Serveur d'exploration sur l'Indium - Analysis (France)

Index « Auteurs » - entrée « M. Juhel »
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M. Jouanne < M. Juhel < M. Julien  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 12.
Ident.Authors (with country if any)Title
001864 (1998-05-18) Evidence of hydrogen-carbon interactions in plasma hydrogenated carbon-doped n-InP
001975 (1998) Low temperature planar regrowth of semi-insulating InP by low pressure hydride vapour phase epitaxy for device application
001A26 (1998) CBE growth of carbon doped InGaAs/InP HBTs for 25 Gbit/s circuits
001B33 (1997-05) Anisotropic etching of InP with low sidewall and surface induced damage in inductively coupled plasma etching using SiCl4
001C76 (1997) Evaluation of the properties of hydrogenated InP/InGaAsP double heterostructure waveguides
001D40 (1996-11) High stability heterojunction bipolar transistors with carbon-doped base grown by atomic layer chemical beam epitaxy
001E08 (1996-05) Sidewall and surface induced damage comparison between reactive ion etching and inductive plasma etching of InP using a CH4/H2/O2 gas mixture
001F28 (1996) Improved stability of C-doped GaAs grown by chemical beam epitaxy for heterojunction bipolar transistor applications
002074 (1995-02-06) Cation interdiffusion in InGaAsP/InGaAsP multiple quantum wells with constant P/As ratio
002077 (1995-01-23) New encapsulant source for III-V quantum well disordering
002210 (1995) An optical study of interdiffusion in strained InP-based heterostructures
002708 (1993) Determination of oxygen and carbon contaminations in InGaAs molecular beam epitaxy using growth interruptions

List of associated KwdEn.i

Nombre de
documents
Descripteur
11Experimental study
7Photoluminescence
6Indium phosphides
4Gallium arsenides
4III-V semiconductors
4Semiconductor materials
3Annealing
3Doping
3Gallium phosphides
3Hydrogen
3Indium arsenides
3Quantum wells
2Binary compound
2Binary compounds
2Diffusion
2Epitaxial layers
2Heterojunction transistor
2III-V compound
2Indium compounds
2Microelectronic fabrication
2SIMS
1Aluminium arsenides
1Atomic force microscopy
1Auger effect
1Bipolar transistor
1Bipolar transistors
1Blue shift
1Bromides
1CBE
1Carbon
1Carbon addition
1Carbon additions
1Charge carrier concentration
1Chemical beam condensation
1Comparative evaluations
1Concentration distribution
1Contamination
1Crystal growth
1Crystal growth from vapors
1Damage
1Diffusion coating
1Electron beam lithography
1Electron density
1Electron mobility
1Epitaxy
1Etching
1Excitons
1Fabrication property relation
1Gallium Arsenides
1Gallium Indium Arsenides Mixed
1Gallium phosphide
1Growth from vapor
1Hall effect
1Heterojunctions
1Heterostructures
1Homoepitaxy
1Hydrides
1Hydrogenation
1Impurity
1Impurity density
1Impurity states
1Indium Arsenides
1Indium Phosphides
1Indium phosphide
1Inorganic compound
1Interdiffusion
1Interface structure
1Ion beams
1Iron additions
1Low pressure
1Low temperature
1Measuring methods
1Methane
1Molecular beam condensation
1Morphology
1Optoelectronic device
1Order-disorder transformations
1Oxygen
1Passivation
1Quaternary compound
1Quaternary compounds
1Raman spectra
1SEM
1Secondary ion mass spectra
1Secondary ion mass spectrometry
1Selective growth
1Silicon oxides
1Spectral shift
1Sputter etching
1Stability
1Surface structure
1TEM
1Temperature dependence
1Ternary compound
1Ternary compounds
1Thermal instabilities
1Thick film
1Thin film
1Thin films
1VPE

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