">
<s0>Thermal annealing</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="X" l="SPA">
<s0>Recocido térmico</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="X" l="FRE">
<s0>Dépôt électrolytique</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="X" l="ENG">
<s0>Electrodeposition</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="X" l="SPA">
<s0>Depósito electrolítico</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="X" l="FRE">
<s0>Caractéristique optique</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="ENG">
<s0>Optical characteristic</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="SPA">
<s0>Característica óptica</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="X" l="FRE">
<s0>Propriété chimique</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="ENG">
<s0>Chemical properties</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="SPA">
<s0>Propiedad química</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="X" l="FRE">
<s0>Diffraction RX</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="X" l="ENG">
<s0>X ray diffraction</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="X" l="SPA">
<s0>Difracción RX</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="X" l="FRE">
<s0>Dispersion énergie</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="X" l="ENG">
<s0>Energy dispersion</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="X" l="SPA">
<s0>Dispersión energía</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="X" l="FRE">
<s0>Spectrométrie dispersive</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="ENG">
<s0>Dispersive spectrometry</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="SPA">
<s0>Espectrometría dispersiva</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE">
<s0>Spectre photoélectron RX</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="3" l="ENG">
<s0>X-ray photoelectron spectra</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="X" l="FRE">
<s0>Diffusion Raman</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="X" l="ENG">
<s0>Raman scattering</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="X" l="SPA">
<s0>Difusión Ramán</s0>
<s5>09</s5>
</fC03>
<fC03 i1="10" i2="X" l="FRE">
<s0>Spectrométrie optique</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="X" l="ENG">
<s0>Optical spectrometry</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="X" l="SPA">
<s0>Espectrometría óptica</s0>
<s5>10</s5>
</fC03>
<fC03 i1="11" i2="X" l="FRE">
<s0>Bande interdite</s0>
<s5>11</s5>
</fC03>
<fC03 i1="11" i2="X" l="ENG">
<s0>Energy gap</s0>
<s5>11</s5>
</fC03>
<fC03 i1="11" i2="X" l="SPA">
<s0>Banda prohibida</s0>
<s5>11</s5>
</fC03>
<fC03 i1="12" i2="X" l="FRE">
<s0>Bande absorption</s0>
<s5>12</s5>
</fC03>
<fC03 i1="12" i2="X" l="ENG">
<s0>Absorption band</s0>
<s5>12</s5>
</fC03>
<fC03 i1="12" i2="X" l="SPA">
<s0>Banda absorción</s0>
<s5>12</s5>
</fC03>
<fC03 i1="13" i2="X" l="FRE">
<s0>Couche mince</s0>
<s5>22</s5>
</fC03>
<fC03 i1="13" i2="X" l="ENG">
<s0>Thin film</s0>
<s5>22</s5>
</fC03>
<fC03 i1="13" i2="X" l="SPA">
<s0>Capa fina</s0>
<s5>22</s5>
</fC03>
<fC03 i1="14" i2="X" l="FRE">
<s0>Polycristal</s0>
<s5>23</s5>
</fC03>
<fC03 i1="14" i2="X" l="ENG">
<s0>Polycrystal</s0>
<s5>23</s5>
</fC03>
<fC03 i1="14" i2="X" l="SPA">
<s0>Policristal</s0>
<s5>23</s5>
</fC03>
<fC03 i1="15" i2="X" l="FRE">
<s0>Semiconducteur semimagnétique</s0>
<s5>24</s5>
</fC03>
<fC03 i1="15" i2="X" l="ENG">
<s0>Semimagnetic semiconductor</s0>
<s5>24</s5>
</fC03>
<fC03 i1="15" i2="X" l="SPA">
<s0>Semiconductor semimagnético</s0>
<s5>24</s5>
</fC03>
<fC03 i1="16" i2="X" l="FRE">
<s0>Fabrication microélectronique</s0>
<s5>31</s5>
</fC03>
<fC03 i1="16" i2="X" l="ENG">
<s0>Microelectronic fabrication</s0>
<s5>31</s5>
</fC03>
<fC03 i1="16" i2="X" l="SPA">
<s0>Fabricación microeléctrica</s0>
<s5>31</s5>
</fC03>
<fN21>
<s1>096</s1>
</fN21>
<fN44 i1="01">
<s1>OTO</s1>
</fN44>
<fN82>
<s1>OTO</s1>
</fN82>
</pA>
<pR>
<fA30 i1="01" i2="1" l="ENG">
<s1>Symposium G of the E-MRS conference</s1>
<s3>Strasbourg FRA</s3>
<s4>2008-05</s4>
</fA30>
</pR>
</standard>
</inist>
</record>

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