Controllable Patterning and CVD Growth of Isolated Carbon Nanotubes with Direct Parallel Writing of Catalyst Using Dip‐Pen Nanolithography
Identifieur interne : 000696 ( Main/Exploration ); précédent : 000695; suivant : 000697Controllable Patterning and CVD Growth of Isolated Carbon Nanotubes with Direct Parallel Writing of Catalyst Using Dip‐Pen Nanolithography
Auteurs : Irma Kuljanishvili [États-Unis] ; Dmitriy A. Dikin [États-Unis] ; Sergey Rozhok [États-Unis] ; Scott Mayle [États-Unis] ; Venkat Chandrasekhar [États-Unis]Source :
- Small [ 1613-6810 ] ; 2009-11-16.
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Abstract
Carbon nanotubes are fabricated using chemical vapor deposition at predetermined locations by patterning catalyst directly on a substrate with nanometer‐scale precision using dip‐pen nanolithography with multipen cantilevers (see image). The development of new molecular inks for the deposition of the precursor catalyst results in a high yield of isolated carbon nanotubes, ideal for subsequent device fabrication.
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DOI: 10.1002/smll.200900841
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