Serveur d'exploration sur l'Indium - Analysis (France)

Index « Auteurs » - entrée « Y. Monteil »
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Y. Moelo < Y. Monteil < Y. Mourier  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 32.
[0-20] [0 - 20][0 - 32][20-31][20-40]
Ident.Authors (with country if any)Title
000268 (2010) Structural and optical study of BxInyGa1-x-yAs/GaAs and InyGa1-yAs/GaAs QW's grown by MOCVD
000362 (2010) AES, LEED and PYS investigation of Au deposits on InSe/Si( 1 1 1) substrate
000428 (2009) Investigation by EELS and TRIM simulation method of the interaction of Ar+ and N+ ions with the InP compound
000498 (2008) Study by EELS and EPES of the stability of InPO4/InP system
000607 (2008) AES, EELS and TRIM investigation of InSb and InP compounds subjected to Ar+ ions bombardment
000B33 (2004) Interplay between strain and confinement effects on optical and structural properties in InGaAs/GaAs epilayers and quantum wells
000B54 (2004) Enhancement of atomic ordering in In0.53Ga0.47As/InP: a comparison between trimethylarsenic and arsine
000B89 (2004) Alloy broadening effect on optical properties of InGaAs grown by MOCVD with TMAs precursor
000D18 (2003) Optical signature of atomic ordering in In0.53Ga0.47As/InP: photoluminescence properties and IR response
001414 (2000) Optical study of inverted interface in InP/InAlAs/InP structures grown by MOCVD
001455 (2000) Energy barrier for the growth transition step-flow/step-bunching during epitaxy of InP/InP
001571 (1999-05-15) Strain-induced surface morphology of slightly mismatched InxGa1-xAs films grown on vicinal (100) InP substrates
001647 (1999) Surface morphology, electrical and optical properties of In0.53Ga0.47As/InP grown by metalorganic vapor-phase epitaxy using trimethylarsine and arsine
001648 (1999) Surface morphology of InGaAs and InP materials grown with trimethylarsenic and arsine on vicinal InP substrates
001694 (1999) NO2 sensor based on InP epitaxial thin layers
001714 (1999) Initial stages of InP/GaP (100) and (111)A, B grown by metal organic chemical vapor deposition
001729 (1999) Growth mode and effect of carrier gas on In0.53Ga0.47As/InP surface morphology grown with trimethylarsine and arsine
001848 (1998-07-01) A comparative study of heterostructures InP/GaAs (001) and InP/GaAs (111) grown by metalorganic chemical vapor deposition
001B94 (1997) The strength of indium phosphide based microstructures
001C87 (1997) Effect of methyl surface saturation during growth interruption sequences of metalorganic vapor-phase epitaxy of In0.53Ga0.47As using trimethylarsenic
001D06 (1997) Behaviour of vicinal InP surfaces grown by MOVPE : exploitation of AFM images

List of associated KwdEn.i

Nombre de
documents
Descripteur
19Experimental study
19Semiconductor materials
13Gallium arsenides
13Indium phosphides
12Atomic force microscopy
11Photoluminescence
10Indium arsenides
9Binary compounds
9MOVPE method
8Epitaxial layers
8Ternary compounds
7Crystal growth from vapors
7Precursor
6Indium Phosphides
5Epitaxy
5III-V semiconductors
4AES
4Indium phosphide
4Mismatch lattice
4Morphology
4Optical properties
4Organometallic compound
4Thin film
4Thin films
4VPE
3EEL spectroscopy
3Experimental result
3Growth from vapor
3Growth mechanism
3Hall effect
3Heterojunctions
3Inorganic compound
3Inorganic compounds
3MOCVD
3Quantum wells
3Semiconductor epitaxial layers
3Surface structure
3Surfaces
3Vicinal surface
2Aluminium Indium Arsenides Mixed
2Annealing
2Arsine
2Binary compound
2Crystal growth
2Crystal orientation
2Dislocations
2Electron beams
2III-V compound
2Indium compounds
2Interface electron state
2Layer thickness
2Low temperature
2Operating mode
2Organic arsine
2Oxidation
2Physical radiation effects
2Semiconductor growth
2Simulation
2Substrates
2Tertiary arsine
2Waveform
2XRD
1Alloying effects
1Aluminium Gallium Indium Arsenides Mixed
1Aluminium Indium Arsenides
1Aluminium arsenides
1Analysis method
1Argon ions
1Atmospheric pressure
1Auger electron spectrometry
1Band offset
1Bipolar transistors
1Boron additions
1Buffer layer
1CV characteristic
1CVD
1CVD coatings
1Carbon additions
1Carrier density
1Charge carrier recombination
1Chemical beam epitaxy
1Chemical bonds
1Chemical composition
1Chemical sensors
1Clean surface
1Composition effect
1Contamination
1Crystal doping
1Deposition
1Differential scanning calorimetry
1Diffusion
1Dislocation density
1Doped materials
1Electromechanical device
1Electron diffraction
1Electron mobility
1Electron spectra
1Electron-hole recombination
1Energy band
1Energy dependence

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