Structure and Dielectric Study of Poly(α,α difluoro‐p‐xylylene) Thin Films: Highlight of the Substrate Temperature Effect
Identifieur interne : 000C69 ( Istex/Corpus ); précédent : 000C68; suivant : 000C70Structure and Dielectric Study of Poly(α,α difluoro‐p‐xylylene) Thin Films: Highlight of the Substrate Temperature Effect
Auteurs : Abdelkader Kahouli ; Emmanuel André ; Alain Sylvestre ; Sébastien Pairis ; Fathi Jomni ; Béchir Yangui ; Jean-Luc GardenSource :
- Chemical Vapor Deposition [ 0948-1907 ] ; 2012-06.
Abstract
Research on poly(α,α difluoro‐p‐xylylene) thin films is described and summarized. The important physicochemical and dielectric properties are investigated. For this, characterization tools that can provide information on the nature of structural and physicochemical according substrate temperature are used. A summary of the main properties of poly(α,α difluoro‐p‐xylylene) is presented.
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DOI: 10.1002/cvde.201204310
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ISTEX:D5C12AE6BED38F8E363CE0BC84FE28B3AC21B359Le document en format XML
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first="Béchir" last="Yangui">Béchir Yangui</name><affiliation><mods:affiliation>Laboratory for Materials, Organization and Properties (LabMOP), Campus Universitaire‐El Manar, 2092 Tunis (Tunisia)</mods:affiliation></affiliation></author><author><name sortKey="Garden, Jean Uc" sort="Garden, Jean Uc" uniqKey="Garden J" first="Jean-Luc" last="Garden">Jean-Luc Garden</name><affiliation><mods:affiliation>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</mods:affiliation></affiliation></author></analytic><monogr></monogr><series><title level="j">Chemical Vapor Deposition</title><title level="j" type="abbrev">Chem. 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The important physicochemical and dielectric properties are investigated. For this, characterization tools that can provide information on the nature of structural and physicochemical according substrate temperature are used. A summary of the main properties of poly(α,α difluoro‐p‐xylylene) is presented.</div></front></TEI><istex><corpusName>wiley</corpusName><author><json:item><name>Abdelkader Kahouli</name><affiliations><json:string>Grenoble Electrical Engineering Laboratory (G2ELab), Joseph Fourier University (UJF), CNRS, 25 Rue des Martyrs, BP 166, 38042 Grenoble Cedex 9 (France)</json:string></affiliations></json:item><json:item><name>Emmanuel André</name><affiliations><json:string>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</json:string></affiliations></json:item><json:item><name>Alain Sylvestre</name><affiliations><json:string>Grenoble Electrical Engineering Laboratory (G2ELab), Joseph Fourier University (UJF), CNRS, 25 Rue des Martyrs, BP 166, 38042 Grenoble Cedex 9 (France)</json:string></affiliations></json:item><json:item><name>Sébastien Pairis</name><affiliations><json:string>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</json:string></affiliations></json:item><json:item><name>Fathi Jomni</name><affiliations><json:string>Laboratory for Materials, Organization and Properties (LabMOP), Campus Universitaire‐El Manar, 2092 Tunis (Tunisia)</json:string></affiliations></json:item><json:item><name>Béchir Yangui</name><affiliations><json:string>Laboratory for Materials, Organization and Properties (LabMOP), Campus Universitaire‐El Manar, 2092 Tunis (Tunisia)</json:string></affiliations></json:item><json:item><name>Jean‐Luc Garden</name><affiliations><json:string>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</json:string></affiliations></json:item></author><articleId><json:string>CVDE201204310</json:string></articleId><language><json:string>eng</json:string></language><originalGenre><json:string>shortCommunication</json:string></originalGenre><abstract>Research on poly(α,α difluoro‐p‐xylylene) thin films is described and summarized. 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KGaA, Weinheim</p></availability><date>2012</date></publicationStmt><notesStmt><note type="content">*This work was supported by MIRA (Mobilité Internationale Rhône‐Alpes), AUF (Agence Universitaire de la Francophonie), and Institut Néel Grenoble for providing financial support during the preparation of the PhD. thesis.</note><note>Institut Néel Grenoble</note></notesStmt><sourceDesc><biblStruct type="inbook"><analytic><title level="a" type="main" xml:lang="en">Structure and Dielectric Study of Poly(α,α difluoro‐p‐xylylene) Thin Films: Highlight of the Substrate Temperature Effect</title><author xml:id="author-1"><persName><forename type="first">Abdelkader</forename><surname>Kahouli</surname></persName><note type="correspondence"><p>Correspondence: Grenoble Electrical Engineering Laboratory (G2ELab), Joseph Fourier University (UJF), CNRS, 25 Rue des Martyrs, BP 166, 38042 Grenoble Cedex 9 (France).</p></note><affiliation>Grenoble Electrical Engineering Laboratory (G2ELab), Joseph Fourier University (UJF), CNRS, 25 Rue des Martyrs, BP 166, 38042 Grenoble Cedex 9 (France)</affiliation></author><author xml:id="author-2"><persName><forename type="first">Emmanuel</forename><surname>André</surname></persName><affiliation>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</affiliation></author><author xml:id="author-3"><persName><forename type="first">Alain</forename><surname>Sylvestre</surname></persName><affiliation>Grenoble Electrical Engineering Laboratory (G2ELab), Joseph Fourier University (UJF), CNRS, 25 Rue des Martyrs, BP 166, 38042 Grenoble Cedex 9 (France)</affiliation></author><author xml:id="author-4"><persName><forename type="first">Sébastien</forename><surname>Pairis</surname></persName><affiliation>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</affiliation></author><author xml:id="author-5"><persName><forename type="first">Fathi</forename><surname>Jomni</surname></persName><affiliation>Laboratory for Materials, Organization and Properties (LabMOP), Campus Universitaire‐El Manar, 2092 Tunis (Tunisia)</affiliation></author><author xml:id="author-6"><persName><forename type="first">Béchir</forename><surname>Yangui</surname></persName><affiliation>Laboratory for Materials, Organization and Properties (LabMOP), Campus Universitaire‐El Manar, 2092 Tunis (Tunisia)</affiliation></author><author xml:id="author-7"><persName><forename type="first">Jean‐Luc</forename><surname>Garden</surname></persName><affiliation>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</affiliation></author></analytic><monogr><title level="j">Chemical Vapor Deposition</title><title level="j" type="abbrev">Chem. 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The important physicochemical and dielectric properties are investigated. For this, characterization tools that can provide information on the nature of structural and physicochemical according substrate temperature are used. A summary of the main properties of poly(α,α difluoro‐p‐xylylene) is presented.</p></abstract></abstractGroup></contentMeta><noteGroup><note xml:id="fn1"><p>This work was supported by MIRA (Mobilité Internationale Rhône‐Alpes), AUF (Agence Universitaire de la Francophonie), and Institut Néel Grenoble for providing financial support during the preparation of the PhD. thesis.</p></note></noteGroup></header></component></istex:document></istex:metadataXml><mods version="3.6"><titleInfo lang="en"><title>Structure and Dielectric Study of Poly(α,α difluoro‐p‐xylylene) Thin Films: Highlight of the Substrate Temperature Effect</title></titleInfo><titleInfo type="alternative" contentType="CDATA" lang="en"><title>Structure and Dielectric Study of Poly(α,α difluoro‐p‐xylylene) Thin Films: Highlight of the Substrate Temperature Effect</title></titleInfo><name type="personal"><namePart type="given">Abdelkader</namePart><namePart type="family">Kahouli</namePart><affiliation>Grenoble Electrical Engineering Laboratory (G2ELab), Joseph Fourier University (UJF), CNRS, 25 Rue des Martyrs, BP 166, 38042 Grenoble Cedex 9 (France)</affiliation><description>Correspondence: Grenoble Electrical Engineering Laboratory (G2ELab), Joseph Fourier University (UJF), CNRS, 25 Rue des Martyrs, BP 166, 38042 Grenoble Cedex 9 (France).</description><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Emmanuel</namePart><namePart type="family">André</namePart><affiliation>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Alain</namePart><namePart type="family">Sylvestre</namePart><affiliation>Grenoble Electrical Engineering Laboratory (G2ELab), Joseph Fourier University (UJF), CNRS, 25 Rue des Martyrs, BP 166, 38042 Grenoble Cedex 9 (France)</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Sébastien</namePart><namePart type="family">Pairis</namePart><affiliation>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Fathi</namePart><namePart type="family">Jomni</namePart><affiliation>Laboratory for Materials, Organization and Properties (LabMOP), Campus Universitaire‐El Manar, 2092 Tunis (Tunisia)</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Béchir</namePart><namePart type="family">Yangui</namePart><affiliation>Laboratory for Materials, Organization and Properties (LabMOP), Campus Universitaire‐El Manar, 2092 Tunis (Tunisia)</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Jean‐Luc</namePart><namePart type="family">Garden</namePart><affiliation>Institut Néel, CNRS et Université Joseph Fourier, BP 166, 38042 Grenoble cedex 9 (France)</affiliation><role><roleTerm type="text">author</roleTerm></role></name><typeOfResource>text</typeOfResource><genre type="brief-communication" displayLabel="shortCommunication"></genre><originInfo><publisher>WILEY‐VCH Verlag</publisher><place><placeTerm type="text">Weinheim</placeTerm></place><dateIssued encoding="w3cdtf">2012-06</dateIssued><dateCaptured encoding="w3cdtf">2012-02-10</dateCaptured><copyrightDate encoding="w3cdtf">2012</copyrightDate></originInfo><language><languageTerm type="code" authority="rfc3066">en</languageTerm><languageTerm type="code" authority="iso639-2b">eng</languageTerm></language><physicalDescription><internetMediaType>text/html</internetMediaType><extent unit="figures">3</extent><extent unit="tables">1</extent><extent unit="references">10</extent><extent unit="words">3150</extent></physicalDescription><abstract type="short" lang="en">Research on poly(α,α difluoro‐p‐xylylene) thin films is described and summarized. The important physicochemical and dielectric properties are investigated. For this, characterization tools that can provide information on the nature of structural and physicochemical according substrate temperature are used. A summary of the main properties of poly(α,α difluoro‐p‐xylylene) is presented.</abstract><note type="content">*This work was supported by MIRA (Mobilité Internationale Rhône‐Alpes), AUF (Agence Universitaire de la Francophonie), and Institut Néel Grenoble for providing financial support during the preparation of the PhD. thesis.</note><note type="funding">Institut Néel Grenoble</note><relatedItem type="host"><titleInfo><title>Chemical Vapor Deposition</title></titleInfo><titleInfo type="abbreviated"><title>Chem. Vap. Deposition</title></titleInfo><genre type="journal">journal</genre><subject><genre>article-category</genre><topic>Communication</topic></subject><identifier type="ISSN">0948-1907</identifier><identifier type="eISSN">1521-3862</identifier><identifier type="DOI">10.1002/(ISSN)1521-3862</identifier><identifier type="PublisherID">CVDE</identifier><part><date>2012</date><detail type="volume"><caption>vol.</caption><number>18</number></detail><detail type="issue"><caption>no.</caption><number>4‐6</number></detail><extent unit="pages"><start>147</start><end>150</end><total>4</total></extent></part></relatedItem><identifier type="istex">D5C12AE6BED38F8E363CE0BC84FE28B3AC21B359</identifier><identifier type="DOI">10.1002/cvde.201204310</identifier><identifier type="ArticleID">CVDE201204310</identifier><accessCondition type="use and reproduction" contentType="copyright">Copyright © 2012 WILEY‐VCH Verlag GmbH & Co. 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