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Structural properties of electrodeposited Co/Cu multilayers

Identifieur interne : 000318 ( PascalFrancis/Corpus ); précédent : 000317; suivant : 000319

Structural properties of electrodeposited Co/Cu multilayers

Auteurs : H. El Fanity ; K. Rahmouni ; M. Bouanani ; A. Dinia ; G. Shmerber ; C. Meny ; P. Panissod ; A. Cziraki ; F. Cherkaoui ; A. Berrada

Source :

RBID : Pascal:98-0339928

Descripteurs français

English descriptors

Abstract

Co/Cu multilayers have been grown by electrodeposition using a potentiostatic technique in a single electrolyte bath based on CoSO4, H3BO3 and CuSO4. X-ray diffraction performed on these multilayers have shown polycrystalline fcc structure of both Co and Cu layers with preferential (111) texture. Nuclear magnetic resonance spectrum has been recorded at 4.2 K on [Co(6 nm)/Cu(4 nm)]25 and has shown a resonance line at 216 MHz which confirms the fcc structure of Co layers. The analysis of the spectrum showed on one hand that the Co layers are not pure and contain approximately 1.5% of Cu, but on the other hand, the interfaces are of good quality. A cross-sectional on transmission electron micrograph showed a columnar growth morphology. Resistivity measurements performed on this sample presented a giant magnetoresistance (GMR) effect of about 4% at room temperature.

Notice en format standard (ISO 2709)

Pour connaître la documentation sur le format Inist Standard.

pA  
A01 01  1    @0 0040-6090
A02 01      @0 THSFAP
A03   1    @0 Thin solid films
A05       @2 318
A06       @2 1-2
A08 01  1  ENG  @1 Structural properties of electrodeposited Co/Cu multilayers
A11 01  1    @1 EL FANITY (H.)
A11 02  1    @1 RAHMOUNI (K.)
A11 03  1    @1 BOUANANI (M.)
A11 04  1    @1 DINIA (A.)
A11 05  1    @1 SHMERBER (G.)
A11 06  1    @1 MENY (C.)
A11 07  1    @1 PANISSOD (P.)
A11 08  1    @1 CZIRAKI (A.)
A11 09  1    @1 CHERKAOUI (F.)
A11 10  1    @1 BERRADA (A.)
A12 01  1    @1 RITTER (G.) @9 ed.
A12 02  1    @1 MATTHAI (C.) @9 ed.
A12 03  1    @1 TAKAI (O.) @9 ed.
A14 01      @1 Faculté des Sciences, B.P. 1014 @2 rabat @3 MAR @Z 1 aut. @Z 3 aut. @Z 9 aut. @Z 10 aut.
A14 02      @1 IPCMS-GEMM, UMR 46 CNRS-ULP, 23 Rue du Loess @2 67037 Strasbourg @3 FRA @Z 2 aut. @Z 4 aut. @Z 5 aut. @Z 6 aut. @Z 7 aut.
A14 03      @1 Eötvös University, Institute for Solid State Physics, Muzeum körut 6-8 @2 1088 Budapest @3 HUN @Z 8 aut.
A15 01      @1 Institute for Semiconductor Physics, Walter-Korsing-Str. 2 @2 15230 Frankfurt/Oder @3 DEU @Z 1 aut.
A15 02      @1 Department of Physics and Astronomy, University of Wales College of Cardiff, P.O. Box 913 @2 Cardiff CF2 3YB @3 GBR @Z 2 aut.
A15 03      @1 Department of Materials Processing Engineering, Nagoya University, Furo-cho @2 Chikusa-ku, Nagoya 464-01 @3 JPN @Z 3 aut.
A18 01  1    @1 E-MRS @2 Strasbourg @3 FRA @9 patr.
A18 02  1    @1 Council of Europe @2 Strasbourg @3 FRA @9 patr.
A18 03  1    @1 Commission of European Communities @2 Luxembourg @3 LUX @9 patr.
A20       @1 227-230
A21       @1 1998
A23 01      @0 ENG
A43 01      @1 INIST @2 13597 @5 354000076821650520
A44       @0 0000 @1 © 1998 INIST-CNRS. All rights reserved.
A45       @0 11 ref.
A47 01  1    @0 98-0339928
A60       @1 P @2 C
A61       @0 A
A64   1    @0 Thin solid films
A66 01      @0 CHE
C01 01    ENG  @0 Co/Cu multilayers have been grown by electrodeposition using a potentiostatic technique in a single electrolyte bath based on CoSO4, H3BO3 and CuSO4. X-ray diffraction performed on these multilayers have shown polycrystalline fcc structure of both Co and Cu layers with preferential (111) texture. Nuclear magnetic resonance spectrum has been recorded at 4.2 K on [Co(6 nm)/Cu(4 nm)]25 and has shown a resonance line at 216 MHz which confirms the fcc structure of Co layers. The analysis of the spectrum showed on one hand that the Co layers are not pure and contain approximately 1.5% of Cu, but on the other hand, the interfaces are of good quality. A cross-sectional on transmission electron micrograph showed a columnar growth morphology. Resistivity measurements performed on this sample presented a giant magnetoresistance (GMR) effect of about 4% at room temperature.
C02 01  3    @0 001B60H65
C02 02  3    @0 001B70E70P
C03 01  3  FRE  @0 Etude expérimentale @5 01
C03 01  3  ENG  @0 Experimental study @5 01
C03 02  3  FRE  @0 Multicouche @5 02
C03 02  3  ENG  @0 Multilayers @5 02
C03 03  3  FRE  @0 Couche mince @5 03
C03 03  3  ENG  @0 Thin films @5 03
C03 04  3  FRE  @0 Cobalt @2 NC @5 04
C03 04  3  ENG  @0 Cobalt @2 NC @5 04
C03 05  3  FRE  @0 Cuivre @2 NC @5 05
C03 05  3  ENG  @0 Copper @2 NC @5 05
C03 06  3  FRE  @0 Dépôt électrolytique @5 06
C03 06  3  ENG  @0 Electrodeposition @5 06
C03 07  X  FRE  @0 Caractérisation @5 07
C03 07  X  ENG  @0 Characterization @5 07
C03 07  X  SPA  @0 Caracterización @5 07
C03 08  3  FRE  @0 Polycristal @5 08
C03 08  3  ENG  @0 Polycrystals @5 08
C03 09  3  FRE  @0 Interface solide solide @5 09
C03 09  3  ENG  @0 Solid-solid interfaces @5 09
C03 10  3  FRE  @0 Microstructure @5 10
C03 10  3  ENG  @0 Microstructure @5 10
C03 11  3  FRE  @0 Magnétorésistance géante @5 11
C03 11  3  ENG  @0 Giant magnetoresistance @5 11
C03 12  X  FRE  @0 Structure basaltique @5 12
C03 12  X  ENG  @0 Columnar structure @5 12
C03 12  X  GER  @0 Stengelkristallgefuege @5 12
C03 12  X  SPA  @0 Estructura columnar @5 12
C03 13  3  FRE  @0 Texture @5 13
C03 13  3  ENG  @0 Texture @5 13
C03 14  3  FRE  @0 6865 @2 PAC @4 INC @5 56
C03 15  3  FRE  @0 7570P @2 PAC @4 INC @5 57
C03 16  3  FRE  @0 Co @4 INC @5 92
C03 17  3  FRE  @0 Cu @4 INC @5 93
C07 01  3  FRE  @0 Métal transition @5 16
C07 01  3  ENG  @0 Transition elements @5 16
N21       @1 229
pR  
A30 01  1  ENG  @1 1997 ICAM/E-MRS Spring Conference, Symposium B: Epitaxial Thin Film Growth and Nanostructures @3 Strasbourg FRA @4 1997-06-16

Format Inist (serveur)

NO : PASCAL 98-0339928 INIST
ET : Structural properties of electrodeposited Co/Cu multilayers
AU : EL FANITY (H.); RAHMOUNI (K.); BOUANANI (M.); DINIA (A.); SHMERBER (G.); MENY (C.); PANISSOD (P.); CZIRAKI (A.); CHERKAOUI (F.); BERRADA (A.); RITTER (G.); MATTHAI (C.); TAKAI (O.)
AF : Faculté des Sciences, B.P. 1014/rabat/Maroc (1 aut., 3 aut., 9 aut., 10 aut.); IPCMS-GEMM, UMR 46 CNRS-ULP, 23 Rue du Loess/67037 Strasbourg/France (2 aut., 4 aut., 5 aut., 6 aut., 7 aut.); Eötvös University, Institute for Solid State Physics, Muzeum körut 6-8/1088 Budapest/Hongrie (8 aut.); Institute for Semiconductor Physics, Walter-Korsing-Str. 2/15230 Frankfurt/Oder/Allemagne (1 aut.); Department of Physics and Astronomy, University of Wales College of Cardiff, P.O. Box 913/Cardiff CF2 3YB/Royaume-Uni (2 aut.); Department of Materials Processing Engineering, Nagoya University, Furo-cho/Chikusa-ku, Nagoya 464-01/Japon (3 aut.)
DT : Publication en série; Congrès; Niveau analytique
SO : Thin solid films; ISSN 0040-6090; Coden THSFAP; Suisse; Da. 1998; Vol. 318; No. 1-2; Pp. 227-230; Bibl. 11 ref.
LA : Anglais
EA : Co/Cu multilayers have been grown by electrodeposition using a potentiostatic technique in a single electrolyte bath based on CoSO4, H3BO3 and CuSO4. X-ray diffraction performed on these multilayers have shown polycrystalline fcc structure of both Co and Cu layers with preferential (111) texture. Nuclear magnetic resonance spectrum has been recorded at 4.2 K on [Co(6 nm)/Cu(4 nm)]25 and has shown a resonance line at 216 MHz which confirms the fcc structure of Co layers. The analysis of the spectrum showed on one hand that the Co layers are not pure and contain approximately 1.5% of Cu, but on the other hand, the interfaces are of good quality. A cross-sectional on transmission electron micrograph showed a columnar growth morphology. Resistivity measurements performed on this sample presented a giant magnetoresistance (GMR) effect of about 4% at room temperature.
CC : 001B60H65; 001B70E70P
FD : Etude expérimentale; Multicouche; Couche mince; Cobalt; Cuivre; Dépôt électrolytique; Caractérisation; Polycristal; Interface solide solide; Microstructure; Magnétorésistance géante; Structure basaltique; Texture; 6865; 7570P; Co; Cu
FG : Métal transition
ED : Experimental study; Multilayers; Thin films; Cobalt; Copper; Electrodeposition; Characterization; Polycrystals; Solid-solid interfaces; Microstructure; Giant magnetoresistance; Columnar structure; Texture
EG : Transition elements
GD : Stengelkristallgefuege
SD : Caracterización; Estructura columnar
LO : INIST-13597.354000076821650520
ID : 98-0339928

Links to Exploration step

Pascal:98-0339928

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<keywords scheme="KwdEn" xml:lang="en">
<term>Characterization</term>
<term>Cobalt</term>
<term>Columnar structure</term>
<term>Copper</term>
<term>Electrodeposition</term>
<term>Experimental study</term>
<term>Giant magnetoresistance</term>
<term>Microstructure</term>
<term>Multilayers</term>
<term>Polycrystals</term>
<term>Solid-solid interfaces</term>
<term>Texture</term>
<term>Thin films</term>
</keywords>
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<term>Etude expérimentale</term>
<term>Multicouche</term>
<term>Couche mince</term>
<term>Cobalt</term>
<term>Cuivre</term>
<term>Dépôt électrolytique</term>
<term>Caractérisation</term>
<term>Polycristal</term>
<term>Interface solide solide</term>
<term>Microstructure</term>
<term>Magnétorésistance géante</term>
<term>Structure basaltique</term>
<term>Texture</term>
<term>6865</term>
<term>7570P</term>
<term>Co</term>
<term>Cu</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front>
<div type="abstract" xml:lang="en">Co/Cu multilayers have been grown by electrodeposition using a potentiostatic technique in a single electrolyte bath based on CoSO
<sub>4</sub>
, H
<sub>3</sub>
BO
<sub>3</sub>
and CuSO
<sub>4</sub>
. X-ray diffraction performed on these multilayers have shown polycrystalline fcc structure of both Co and Cu layers with preferential (111) texture. Nuclear magnetic resonance spectrum has been recorded at 4.2 K on [Co(6 nm)/Cu(4 nm)]
<sub>25</sub>
and has shown a resonance line at 216 MHz which confirms the fcc structure of Co layers. The analysis of the spectrum showed on one hand that the Co layers are not pure and contain approximately 1.5% of Cu, but on the other hand, the interfaces are of good quality. A cross-sectional on transmission electron micrograph showed a columnar growth morphology. Resistivity measurements performed on this sample presented a giant magnetoresistance (GMR) effect of about 4% at room temperature.</div>
</front>
</TEI>
<inist>
<standard h6="B">
<pA>
<fA01 i1="01" i2="1">
<s0>0040-6090</s0>
</fA01>
<fA02 i1="01">
<s0>THSFAP</s0>
</fA02>
<fA03 i2="1">
<s0>Thin solid films</s0>
</fA03>
<fA05>
<s2>318</s2>
</fA05>
<fA06>
<s2>1-2</s2>
</fA06>
<fA08 i1="01" i2="1" l="ENG">
<s1>Structural properties of electrodeposited Co/Cu multilayers</s1>
</fA08>
<fA11 i1="01" i2="1">
<s1>EL FANITY (H.)</s1>
</fA11>
<fA11 i1="02" i2="1">
<s1>RAHMOUNI (K.)</s1>
</fA11>
<fA11 i1="03" i2="1">
<s1>BOUANANI (M.)</s1>
</fA11>
<fA11 i1="04" i2="1">
<s1>DINIA (A.)</s1>
</fA11>
<fA11 i1="05" i2="1">
<s1>SHMERBER (G.)</s1>
</fA11>
<fA11 i1="06" i2="1">
<s1>MENY (C.)</s1>
</fA11>
<fA11 i1="07" i2="1">
<s1>PANISSOD (P.)</s1>
</fA11>
<fA11 i1="08" i2="1">
<s1>CZIRAKI (A.)</s1>
</fA11>
<fA11 i1="09" i2="1">
<s1>CHERKAOUI (F.)</s1>
</fA11>
<fA11 i1="10" i2="1">
<s1>BERRADA (A.)</s1>
</fA11>
<fA12 i1="01" i2="1">
<s1>RITTER (G.)</s1>
<s9>ed.</s9>
</fA12>
<fA12 i1="02" i2="1">
<s1>MATTHAI (C.)</s1>
<s9>ed.</s9>
</fA12>
<fA12 i1="03" i2="1">
<s1>TAKAI (O.)</s1>
<s9>ed.</s9>
</fA12>
<fA14 i1="01">
<s1>Faculté des Sciences, B.P. 1014</s1>
<s2>rabat</s2>
<s3>MAR</s3>
<sZ>1 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>9 aut.</sZ>
<sZ>10 aut.</sZ>
</fA14>
<fA14 i1="02">
<s1>IPCMS-GEMM, UMR 46 CNRS-ULP, 23 Rue du Loess</s1>
<s2>67037 Strasbourg</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</fA14>
<fA14 i1="03">
<s1>Eötvös University, Institute for Solid State Physics, Muzeum körut 6-8</s1>
<s2>1088 Budapest</s2>
<s3>HUN</s3>
<sZ>8 aut.</sZ>
</fA14>
<fA15 i1="01">
<s1>Institute for Semiconductor Physics, Walter-Korsing-Str. 2</s1>
<s2>15230 Frankfurt/Oder</s2>
<s3>DEU</s3>
<sZ>1 aut.</sZ>
</fA15>
<fA15 i1="02">
<s1>Department of Physics and Astronomy, University of Wales College of Cardiff, P.O. Box 913</s1>
<s2>Cardiff CF2 3YB</s2>
<s3>GBR</s3>
<sZ>2 aut.</sZ>
</fA15>
<fA15 i1="03">
<s1>Department of Materials Processing Engineering, Nagoya University, Furo-cho</s1>
<s2>Chikusa-ku, Nagoya 464-01</s2>
<s3>JPN</s3>
<sZ>3 aut.</sZ>
</fA15>
<fA18 i1="01" i2="1">
<s1>E-MRS</s1>
<s2>Strasbourg</s2>
<s3>FRA</s3>
<s9>patr.</s9>
</fA18>
<fA18 i1="02" i2="1">
<s1>Council of Europe</s1>
<s2>Strasbourg</s2>
<s3>FRA</s3>
<s9>patr.</s9>
</fA18>
<fA18 i1="03" i2="1">
<s1>Commission of European Communities</s1>
<s2>Luxembourg</s2>
<s3>LUX</s3>
<s9>patr.</s9>
</fA18>
<fA20>
<s1>227-230</s1>
</fA20>
<fA21>
<s1>1998</s1>
</fA21>
<fA23 i1="01">
<s0>ENG</s0>
</fA23>
<fA43 i1="01">
<s1>INIST</s1>
<s2>13597</s2>
<s5>354000076821650520</s5>
</fA43>
<fA44>
<s0>0000</s0>
<s1>© 1998 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45>
<s0>11 ref.</s0>
</fA45>
<fA47 i1="01" i2="1">
<s0>98-0339928</s0>
</fA47>
<fA60>
<s1>P</s1>
<s2>C</s2>
</fA60>
<fA61>
<s0>A</s0>
</fA61>
<fA64 i2="1">
<s0>Thin solid films</s0>
</fA64>
<fA66 i1="01">
<s0>CHE</s0>
</fA66>
<fC01 i1="01" l="ENG">
<s0>Co/Cu multilayers have been grown by electrodeposition using a potentiostatic technique in a single electrolyte bath based on CoSO
<sub>4</sub>
, H
<sub>3</sub>
BO
<sub>3</sub>
and CuSO
<sub>4</sub>
. X-ray diffraction performed on these multilayers have shown polycrystalline fcc structure of both Co and Cu layers with preferential (111) texture. Nuclear magnetic resonance spectrum has been recorded at 4.2 K on [Co(6 nm)/Cu(4 nm)]
<sub>25</sub>
and has shown a resonance line at 216 MHz which confirms the fcc structure of Co layers. The analysis of the spectrum showed on one hand that the Co layers are not pure and contain approximately 1.5% of Cu, but on the other hand, the interfaces are of good quality. A cross-sectional on transmission electron micrograph showed a columnar growth morphology. Resistivity measurements performed on this sample presented a giant magnetoresistance (GMR) effect of about 4% at room temperature.</s0>
</fC01>
<fC02 i1="01" i2="3">
<s0>001B60H65</s0>
</fC02>
<fC02 i1="02" i2="3">
<s0>001B70E70P</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE">
<s0>Etude expérimentale</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG">
<s0>Experimental study</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE">
<s0>Multicouche</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG">
<s0>Multilayers</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE">
<s0>Couche mince</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG">
<s0>Thin films</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE">
<s0>Cobalt</s0>
<s2>NC</s2>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG">
<s0>Cobalt</s0>
<s2>NC</s2>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE">
<s0>Cuivre</s0>
<s2>NC</s2>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG">
<s0>Copper</s0>
<s2>NC</s2>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE">
<s0>Dépôt électrolytique</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG">
<s0>Electrodeposition</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="X" l="FRE">
<s0>Caractérisation</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="ENG">
<s0>Characterization</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="SPA">
<s0>Caracterización</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE">
<s0>Polycristal</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="3" l="ENG">
<s0>Polycrystals</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE">
<s0>Interface solide solide</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="3" l="ENG">
<s0>Solid-solid interfaces</s0>
<s5>09</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE">
<s0>Microstructure</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG">
<s0>Microstructure</s0>
<s5>10</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE">
<s0>Magnétorésistance géante</s0>
<s5>11</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG">
<s0>Giant magnetoresistance</s0>
<s5>11</s5>
</fC03>
<fC03 i1="12" i2="X" l="FRE">
<s0>Structure basaltique</s0>
<s5>12</s5>
</fC03>
<fC03 i1="12" i2="X" l="ENG">
<s0>Columnar structure</s0>
<s5>12</s5>
</fC03>
<fC03 i1="12" i2="X" l="GER">
<s0>Stengelkristallgefuege</s0>
<s5>12</s5>
</fC03>
<fC03 i1="12" i2="X" l="SPA">
<s0>Estructura columnar</s0>
<s5>12</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE">
<s0>Texture</s0>
<s5>13</s5>
</fC03>
<fC03 i1="13" i2="3" l="ENG">
<s0>Texture</s0>
<s5>13</s5>
</fC03>
<fC03 i1="14" i2="3" l="FRE">
<s0>6865</s0>
<s2>PAC</s2>
<s4>INC</s4>
<s5>56</s5>
</fC03>
<fC03 i1="15" i2="3" l="FRE">
<s0>7570P</s0>
<s2>PAC</s2>
<s4>INC</s4>
<s5>57</s5>
</fC03>
<fC03 i1="16" i2="3" l="FRE">
<s0>Co</s0>
<s4>INC</s4>
<s5>92</s5>
</fC03>
<fC03 i1="17" i2="3" l="FRE">
<s0>Cu</s0>
<s4>INC</s4>
<s5>93</s5>
</fC03>
<fC07 i1="01" i2="3" l="FRE">
<s0>Métal transition</s0>
<s5>16</s5>
</fC07>
<fC07 i1="01" i2="3" l="ENG">
<s0>Transition elements</s0>
<s5>16</s5>
</fC07>
<fN21>
<s1>229</s1>
</fN21>
</pA>
<pR>
<fA30 i1="01" i2="1" l="ENG">
<s1>1997 ICAM/E-MRS Spring Conference, Symposium B: Epitaxial Thin Film Growth and Nanostructures</s1>
<s3>Strasbourg FRA</s3>
<s4>1997-06-16</s4>
</fA30>
</pR>
</standard>
<server>
<NO>PASCAL 98-0339928 INIST</NO>
<ET>Structural properties of electrodeposited Co/Cu multilayers</ET>
<AU>EL FANITY (H.); RAHMOUNI (K.); BOUANANI (M.); DINIA (A.); SHMERBER (G.); MENY (C.); PANISSOD (P.); CZIRAKI (A.); CHERKAOUI (F.); BERRADA (A.); RITTER (G.); MATTHAI (C.); TAKAI (O.)</AU>
<AF>Faculté des Sciences, B.P. 1014/rabat/Maroc (1 aut., 3 aut., 9 aut., 10 aut.); IPCMS-GEMM, UMR 46 CNRS-ULP, 23 Rue du Loess/67037 Strasbourg/France (2 aut., 4 aut., 5 aut., 6 aut., 7 aut.); Eötvös University, Institute for Solid State Physics, Muzeum körut 6-8/1088 Budapest/Hongrie (8 aut.); Institute for Semiconductor Physics, Walter-Korsing-Str. 2/15230 Frankfurt/Oder/Allemagne (1 aut.); Department of Physics and Astronomy, University of Wales College of Cardiff, P.O. Box 913/Cardiff CF2 3YB/Royaume-Uni (2 aut.); Department of Materials Processing Engineering, Nagoya University, Furo-cho/Chikusa-ku, Nagoya 464-01/Japon (3 aut.)</AF>
<DT>Publication en série; Congrès; Niveau analytique</DT>
<SO>Thin solid films; ISSN 0040-6090; Coden THSFAP; Suisse; Da. 1998; Vol. 318; No. 1-2; Pp. 227-230; Bibl. 11 ref.</SO>
<LA>Anglais</LA>
<EA>Co/Cu multilayers have been grown by electrodeposition using a potentiostatic technique in a single electrolyte bath based on CoSO
<sub>4</sub>
, H
<sub>3</sub>
BO
<sub>3</sub>
and CuSO
<sub>4</sub>
. X-ray diffraction performed on these multilayers have shown polycrystalline fcc structure of both Co and Cu layers with preferential (111) texture. Nuclear magnetic resonance spectrum has been recorded at 4.2 K on [Co(6 nm)/Cu(4 nm)]
<sub>25</sub>
and has shown a resonance line at 216 MHz which confirms the fcc structure of Co layers. The analysis of the spectrum showed on one hand that the Co layers are not pure and contain approximately 1.5% of Cu, but on the other hand, the interfaces are of good quality. A cross-sectional on transmission electron micrograph showed a columnar growth morphology. Resistivity measurements performed on this sample presented a giant magnetoresistance (GMR) effect of about 4% at room temperature.</EA>
<CC>001B60H65; 001B70E70P</CC>
<FD>Etude expérimentale; Multicouche; Couche mince; Cobalt; Cuivre; Dépôt électrolytique; Caractérisation; Polycristal; Interface solide solide; Microstructure; Magnétorésistance géante; Structure basaltique; Texture; 6865; 7570P; Co; Cu</FD>
<FG>Métal transition</FG>
<ED>Experimental study; Multilayers; Thin films; Cobalt; Copper; Electrodeposition; Characterization; Polycrystals; Solid-solid interfaces; Microstructure; Giant magnetoresistance; Columnar structure; Texture</ED>
<EG>Transition elements</EG>
<GD>Stengelkristallgefuege</GD>
<SD>Caracterización; Estructura columnar</SD>
<LO>INIST-13597.354000076821650520</LO>
<ID>98-0339928</ID>
</server>
</inist>
</record>

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