List of bibliographic references
Number of relevant bibliographic references: 11.
Ident. | Authors (with country if any) | Title |
---|
000013 (2014) |
M. Hemmous [Algérie] ; A. Layadi [Algérie] ; A. Guittoum [Algérie] ; N. Souami [Algérie] ; M. Mebarki [Algérie] ; N. Menni [Algérie] | Structure, surface morphology and electrical properties of evaporated Ni thin films: Effect of substrates, thickness and Cu underlayer |
000139 (2008) |
L. Cattin [France] ; B. A. Reguig [Algérie] ; A. Khelil [Algérie] ; M. Morsli [France] ; K. Benchouk [Algérie] ; J. C. Bernede [France] | Properties of NiO thin films deposited by chemical spray pyrolysis using different precursor solutions |
000145 (2008) |
M. Hemmous [Algérie] ; A. Layadi [Algérie] ; A. Guittoum [Algérie] ; A. Bourzami [Algérie] ; A. Benabbas [Algérie] | Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and Ni/Si(100) thin films |
000157 (2007) |
D. Boughrara [Algérie] ; L. Hamadou [Algérie] ; A. Kadri [Algérie] ; N. Benbrahim [Algérie] | Thin electrolyte layer thickness effect on corrosion behaviour of invar in sulphate solutions |
000158 (2007) |
S.-M. Cherif [France] ; A. Layadi [Algérie] ; J. Ben Youssef [France] ; C. Nacereddine [Algérie] ; Y. Roussigne [France] | Study of the magnetic anisotropy in Ni/Cu and Ni/glass thin films |
000159 (2007) |
B. A. Reguig [Algérie] ; A. Khelil [Algérie] ; L. Cattin [France] ; M. Morsli [France] ; J. C. Bernede [France] | Properties of NiO thin films deposited by intermittent spray pyrolysis process |
000179 (2006) |
B. A. Reguig [Algérie] ; M. Regragui [France, Maroc] ; M. Morsli [France] ; A. Khelil [Algérie] ; M. Addou [Maroc] ; J. C. Bernede [France] | Effect of the precursor solution concentration on the NiO thin film properties deposited by spray pyrolysis |
000224 (2003) |
A. Kellou [Algérie] ; N. E. Fenineche [France] ; A. Tadjer [Algérie] ; H. Aourag [Algérie, France] | Ferromagnetic and antiferromagnetic couplings in Cr(0 0 1) thin films and TM monolayer/Cr(0 0 1) (TM = Ti, V, Cr, Mn, Fe, Co, Ni) |
000264 (1998) |
N. Guettari [Algérie] ; J. Ouerfelli [France] ; J. C. Bernède [France] ; A. Khelil [Algérie] ; J. Pouzet [France] ; A. Conan [France] | Photoconductive WSe2 thin films obtained by solid state reaction in the presence of a thin nickel layer |
000269 (1998) |
B. Ghebouli [Algérie] ; A. Layadi [Algérie] ; L. Kerkache [Algérie] | Effect of the substrate on the structural and electrical properties of dc sputtered Ni thin films |
000285 (1997) |
H. Hadouda [Algérie] ; J. C. Bernede [France] ; E. Gourmelon [France] ; J. Pouzet [France] | Experimental obviousness of the necessity for a thin Ni interfacial layer to obtain highly ordered photoconductive MoS2 films |
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